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Yoshiharu INOUE

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Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 10,600,619
    • Issue date Mar 24, 2020
    • Hitachi High-Technologies Corporation
    • Yoshiharu Inoue
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method
    • Patent number 9,349,603
    • Issue date May 24, 2016
    • Hitachi High-Technologies Corporation
    • Yoshiharu Inoue
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method
    • Patent number 8,828,254
    • Issue date Sep 9, 2014
    • Hitachi High-Technologies Corporation
    • Yoshiharu Inoue
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method
    • Patent number 8,801,951
    • Issue date Aug 12, 2014
    • Hitachi High-Technologies Corporation
    • Yoshiharu Inoue
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Dry etching method
    • Patent number 8,207,066
    • Issue date Jun 26, 2012
    • Hitachi High-Technologies Corporation
    • Yoshiharu Inoue
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20200273683
    • Publication date Aug 27, 2020
    • Hitachi High-Technologies Corporation
    • Yuta TAKAGI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20200161092
    • Publication date May 21, 2020
    • Hitachi High-Technologies Corporation
    • Yoshiharu Inoue
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20160225587
    • Publication date Aug 4, 2016
    • Hitachi High-Technologies Corporation
    • Yoshiharu Inoue
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20140349418
    • Publication date Nov 27, 2014
    • Yoshiharu INOUE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20130029492
    • Publication date Jan 31, 2013
    • Hitachi High-Technologies Corporation
    • Yoshiharu INOUE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20130001197
    • Publication date Jan 3, 2013
    • Hitachi High-Technologies Corporation
    • Yoshiharu INOUE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DRY ETCHING METHOD
    • Publication number 20100255612
    • Publication date Oct 7, 2010
    • Hitachi High-Technologies Corporation
    • Yoshiharu INOUE
    • H01 - BASIC ELECTRIC ELEMENTS