Yoshihiro Kai

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 12,183,613
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 11,978,644
- Issue date May 7, 2024
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,887,871
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Kazushige Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 11,862,486
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Kazuki Kosai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,742,223
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Yuji Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,574,827
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Tadashi Iino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 11,469,114
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,851,468
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Tadashi Iino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 10,770,316
- Issue date Sep 8, 2020
- Tokyo Electron Limited
- Kazuki Kosai
- B08 - CLEANING
Information Patent Grant
Nozzle cleaning device, nozzle cleaning method, and substrate proce...
- Patent number 10,700,166
- Issue date Jun 30, 2020
- Tokyo Electron Limited
- Yoshihiro Kai
- B08 - CLEANING
Information Patent Grant
Chemical fluid processing apparatus and chemical fluid processing m...
- Patent number 10,062,586
- Issue date Aug 28, 2018
- Tokyo Electron Limited
- Derek W Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 9,842,751
- Issue date Dec 12, 2017
- Tokyo Electron Limited
- Shouta Umezaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and nozzle cleaning method
- Patent number 9,764,345
- Issue date Sep 19, 2017
- Tokyo Electron Limited
- Yoshihiro Kai
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Liquid processing apparatus and cleaning method
- Patent number 9,387,520
- Issue date Jul 12, 2016
- Tokyo Electron Limited
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Grant
Two-fluid nozzle and substrate liquid processing apparatus and subs...
- Patent number 9,214,365
- Issue date Dec 15, 2015
- Tokyo Electron Limited
- Yoshihiro Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid treatment apparatus with lift pin plate
- Patent number 9,048,269
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid cleaning apparatus with controlled liquid port eje...
- Patent number 9,022,045
- Issue date May 5, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Assembly method of transfer mechanism and transfer chamber
- Patent number 8,499,430
- Issue date Aug 6, 2013
- Tokyo Electron Limited
- Youhei Yamada
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20250087515
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20240242975
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20220392779
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20210111038
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20210111054
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20210035825
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Kazushige Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...
- Publication number 20200365424
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Kazuki Kosai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200357667
- Publication date Nov 12, 2020
- TOKYO ELECTRON LIMITED
- Tadashi IINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200227290
- Publication date Jul 16, 2020
- TOKYO ELECTRON LIMITED
- Yuji Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE DRYING APPARATUS
- Publication number 20190279884
- Publication date Sep 12, 2019
- TOKYO ELECTRON LIMITED
- Koji Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...
- Publication number 20180337067
- Publication date Nov 22, 2018
- TOKYO ELECTRON LIMITED
- Kazuki Kosai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20170283977
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Tadashi IINO
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS
- Publication number 20160114345
- Publication date Apr 28, 2016
- TOKYO ELECTRON LIMITED
- Shouta Umezaki
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Chemical Fluid Processing Apparatus and Chemical Fluid Processing M...
- Publication number 20150031214
- Publication date Jan 29, 2015
- TOKYO ELECTRON LIMITED
- Derek W Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND NOZZLE CLEANING METHOD
- Publication number 20140352730
- Publication date Dec 4, 2014
- TOKYO ELECTRON LIMITED
- Yoshihiro Kai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
LIQUID PROCESSING APPARATUS AND CLEANING METHOD
- Publication number 20140026927
- Publication date Jan 30, 2014
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Application
NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, AND SUBSTRATE PROCE...
- Publication number 20130319470
- Publication date Dec 5, 2013
- TOKYO ELECTRON LIMITED
- Yoshihiro Kai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
TWO-FLUID NOZZLE AND SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBS...
- Publication number 20120325274
- Publication date Dec 27, 2012
- TOKYO ELECTRON LIMITED
- Yoshihiro Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TWO-FLUID NOZZLE, SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE...
- Publication number 20120227770
- Publication date Sep 13, 2012
- TOKYO ELECTRON LIMITED
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID TREATMENT APPARATUS AND METHOD
- Publication number 20120160278
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID TREATMENT APPARATUS AND METHOD
- Publication number 20120160275
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSEMBLY METHOD OF TRANSFER MECHANISM AND TRANSFER CHAMBER
- Publication number 20110027058
- Publication date Feb 3, 2011
- TOKYO ELECTRON LIMITED
- Youhei YAMADA
- H01 - BASIC ELECTRIC ELEMENTS

Yoshihiro Kai

Person

Patents Grantslast 30 patents

Substrate processing system and substrate processing method

Substrate processing system and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate liquid processing apparatus, substrate liquid processing...

Substrate processing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing system and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate liquid processing apparatus, substrate liquid processing...

Nozzle cleaning device, nozzle cleaning method, and substrate proce...

Chemical fluid processing apparatus and chemical fluid processing m...

Substrate liquid processing apparatus

Substrate processing apparatus and nozzle cleaning method

Liquid processing apparatus and cleaning method

Two-fluid nozzle and substrate liquid processing apparatus and subs...

Substrate liquid treatment apparatus with lift pin plate

Substrate liquid cleaning apparatus with controlled liquid port eje...

Assembly method of transfer mechanism and transfer chamber

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE DRYING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE LIQUID PROCESSING APPARATUS

Chemical Fluid Processing Apparatus and Chemical Fluid Processing M...

SUBSTRATE PROCESSING APPARATUS AND NOZZLE CLEANING METHOD

LIQUID PROCESSING APPARATUS AND CLEANING METHOD

NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, AND SUBSTRATE PROCE...

TWO-FLUID NOZZLE AND SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBS...

TWO-FLUID NOZZLE, SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE...

LIQUID TREATMENT APPARATUS AND METHOD

LIQUID TREATMENT APPARATUS AND METHOD

ASSEMBLY METHOD OF TRANSFER MECHANISM AND TRANSFER CHAMBER