Yoshiaki Ikuta

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 10,928,721
- Issue date Feb 23, 2021
- AGC, Inc.
- Yoshiaki Ikuta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, and process for its insp...
- Patent number 9,739,722
- Issue date Aug 22, 2017
- Asahi Glass Company, Limited
- Hiroshi Nakanishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, method of manufacturing...
- Patent number 9,268,207
- Issue date Feb 23, 2016
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective layer-equipped substrate for EUV lithography, reflective...
- Patent number 8,993,201
- Issue date Mar 31, 2015
- Asahi Glass Company, Limited
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer substrate, manufacturing method for multilayer substrate...
- Patent number 8,921,017
- Issue date Dec 30, 2014
- Asahi Glass Company, Limited
- Yuzo Okamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflecting mask blank, method for manufacturing reflective mask bla...
- Patent number 8,916,316
- Issue date Dec 23, 2014
- Asahi Glass Company, Limited
- Yuzo Okamura
- G01 - MEASURING TESTING
Information Patent Grant
Multilayer mirror for EUV lithography and process for its production
- Patent number 8,580,465
- Issue date Nov 12, 2013
- Asahi Glass Company, Limited
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical member base material for EUV lithography, and method for pr...
- Patent number 8,518,613
- Issue date Aug 27, 2013
- Asahi Glass Company, Limited
- Hiroshi Nakanishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Synthetic silica glass optical component and process for its produc...
- Patent number 8,402,786
- Issue date Mar 26, 2013
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Reflective mask blank for EUV lithography, process for producing th...
- Patent number 8,241,821
- Issue date Aug 14, 2012
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Process for smoothing surface of glass substrate
- Patent number 7,901,843
- Issue date Mar 8, 2011
- Asahi Glass Company, Limited
- Takashi Sugiyama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical member made of synthetic quartz glass, and process for its...
- Patent number 7,784,307
- Issue date Aug 31, 2010
- Asahi Glass Company, Limited
- Tomonori Ogawa
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Synthetic quartz glass for optical member and its production method
- Patent number 7,514,382
- Issue date Apr 7, 2009
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Synthetic quartz glass for optical member, projection exposure appa...
- Patent number 7,368,403
- Issue date May 6, 2008
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Synthetic quartz glass and process for producing it
- Patent number 7,022,633
- Issue date Apr 4, 2006
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Exposure apparatus, semiconductor device, and photomask
- Patent number 6,611,317
- Issue date Aug 26, 2003
- Asahi Glass Company, Limited
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Synthetic quartz glass and method for preparing the same
- Patent number 6,576,578
- Issue date Jun 10, 2003
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Synthetic quartz glass for optical member, process for producing th...
- Patent number 6,544,914
- Issue date Apr 8, 2003
- Asahi Glass Company, Limited
- Shinya Kikugawa
- B08 - CLEANING
Information Patent Grant
Synthetic quartz glass and method for production thereof
- Patent number 6,499,317
- Issue date Dec 31, 2002
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Pellicle and method for manufacture thereof
- Patent number 6,475,575
- Issue date Nov 5, 2002
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for drawing up special crude oil
- Patent number 4,919,207
- Issue date Apr 24, 1990
- Mitsubishi Jukogyo Kabushiki Kaisha
- Yoshiaki Ikuta
- E21 - EARTH DRILLING MINING
Information Patent Grant
Method for drawing up special crude oil
- Patent number 4,756,368
- Issue date Jul 12, 1988
- Mitsubishi Jukogyo Kabushiki Kaisha
- Yoshiaki Ikuta
- E21 - EARTH DRILLING MINING

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20160357100
- Publication date Dec 8, 2016
- Asahi Glass Company, Limited
- Yoshiaki IKUTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GLASS SUBSTRATE FOR MASK BLANK
- Publication number 20160266482
- Publication date Sep 15, 2016
- Asahi Glass Company, Limited
- Naohiro UMEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FINISHING PRE-POLISHED GLASS SUBSTRATE SURFACE
- Publication number 20160168020
- Publication date Jun 16, 2016
- Asahi Glass Company, Limited
- Yuzo OKAMURA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND PROCESS FOR ITS INSP...
- Publication number 20160109384
- Publication date Apr 21, 2016
- Asahi Glass Company, Limited
- Hiroshi NAKANISHI
- G01 - MEASURING TESTING
Information Patent Application
GLASS SUBSTRATE FOR OPTICAL LITHOGRAPHY
- Publication number 20160041463
- Publication date Feb 11, 2016
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, METHOD OF MANUFACTURING...
- Publication number 20150198874
- Publication date Jul 16, 2015
- ASAHI GLASS COMPANY, LIMITED
- Yoshiaki IKUTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTING MASK BLANK, METHOD FOR MANUFACTURING REFLECTIVE MASK BLA...
- Publication number 20140186753
- Publication date Jul 3, 2014
- Asahi Glass Company, Limited
- Yuzo OKAMURA
- G01 - MEASURING TESTING
Information Patent Application
MULTILAYER SUBSTRATE, MANUFACTURING METHOD FOR MULTILAYER SUBSTRATE...
- Publication number 20140011123
- Publication date Jan 9, 2014
- Asahi Glass Company, Limited
- Yuzo OKAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL MEMBER BASE MATERIAL FOR EUV LITHOGRAPHY, AND METHOD FOR PR...
- Publication number 20130011773
- Publication date Jan 10, 2013
- ASAHI GLASS COMPANY, LIMITED
- Hiroshi NAKANISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE LAYER-EQUIPPED SUBSTRATE FOR EUV LITHOGRAPHY, REFLECTIVE...
- Publication number 20120231378
- Publication date Sep 13, 2012
- ASAHI GLASS COMPANY, LIMITED
- Masaki MIKAMI
- G02 - OPTICS
Information Patent Application
MULTILAYER MIRROR FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODUCTION
- Publication number 20120196208
- Publication date Aug 2, 2012
- ASAHI GLASS COMPANY, LIMITED
- Masaki MIKAMI
- G02 - OPTICS
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, PROCESS FOR PRODUCING TH...
- Publication number 20110165504
- Publication date Jul 7, 2011
- Asahi Glass Company, Limited
- Yoshiaki IKUTA
- B82 - NANO-TECHNOLOGY
Information Patent Application
TIO2-CONTAINING QUARTZ GLASS SUBSTRATE
- Publication number 20110089612
- Publication date Apr 21, 2011
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
TiO2-containing quartz glass substrate
- Publication number 20100234205
- Publication date Sep 16, 2010
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PROCESS FOR SMOOTHING SURFACE OF GLASS SUBSTRATE
- Publication number 20090286166
- Publication date Nov 19, 2009
- Asahi Glass Company, Limited
- Takashi SUGIYAMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Optical member made of synthetic quartz glass, and process for its...
- Publication number 20070027018
- Publication date Feb 1, 2007
- ASAHI GLASS COMPANY, LIMITED
- Tomonori Ogawa
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Synthetic quartz glass for optical member and its production method
- Publication number 20060183623
- Publication date Aug 17, 2006
- ASAHI GLASS COMPANY LIMITED
- Yoshiaki Ikuta
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Synthetic quartz glass
- Publication number 20050176572
- Publication date Aug 11, 2005
- Hideo Hosono
- G02 - OPTICS
Information Patent Application
Synthetic quartz glass for optical member, projection exposure appa...
- Publication number 20050068644
- Publication date Mar 31, 2005
- ASAHI GLASS COMPANY, LIMITED
- Yoshiaki Ikuta
- G02 - OPTICS
Information Patent Application
Synthetic quartz glass and process for producing it
- Publication number 20030195107
- Publication date Oct 16, 2003
- ASAHI GLASS COMPANY LIMITED
- Yoshiaki Ikuta
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Synthetic silica glass optical component and process for its produc...
- Publication number 20030051507
- Publication date Mar 20, 2003
- ASAHI GLASS COMPANY, LIMITED
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Container for an optical article
- Publication number 20010035361
- Publication date Nov 1, 2001
- ASAHI GLASS COMPANY, LIMITED
- Hitoshi Mishiro
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL

Yoshiaki Ikuta

Person

Patents Grantslast 30 patents

Reflective mask blank for EUV lithography

Reflective mask blank for EUV lithography, and process for its insp...

Reflective mask blank for EUV lithography, method of manufacturing...

Reflective layer-equipped substrate for EUV lithography, reflective...

Multilayer substrate, manufacturing method for multilayer substrate...

Reflecting mask blank, method for manufacturing reflective mask bla...

Multilayer mirror for EUV lithography and process for its production

Optical member base material for EUV lithography, and method for pr...

Synthetic silica glass optical component and process for its produc...

Reflective mask blank for EUV lithography, process for producing th...

Process for smoothing surface of glass substrate

Optical member made of synthetic quartz glass, and process for its...

Synthetic quartz glass for optical member and its production method

Synthetic quartz glass for optical member, projection exposure appa...

Synthetic quartz glass and process for producing it

Exposure apparatus, semiconductor device, and photomask

Synthetic quartz glass and method for preparing the same

Synthetic quartz glass for optical member, process for producing th...

Synthetic quartz glass and method for production thereof

Pellicle and method for manufacture thereof

Method for drawing up special crude oil

Method for drawing up special crude oil

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

GLASS SUBSTRATE FOR MASK BLANK

METHOD OF FINISHING PRE-POLISHED GLASS SUBSTRATE SURFACE

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND PROCESS FOR ITS INSP...

GLASS SUBSTRATE FOR OPTICAL LITHOGRAPHY

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, METHOD OF MANUFACTURING...

REFLECTING MASK BLANK, METHOD FOR MANUFACTURING REFLECTIVE MASK BLA...

MULTILAYER SUBSTRATE, MANUFACTURING METHOD FOR MULTILAYER SUBSTRATE...

OPTICAL MEMBER BASE MATERIAL FOR EUV LITHOGRAPHY, AND METHOD FOR PR...

REFLECTIVE LAYER-EQUIPPED SUBSTRATE FOR EUV LITHOGRAPHY, REFLECTIVE...

MULTILAYER MIRROR FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODUCTION

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, PROCESS FOR PRODUCING TH...

TIO2-CONTAINING QUARTZ GLASS SUBSTRATE

TiO2-containing quartz glass substrate

PROCESS FOR SMOOTHING SURFACE OF GLASS SUBSTRATE

Optical member made of synthetic quartz glass, and process for its...

Synthetic quartz glass for optical member and its production method

Synthetic quartz glass

Synthetic quartz glass for optical member, projection exposure appa...

Synthetic quartz glass and process for producing it

Synthetic silica glass optical component and process for its produc...

Container for an optical article