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Yoshifumi Oizumi
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Tokyo, JP
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last 30 patents
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Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
10,048,586
Issue date
Aug 14, 2018
JSR Corporation
Yuusuke Asano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
9,513,548
Issue date
Dec 6, 2016
JSR Corporation
Yuusuke Asano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
9,261,780
Issue date
Feb 16, 2016
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
8,728,706
Issue date
May 20, 2014
JSR Corporation
Yuusuke Asano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Radiation-sensitive resin composition
Patent number
8,722,306
Issue date
May 13, 2014
JSR Corporation
Hirokazu Sakakibara
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
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Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20160179003
Publication date
Jun 23, 2016
JSR Corporation
Yuusuke ASANO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20140212813
Publication date
Jul 31, 2014
JSR Corporation
Yuusuke ASANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20140004463
Publication date
Jan 2, 2014
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20130143160
Publication date
Jun 6, 2013
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20120237875
Publication date
Sep 20, 2012
JSR Corporation
Yuusuke ASANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
Publication number
20110143279
Publication date
Jun 16, 2011
JSR Corporation
Tsutomu SHIMOKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
Publication number
20100178608
Publication date
Jul 15, 2010
JSR Corporation
Hirokazu Sakakibara
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...