Yoshiharu Fukasawa

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mo-W material for formation of wiring, Mo-W target and method for p...
- Patent number 7,153,589
- Issue date Dec 26, 2006
- Kabushiki Kaisha Toshiba
- Yasuo Kohsaka
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Refractory metal silicide target, method of manufacturing the targe...
- Patent number 6,352,628
- Issue date Mar 5, 2002
- Kabushiki Kaisha Toshiba
- Michio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Refractory metal silicide target, method of manufacturing the targe...
- Patent number 6,309,593
- Issue date Oct 30, 2001
- Kabushiki Kaisha Toshiba
- Michio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mo-W material for formation of wiring, Mo-W target and method for p...
- Patent number 6,200,694
- Issue date Mar 13, 2001
- Kabushiki Kaisha Toshiba
- Yasuo Kohsaka
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Mo-W material for formation of wiring, Mo-W target and method for p...
- Patent number 5,913,100
- Issue date Jun 15, 1999
- Kabushiki Kaisha Toshiba
- Yasuo Kohsaka
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Film forming apparatus
- Patent number 5,512,155
- Issue date Apr 30, 1996
- Kabushiki Kaisha Toshiba
- Yoshiharu Fukasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target
- Patent number 5,190,630
- Issue date Mar 2, 1993
- Kabushiki Kaisha Toshiba
- Makoto Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target
- Patent number 4,966,676
- Issue date Oct 30, 1990
- Kabushiki Kaisha Toshiba
- Yoshiharu Fukasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering alloy target and method of producing an alloy film
- Patent number 4,963,240
- Issue date Oct 16, 1990
- Kabushiki Kaisha Toshiba
- Yoshiharu Fukasawa
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputtering target
- Patent number 4,842,706
- Issue date Jun 27, 1989
- Kabushiki Kaisha Toshiba
- Yoshiharu Fukasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Molybdenum board and process of manufacturing the same
- Patent number 4,514,234
- Issue date Apr 30, 1985
- Tokyo Shibaura Denki Kabushiki Kaisha
- Yoshiharu Fukasawa
- B22 - CASTING POWDER METALLURGY

Patents Applicationslast 30 patents

Information Patent Application
Refractory metal silicide target, method of manufacturing the targe...
- Publication number 20010037938
- Publication date Nov 8, 2001
- KABUSHIKI KAISHA TOSHIBA
- Michio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yoshiharu Fukasawa

Person

Patents Grantslast 30 patents

Mo-W material for formation of wiring, Mo-W target and method for p...

Refractory metal silicide target, method of manufacturing the targe...

Refractory metal silicide target, method of manufacturing the targe...

Mo-W material for formation of wiring, Mo-W target and method for p...

Mo-W material for formation of wiring, Mo-W target and method for p...

Film forming apparatus

Sputtering target

Sputtering target

Sputtering alloy target and method of producing an alloy film

Sputtering target

Molybdenum board and process of manufacturing the same

Patents Applicationslast 30 patents

Refractory metal silicide target, method of manufacturing the targe...