Yoshihiro Koyama

Person

Chiba, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Liquid metal ion source and focused ion beam apparatus
- Patent number 11,749,493
- Issue date Sep 5, 2023
- Hitachi High-Tech Science Corporation
- Yoshihiro Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, thin film forming method, defect c...
- Patent number 9,257,273
- Issue date Feb 9, 2016
- Hitachi High-Tech Science Corporation
- Yoshihiro Koyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Focused ion beam apparatus
- Patent number 8,822,945
- Issue date Sep 2, 2014
- SII NanoTechnology Inc.
- Kenichi Nishinaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 8,513,602
- Issue date Aug 20, 2013
- SII NanoTechnology Inc.
- Takashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 8,389,953
- Issue date Mar 5, 2013
- SII NanoTechnology Inc.
- Takashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for repairing a phase shift mask and a focused ion beam appa...
- Patent number 6,891,171
- Issue date May 10, 2005
- SII NanoTechnology Inc.
- Ryoji Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus having a gas injector in which one of a...
- Patent number 6,576,913
- Issue date Jun 10, 2003
- Seiko Instruments Inc.
- Yoshihiro Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micromachining method for workpiece observation
- Patent number 6,395,347
- Issue date May 28, 2002
- Seiko Instruments Inc.
- Tatsuya Adachi
- G01 - MEASURING TESTING
Information Patent Grant
Focused ion beam processing apparatus
- Patent number 6,365,905
- Issue date Apr 2, 2002
- Seiko Instruments Inc.
- Yoshihiro Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 6,348,689
- Issue date Feb 19, 2002
- Seiko Instruments Inc.
- Yoshihiro Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam system
- Patent number 6,225,627
- Issue date May 1, 2001
- Seiko Instruments Inc.
- Yoshihiro Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam working apparatus
- Patent number 6,118,122
- Issue date Sep 12, 2000
- Seiko Instruments, Inc.
- Yoshihiro Koyama
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LIQUID METAL ION SOURCE AND FOCUSED ION BEAM APPARATUS
- Publication number 20210090842
- Publication date Mar 25, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yoshihiro KOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, THIN FILM FORMING METHOD, DEFECT C...
- Publication number 20130224889
- Publication date Aug 29, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yoshihiro Koyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Focused ion beam apparatus
- Publication number 20110233401
- Publication date Sep 29, 2011
- Kenichi Nishinaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused ion beam apparatus
- Publication number 20110204252
- Publication date Aug 25, 2011
- Takashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20100219339
- Publication date Sep 2, 2010
- Takashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas injector in which one of a plurality of nozzles can be selectiv...
- Publication number 20020171050
- Publication date Nov 21, 2002
- Yoshihiro Koyama
- H01 - BASIC ELECTRIC ELEMENTS

Yoshihiro Koyama

Person

Patents Grantslast 30 patents

Liquid metal ion source and focused ion beam apparatus

Charged particle beam apparatus, thin film forming method, defect c...

Focused ion beam apparatus

Focused ion beam apparatus

Focused ion beam apparatus

Method for repairing a phase shift mask and a focused ion beam appa...

Focused ion beam apparatus having a gas injector in which one of a...

Micromachining method for workpiece observation

Focused ion beam processing apparatus

Focused ion beam apparatus

Focused ion beam system

Ion beam working apparatus

Patents Applicationslast 30 patents

LIQUID METAL ION SOURCE AND FOCUSED ION BEAM APPARATUS

CHARGED PARTICLE BEAM APPARATUS, THIN FILM FORMING METHOD, DEFECT C...

Focused ion beam apparatus

Focused ion beam apparatus

FOCUSED ION BEAM APPARATUS

Gas injector in which one of a plurality of nozzles can be selectiv...