Yoshihiro Uozumi

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 12,068,267
- Issue date Aug 20, 2024
- Kioxia Corporation
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,921,428
- Issue date Mar 5, 2024
- Kioxia Corporation
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,621,239
- Issue date Apr 4, 2023
- Kioxia Corporation
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,581,277
- Issue date Feb 14, 2023
- Kioxia Corporation
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method using hydrogen peroxide solution containing tungsten
- Patent number 9,929,017
- Issue date Mar 27, 2018
- TOSHIBA MEMORY CORPORATION
- Nagisa Takami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 9,213,242
- Issue date Dec 15, 2015
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing semiconductor memory device and semiconduc...
- Patent number 8,946,809
- Issue date Feb 3, 2015
- Kabushiki Kaisha Toshiba
- Kazuhide Takamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device including a stacked...
- Patent number 8,912,089
- Issue date Dec 16, 2014
- Kabushiki Kaisha Toshiba
- Seiichi Omoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post-dry etching cleaning liquid composition and process for fabric...
- Patent number 8,513,140
- Issue date Aug 20, 2013
- Sony Corporation
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 7,884,027
- Issue date Feb 8, 2011
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and cleaning apparatus
- Patent number 7,850,818
- Issue date Dec 14, 2010
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor device manufacturing method and chemical fluid used f...
- Patent number 7,776,754
- Issue date Aug 17, 2010
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and cleaning apparatus
- Patent number 7,635,601
- Issue date Dec 22, 2009
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,405,133
- Issue date Jul 29, 2008
- Kabushiki Kaisha Toshiba
- Katsuaki Natori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating tube, semiconductor device employing the tube, and metho...
- Patent number 7,345,352
- Issue date Mar 18, 2008
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating tube, semiconductor device employing the tube, and metho...
- Patent number 7,282,437
- Issue date Oct 16, 2007
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plating a metal or metal compound on a semiconductor subs...
- Patent number 7,183,203
- Issue date Feb 27, 2007
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,022,580
- Issue date Apr 4, 2006
- Kabushiki Kaisha Toshiba
- Katsuaki Natori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating tube
- Patent number 6,995,472
- Issue date Feb 7, 2006
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plating a metal or metal compound on a semiconductor subs...
- Patent number 6,818,556
- Issue date Nov 16, 2004
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,492,271
- Issue date Dec 10, 2002
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating metal wiring on a semiconductor substrate usi...
- Patent number 6,475,909
- Issue date Nov 5, 2002
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 6,459,111
- Issue date Oct 1, 2002
- Kabushiki Kaisha Toshiba
- Katsuaki Natori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a copper oxide film to etch a copper surface evenly
- Patent number 6,261,953
- Issue date Jul 17, 2001
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20230130044
- Publication date Apr 27, 2023
- KIOXIA Corporation
- Yoshihiro UOZUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220181171
- Publication date Jun 9, 2022
- KIOXIA Corporation
- Yoshihiro UOZUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20210091024
- Publication date Mar 25, 2021
- KIOXIA Corporation
- Yoshihiro UOZUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190214277
- Publication date Jul 11, 2019
- Toshiba Memory Corporation
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20160071747
- Publication date Mar 10, 2016
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR MEMORY DEVICE AND SEMICONDUC...
- Publication number 20140284691
- Publication date Sep 25, 2014
- KABUSHIKI KAISHA TOSHIBA
- Kazuhide Takamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, ETCHING APPARATUS AND CHEMICAL SOLUTION
- Publication number 20140073069
- Publication date Mar 13, 2014
- Kabushiki Kaisha Toshiba
- Nagisa TAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20140061752
- Publication date Mar 6, 2014
- Kabushiki Kaisha Toshiba
- Seiichi Omoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20130196512
- Publication date Aug 1, 2013
- Tatsuhiko KOIDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20130008868
- Publication date Jan 10, 2013
- Yoshihiro UOZUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20110014793
- Publication date Jan 20, 2011
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing semiconductor device and cleaning apparatus
- Publication number 20100059180
- Publication date Mar 11, 2010
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE FABRICATION METHOD
- Publication number 20090286391
- Publication date Nov 19, 2009
- Kabushiki Kaisha Toshiba
- Takahito Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxidation protection apparatus and method for chemical liquid
- Publication number 20090004052
- Publication date Jan 1, 2009
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20080188085
- Publication date Aug 7, 2008
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing semiconductor device and cleaning apparatus
- Publication number 20070178613
- Publication date Aug 2, 2007
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Insulating tube, semiconductor device employing the tube, and metho...
- Publication number 20070170594
- Publication date Jul 26, 2007
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20070105378
- Publication date May 10, 2007
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device manufacturing method and chemical fluid used f...
- Publication number 20070082491
- Publication date Apr 12, 2007
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device fabrication method
- Publication number 20070054482
- Publication date Mar 8, 2007
- Takahito Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Insulating tube, semiconductor device employing the tube, and metho...
- Publication number 20060054990
- Publication date Mar 16, 2006
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device fabrication method
- Publication number 20060051969
- Publication date Mar 9, 2006
- Takahito Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20060019201
- Publication date Jan 26, 2006
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of plating a metal or metal or metal compound on a semicondu...
- Publication number 20050064700
- Publication date Mar 24, 2005
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Insulating tube, semiconductor device employing the tube, and metho...
- Publication number 20050023690
- Publication date Feb 3, 2005
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming copper oxide film, method of etching copper film,...
- Publication number 20030001271
- Publication date Jan 2, 2003
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20020190290
- Publication date Dec 19, 2002
- Kabushiki Kaisha Toshiba
- Katsuaki Natori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming copper oxide film, method of etching copper film,...
- Publication number 20010034125
- Publication date Oct 25, 2001
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yoshihiro Uozumi

Person

Patents Grantslast 30 patents

Semiconductor device and method for manufacturing the same

Substrate processing method and substrate processing apparatus

Semiconductor device and method for manufacturing the same

Semiconductor device and method for manufacturing the same

Etching method using hydrogen peroxide solution containing tungsten

Substrate processing method and substrate processing apparatus

Method for manufacturing semiconductor memory device and semiconduc...

Method for manufacturing a semiconductor device including a stacked...

Post-dry etching cleaning liquid composition and process for fabric...

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device and cleaning apparatus

Semiconductor device manufacturing method and chemical fluid used f...

Method of manufacturing semiconductor device and cleaning apparatus

Semiconductor device and method for manufacturing the same

Insulating tube, semiconductor device employing the tube, and metho...

Insulating tube, semiconductor device employing the tube, and metho...

Method of plating a metal or metal compound on a semiconductor subs...

Semiconductor device and method for manufacturing the same

Insulating tube

Method of plating a metal or metal compound on a semiconductor subs...

Semiconductor device and method of manufacturing the same

Method of fabricating metal wiring on a semiconductor substrate usi...

Semiconductor device and method for manufacturing the same

Method of forming a copper oxide film to etch a copper surface evenly

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD FOR MANUFACTURING SEMICONDUCTOR MEMORY DEVICE AND SEMICONDUC...

ETCHING METHOD, ETCHING APPARATUS AND CHEMICAL SOLUTION

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Post-dry etching cleaning liquid composition and process for fabric...

Method of manufacturing semiconductor device and cleaning apparatus

SEMICONDUCTOR DEVICE FABRICATION METHOD

Oxidation protection apparatus and method for chemical liquid

Post-dry etching cleaning liquid composition and process for fabric...

Method of manufacturing semiconductor device and cleaning apparatus

Insulating tube, semiconductor device employing the tube, and metho...

Method of manufacturing semiconductor device

Semiconductor device manufacturing method and chemical fluid used f...

Semiconductor device fabrication method

Insulating tube, semiconductor device employing the tube, and metho...

Semiconductor device fabrication method

Post-dry etching cleaning liquid composition and process for fabric...

Method of plating a metal or metal or metal compound on a semicondu...

Insulating tube, semiconductor device employing the tube, and metho...

Method of forming copper oxide film, method of etching copper film,...

Semiconductor device and method for manufacturing the same

Method of forming copper oxide film, method of etching copper film,...