Yoshiaki Kinoshita

Person

Saitama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
High current density electrolytic decomposition process for copper
- Patent number 6,835,297
- Issue date Dec 28, 2004
- Mitsui Mining & Smelting Co., Ltd.
- Toshiko Yokota
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process for preparing resists
- Patent number 6,686,121
- Issue date Feb 3, 2004
- Clariant Finance (BVI) Limited
- Hiroshi Okazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method
- Patent number 6,527,966
- Issue date Mar 4, 2003
- Clariant Finance (BVI) Limited
- Koji Shimomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemically amplified resist composition
- Patent number 6,479,210
- Issue date Nov 12, 2002
- Clariant Finance (BVI) Limited
- Yoshiaki Kinoshita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive composition of chemical amplification type
- Patent number 6,358,665
- Issue date Mar 19, 2002
- Clariant International Ltd.
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for preparing resists
- Patent number 6,284,427
- Issue date Sep 4, 2001
- Clariant Finance (BVI) Limited
- Hiroshi Okazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acid-labile group protected hydroxystyrene polymers or copolymers t...
- Patent number 5,852,128
- Issue date Dec 22, 1998
- Clariant AG
- Munirathna Padmanaban
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition containing plasticizer
- Patent number 5,846,690
- Issue date Dec 8, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture
- Patent number 5,843,319
- Issue date Dec 1, 1998
- Hoechst Japan Limited
- Klaus Juergen Przybilla
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 5,773,191
- Issue date Jun 30, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition
- Patent number 5,738,972
- Issue date Apr 14, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming material including photoacid and photobase generato...
- Patent number 5,691,100
- Issue date Nov 25, 1997
- Hoechst Japan Limited
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive mixture comprising a basic iodonium compound
- Patent number 5,663,035
- Issue date Sep 2, 1997
- Hoechst Japan Limited
- Seiya Masuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Colored, photosensitive resin composition
- Patent number 5,641,594
- Issue date Jun 24, 1997
- Hoechst Japan Limited
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition
- Patent number 5,595,855
- Issue date Jan 21, 1997
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture
- Patent number 5,525,453
- Issue date Jun 11, 1996
- Hoechst Japan Limited
- Klaus J. Przybilla
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Radiation-sensitive resin composition, process for producing the sa...
- Publication number 20070160927
- Publication date Jul 12, 2007
- Kenichi Murakami
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION
- Publication number 20010036589
- Publication date Nov 1, 2001
- YOSHIAKI KINOSHITA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Novel process for preparing resists
- Publication number 20010024765
- Publication date Sep 27, 2001
- Hiroshi Okazaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Yoshiaki Kinoshita

Person

Patents Grantslast 30 patents

High current density electrolytic decomposition process for copper

Process for preparing resists

Pattern forming method

Chemically amplified resist composition

Radiation-sensitive composition of chemical amplification type

Process for preparing resists

Acid-labile group protected hydroxystyrene polymers or copolymers t...

Radiation-sensitive composition containing plasticizer

Positive-working radiation-sensitive mixture

Radiation-sensitive composition

Radiation sensitive composition

Pattern forming material including photoacid and photobase generato...

Radiation-sensitive mixture comprising a basic iodonium compound

Colored, photosensitive resin composition

Radiation sensitive composition

Positive-working radiation-sensitive mixture

Patents Applicationslast 30 patents

Radiation-sensitive resin composition, process for producing the sa...

CHEMICALLY AMPLIFIED RESIST COMPOSITION

Novel process for preparing resists