Yoshihiko Nagata

Person

Gunma, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pellicle for lithography and a method of making thereof
- Patent number 8,956,788
- Issue date Feb 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for hermetically closing an air-tight bag for pellicle
- Patent number 8,590,281
- Issue date Nov 26, 2013
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Pellicle for lithography and a method for making the same
- Patent number 8,273,507
- Issue date Sep 25, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pellicle for photolithography
- Patent number 8,192,899
- Issue date Jun 5, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for photolithography and pellicle frame
- Patent number 7,927,763
- Issue date Apr 19, 2011
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Pellicle for lithography
- Patent number 7,604,904
- Issue date Oct 20, 2009
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a pellicle for lithography
- Patent number 7,432,023
- Issue date Oct 7, 2008
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pellicle for lithography
- Patent number 7,067,222
- Issue date Jun 27, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method, apparatus, and system for inspecting transparent objects
- Patent number 6,396,579
- Issue date May 28, 2002
- Shin-Etsu Chemical Co., Ltd.
- Mitsuru Hayamizu
- G01 - MEASURING TESTING
Information Patent Grant
Frame-supported pellicle for dustproof protection of photomask in p...
- Patent number 5,693,382
- Issue date Dec 2, 1997
- Shin-Etsu Chemical Co., Ltd.
- Yuichi Hamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for protection of photolithographic mask
- Patent number 5,691,088
- Issue date Nov 25, 1997
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiro Kubota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frame-supported pellicle for dustproof protection of photomask
- Patent number 5,616,927
- Issue date Apr 1, 1997
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiro Kubota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frame-supported pellicle for dustproof protection of photomask
- Patent number 5,470,621
- Issue date Nov 28, 1995
- Shin-Etsu Chemical Co., Ltd.
- Meguru Kashida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frame-supported pellicle for dustproof protection of photomask
- Patent number 5,419,972
- Issue date May 30, 1995
- Shin-Etsu Chemical Co., Ltd.
- Sakae Kawaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frame-supported pellicle for photolithography
- Patent number 5,378,514
- Issue date Jan 3, 1995
- Shin-Etsu Chemical Co., Ltd.
- Yuichi Hamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of a frame-supported pellicle for photol...
- Patent number 5,368,675
- Issue date Nov 29, 1994
- Shin-Etsu Chemical Co., Ltd.
- Yuichi Hamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of a frame-supported pellicle for photol...
- Patent number 5,327,808
- Issue date Jul 12, 1994
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- B26 - HAND CUTTING TOOLS CUTTING SEVERING
Information Patent Grant
X-ray transmitting membrane for mask in x-ray lithography and metho...
- Patent number 5,326,649
- Issue date Jul 5, 1994
- Shin-Etsu Chemical Co., Ltd.
- Meguru Kashida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of a resin membrane
- Patent number 5,308,567
- Issue date May 3, 1994
- Shin-Etsu Chemical Co., Ltd.
- Meguru Kashida
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Frame-supported pellicle for photolithography, comprising a fluoroc...
- Patent number 5,300,348
- Issue date Apr 5, 1994
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiro Kubota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for photolithographic mask
- Patent number 5,286,567
- Issue date Feb 15, 1994
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiro Kubota
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
X-ray permeable membrane for X-ray lithographic mask
- Patent number 5,246,802
- Issue date Sep 21, 1993
- Shin-Etsu Chemical Co., Ltd.
- Meguru Kashida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
X-ray permeable membrane for X-ray lithographic mask
- Patent number 5,234,609
- Issue date Aug 10, 1993
- Shin-Etsu Chemical Co., Ltd.
- Meguru Kashida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Membrane consisting of silicon carbide and silicon nitride, method...
- Patent number 5,209,996
- Issue date May 11, 1993
- Shin-Etsu Chemical Co., Ltd.
- Meguru Kashida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray lithographic mask blank with reinforcement
- Patent number 5,199,055
- Issue date Mar 30, 1993
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Noguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film-forming on substrate by sputtering
- Patent number 5,139,633
- Issue date Aug 18, 1992
- Shin-Etsu Chemical Co., Ltd.
- Meguru Kashida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for the preparation of a silicon carbide-silicon nitride com...
- Patent number 5,098,515
- Issue date Mar 24, 1992
- Shin-Etsu Chemical Co., Ltd.
- Meguru Kashida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon carbide membrane for X-ray lithography and method for the p...
- Patent number 5,089,085
- Issue date Feb 18, 1992
- Shin-Etsu Chemical Co., Ltd.
- Meguru Kashida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PELLICLE FOR LITHOGRAPHY AND A METHOD OF MAKING THEREOF
- Publication number 20130065164
- Publication date Mar 14, 2013
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR STORING A PELLICLE
- Publication number 20120247069
- Publication date Oct 4, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for hermetically closing an air-tight bag for pellicle
- Publication number 20110280503
- Publication date Nov 17, 2011
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pellicle for lithography and a method for making the same
- Publication number 20110132258
- Publication date Jun 9, 2011
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko NAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pellicle for photolithography
- Publication number 20100190097
- Publication date Jul 29, 2010
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pellicle for photolithography and pellicle frame
- Publication number 20060141209
- Publication date Jun 29, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Method for producing a pellicle for lithography
- Publication number 20050281954
- Publication date Dec 22, 2005
- SHIN-ETSU CHEMICAL CO., LTD.
- Yoshihiko Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pellicle for lithography
- Publication number 20050048380
- Publication date Mar 3, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiko Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pellicle for lithography, and a method for producing it
- Publication number 20040091796
- Publication date May 13, 2004
- SHIN-ETSU CHEMICAL CO., LTD.
- Yoshihiko Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yoshihiko Nagata

Person

Patents Grantslast 30 patents

Pellicle for lithography and a method of making thereof

Method for hermetically closing an air-tight bag for pellicle

Pellicle for lithography and a method for making the same

Pellicle for photolithography

Pellicle for photolithography and pellicle frame

Pellicle for lithography

Method for producing a pellicle for lithography

Pellicle for lithography

Method, apparatus, and system for inspecting transparent objects

Frame-supported pellicle for dustproof protection of photomask in p...

Pellicle for protection of photolithographic mask

Frame-supported pellicle for dustproof protection of photomask

Frame-supported pellicle for dustproof protection of photomask

Frame-supported pellicle for dustproof protection of photomask

Frame-supported pellicle for photolithography

Method for the preparation of a frame-supported pellicle for photol...

Method for the preparation of a frame-supported pellicle for photol...

X-ray transmitting membrane for mask in x-ray lithography and metho...

Method for the preparation of a resin membrane

Frame-supported pellicle for photolithography, comprising a fluoroc...

Pellicle for photolithographic mask

X-ray permeable membrane for X-ray lithographic mask

X-ray permeable membrane for X-ray lithographic mask

Membrane consisting of silicon carbide and silicon nitride, method...

X-ray lithographic mask blank with reinforcement

Film-forming on substrate by sputtering

Method for the preparation of a silicon carbide-silicon nitride com...

Silicon carbide membrane for X-ray lithography and method for the p...

Patents Applicationslast 30 patents

PELLICLE FOR LITHOGRAPHY AND A METHOD OF MAKING THEREOF

METHOD FOR STORING A PELLICLE

Method for hermetically closing an air-tight bag for pellicle

Pellicle for lithography and a method for making the same

Pellicle for photolithography

Pellicle for photolithography and pellicle frame

Method for producing a pellicle for lithography

Pellicle for lithography

Pellicle for lithography, and a method for producing it