Yoshihiro UMEZAWA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,340,975
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Takehisa Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma state detection method, and pla...
- Patent number 11,935,731
- Issue date Mar 19, 2024
- Tokyo Electron Limited
- Daisuke Hayashi
- G08 - SIGNALLING
Information Patent Grant
Plasma processing apparatus
- Patent number 11,804,366
- Issue date Oct 31, 2023
- Tokyo Electron Limited
- Yuki Hosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,348,768
- Issue date May 31, 2022
- Tokyo Electron Limited
- Yuki Hosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,101,114
- Issue date Aug 24, 2021
- Tokyo Electron Limited
- Yuki Hosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply mechanism and semiconductor manufacturing system
- Patent number 10,950,467
- Issue date Mar 16, 2021
- Tokyo Electron Limited
- Yuki Hosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching object to be processed
- Patent number 10,685,816
- Issue date Jun 16, 2020
- Tokyo Electron Limited
- Yoshihiro Umezawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply mechanism and semiconductor manufacturing system
- Patent number 10,636,683
- Issue date Apr 28, 2020
- Tokyo Electron Limited
- Yuki Hosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply mechanism and semiconductor manufacturing apparatus
- Patent number 10,510,514
- Issue date Dec 17, 2019
- Tokyo Electron Limited
- Yuki Hosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam irradiation apparatus and substrate processing apparatus
- Patent number 10,204,766
- Issue date Feb 12, 2019
- Tokyo Electron Limited
- Yoshihiro Umezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature control device for processing target object and method...
- Patent number 10,192,774
- Issue date Jan 29, 2019
- Tokyo Electron Limited
- Yuki Hosaka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA STATE DETECTION METHOD, AND PLA...
- Publication number 20240186125
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- G05 - CONTROLLING REGULATING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220005672
- Publication date Jan 6, 2022
- TOKYO ELECTRON LIMITED
- Takehisa SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210375597
- Publication date Dec 2, 2021
- TOKYO ELECTRON LIMITED
- Yuki HOSAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210320009
- Publication date Oct 14, 2021
- TOKYO ELECTRON LIMITED
- Yuki HOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA STATE DETECTION METHOD, AND PLA...
- Publication number 20210020418
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200266034
- Publication date Aug 20, 2020
- TOKYO ELECTRON LIMITED
- Yuki HOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190131136
- Publication date May 2, 2019
- TOKYO ELECTRON LIMITED
- Yuki HOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING OBJECT TO BE PROCESSED
- Publication number 20180337025
- Publication date Nov 22, 2018
- TOKYO ELECTRON LIMITED
- Yoshihiro UMEZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION BEAM IRRADIATION APPARATUS AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180108516
- Publication date Apr 19, 2018
- TOKYO ELECTRON LIMITED
- Yoshihiro UMEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY MECHANISM AND SEMICONDUCTOR MANUFACTURING APPRATUS
- Publication number 20170301518
- Publication date Oct 19, 2017
- TOKYO ELECTRON LIMITED
- Yuki HOSAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPERATURE CONTROL DEVICE FOR PROCESSING TARGET OBJECT AND METHOD...
- Publication number 20170301579
- Publication date Oct 19, 2017
- TOKYO ELECTRON LIMITED
- Yuki Hosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY MECHANISM AND SEMICONDUCTOR MANUFACTURING SYSTEM
- Publication number 20170301568
- Publication date Oct 19, 2017
- TOKYO ELECTRON LIMITED
- Yuki HOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170092513
- Publication date Mar 30, 2017
- TOKYO ELECTRON LIMITED
- Yuki HOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160260582
- Publication date Sep 8, 2016
- TOKYO ELECTRON LIMITED
- Yuki HOSAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yoshihiro UMEZAWA

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus, plasma state detection method, and pla...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Gas supply mechanism and semiconductor manufacturing system

Method of etching object to be processed

Gas supply mechanism and semiconductor manufacturing system

Gas supply mechanism and semiconductor manufacturing apparatus

Ion beam irradiation apparatus and substrate processing apparatus

Temperature control device for processing target object and method...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS, PLASMA STATE DETECTION METHOD, AND PLA...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA STATE DETECTION METHOD, AND PLA...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

METHOD OF ETCHING OBJECT TO BE PROCESSED

ION BEAM IRRADIATION APPARATUS AND SUBSTRATE PROCESSING APPARATUS

GAS SUPPLY MECHANISM AND SEMICONDUCTOR MANUFACTURING APPRATUS

TEMPERATURE CONTROL DEVICE FOR PROCESSING TARGET OBJECT AND METHOD...

GAS SUPPLY MECHANISM AND SEMICONDUCTOR MANUFACTURING SYSTEM

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS