Yoshihisa Oae

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,646,275
- Issue date Nov 11, 2003
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,486,479
- Issue date Nov 26, 2002
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for exposing an exposure pattern on an object by...
- Patent number 6,118,129
- Issue date Sep 12, 2000
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle beam exposure system and method
- Patent number 6,064,807
- Issue date May 16, 2000
- Fujitsu Limited
- Soichiro Arai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,977,548
- Issue date Nov 2, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of providing changed particle beam exposure in which represe...
- Patent number 5,965,895
- Issue date Oct 12, 1999
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system
- Patent number 5,920,077
- Issue date Jul 6, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for exposing pattern on object by charged part...
- Patent number 5,841,145
- Issue date Nov 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,721,432
- Issue date Feb 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,719,402
- Issue date Feb 17, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron-beam exposure system for reduced distortion of electron be...
- Patent number 5,631,113
- Issue date May 20, 1997
- Fujitsu Limited
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,614,725
- Issue date Mar 25, 1997
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Block exposure pattern data extracting system and method for charge...
- Patent number 5,590,048
- Issue date Dec 31, 1996
- Fujitsu Limited
- Tomohiko Abe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,546,319
- Issue date Aug 13, 1996
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,528,048
- Issue date Jun 18, 1996
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure system capable of detecting failure of exposure
- Patent number 5,449,915
- Issue date Sep 12, 1995
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron-beam exposure system for reduced distortion of electron be...
- Patent number 5,444,257
- Issue date Aug 22, 1995
- Fujitsu Limited
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transparent mask plate for charged particle beam exposure apparatus...
- Patent number 5,432,314
- Issue date Jul 11, 1995
- Fujitsu Limited
- Satoru Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Blanking aperture array type charged particle beam exposure
- Patent number 5,430,304
- Issue date Jul 4, 1995
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure apparatus
- Patent number 5,420,433
- Issue date May 30, 1995
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and an apparatus for charged particle beam exposure
- Patent number 5,404,018
- Issue date Apr 4, 1995
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure apparatus and method of cleaning the...
- Patent number 5,401,974
- Issue date Mar 28, 1995
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle beam exposure method
- Patent number 5,399,872
- Issue date Mar 21, 1995
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method of exposing a patt...
- Patent number 5,391,886
- Issue date Feb 21, 1995
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure method and apparatus
- Patent number 5,382,800
- Issue date Jan 17, 1995
- Fujitsu Limited
- Hisayasu Nishino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stencil mask and charge particle beam exposure method and apparatus...
- Patent number 5,376,802
- Issue date Dec 27, 1994
- Fujitsu Limited
- Kiichi Sakamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure method and system for exposing a pattern on...
- Patent number 5,369,282
- Issue date Nov 29, 1994
- Fujitsu Limited
- Soichiro Arai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of exposing patttern of semiconductor devices and stencil ma...
- Patent number 5,364,718
- Issue date Nov 15, 1994
- Fujitsu Limited
- Yoshihisa Oae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam exposure apparatus employing blanking aperture array
- Patent number 5,359,202
- Issue date Oct 25, 1994
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure including a heat blocking partition...
- Patent number 5,338,939
- Issue date Aug 16, 1994
- Fujitsu Limited
- Hisayasu Nishino
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Charged particle beam exposure system and method
- Publication number 20030025088
- Publication date Feb 6, 2003
- FUJITSU LIMITED
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY

Yoshihisa Oae

Person

Patents Grantslast 30 patents

Charged particle beam exposure system and method

Charged particle beam exposure system and method

Method and system for exposing an exposure pattern on an object by...

Charged-particle beam exposure system and method

Charged particle beam exposure system and method

Method of providing changed particle beam exposure in which represe...

Charged particle beam exposure system

Method of and system for exposing pattern on object by charged part...

Method of and system for charged particle beam exposure

Method of and system for charged particle beam exposure

Electron-beam exposure system for reduced distortion of electron be...

Charged particle beam exposure system and method

Block exposure pattern data extracting system and method for charge...

Method of and system for charged particle beam exposure

Charged particle beam exposure system and method

Electron beam exposure system capable of detecting failure of exposure

Electron-beam exposure system for reduced distortion of electron be...

Transparent mask plate for charged particle beam exposure apparatus...

Blanking aperture array type charged particle beam exposure

Charged particle beam exposure apparatus

Method of and an apparatus for charged particle beam exposure

Charged particle beam exposure apparatus and method of cleaning the...

Charged-particle beam exposure method

Charged particle beam exposure system and method of exposing a patt...

Charged particle beam exposure method and apparatus

Stencil mask and charge particle beam exposure method and apparatus...

Electron beam exposure method and system for exposing a pattern on...

Method of exposing patttern of semiconductor devices and stencil ma...

Electron beam exposure apparatus employing blanking aperture array

Charged particle beam exposure including a heat blocking partition...

Patents Applicationslast 30 patents

Charged particle beam exposure system and method