Yoshihisa Ooae

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Stage device
- Patent number 8,530,857
- Issue date Sep 10, 2013
- Advantest Corp.
- Yoshihisa Ooae
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Multi-column electron beam exposure apparatus and magnetic field ge...
- Patent number 8,390,201
- Issue date Mar 5, 2013
- Advantest Corp.
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron gun, electron beam exposure apparatus, and exposure method
- Patent number 7,919,750
- Issue date Apr 5, 2011
- Advantest Corporation
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus involving the position and velocit...
- Patent number 7,777,202
- Issue date Aug 17, 2010
- Advantest Corp.
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus and method for cleaning the same
- Patent number 7,737,421
- Issue date Jun 15, 2010
- Advantest Corp.
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam, generating device, and testing device
- Patent number 6,911,780
- Issue date Jun 28, 2005
- Advantest Corporation
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam generating apparatus and electron beam exposure appar...
- Patent number 6,727,658
- Issue date Apr 27, 2004
- Advantest Corporation
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic deflector for electron beam exposure apparatus
- Patent number 6,509,568
- Issue date Jan 21, 2003
- Advantest Corporation
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge-particle beam lithography system of blanking aperture array...
- Patent number 6,465,796
- Issue date Oct 15, 2002
- Advantest Corporation
- Takeshi Haraguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure apparatus and exposure method
- Patent number 6,407,398
- Issue date Jun 18, 2002
- Advantest Corporation
- Masaki Kurokawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electrostatic deflector, for electron beam exposure apparatus, with...
- Patent number 6,268,606
- Issue date Jul 31, 2001
- Advantest Corporation
- Tomohiko Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun used in an electron beam exposure apparatus
- Patent number 6,252,344
- Issue date Jun 26, 2001
- Advantest Corporation
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for charged particle beam exposure
- Patent number 6,046,459
- Issue date Apr 4, 2000
- Fujitsu Limited
- Nobuyuki Yasutake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure device
- Patent number 6,008,495
- Issue date Dec 28, 1999
- Fujitsu Limited
- Hitoshi Tanaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for charged particle beam exposure with fixed barycenter thr...
- Patent number 5,981,118
- Issue date Nov 9, 1999
- Fujitsu Ltd.
- Nobuyuki Yasutake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure device
- Patent number 5,945,683
- Issue date Aug 31, 1999
- Fujitsu Limited
- Tatsuro Ohkawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure method and apparatus
- Patent number 5,892,237
- Issue date Apr 6, 1999
- Fujitsu Limited
- Kenichi Kawakami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron-beam exposure device and a method of detecting a mark posi...
- Patent number 5,708,276
- Issue date Jan 13, 1998
- Fujitsu Limited
- Tatsuro Ohkawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Stage device
- Publication number 20110204255
- Publication date Aug 25, 2011
- Yoshihisa Ooae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-column electron beam exposure apparatus and magnetic field ge...
- Publication number 20110148297
- Publication date Jun 23, 2011
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron gun, electron beam exposure apparatus, and exposure method
- Publication number 20080315089
- Publication date Dec 25, 2008
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam exposure apparatus
- Publication number 20080277598
- Publication date Nov 13, 2008
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposure apparatus and method for cleaning the same
- Publication number 20080169433
- Publication date Jul 17, 2008
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron-beam exposure system
- Publication number 20070181829
- Publication date Aug 9, 2007
- Hitoshi Tanaka
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam, generating device, and testing device
- Publication number 20030201720
- Publication date Oct 30, 2003
- Advantest Corporation
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam generating apparatus and electron beam exposure appar...
- Publication number 20030155522
- Publication date Aug 21, 2003
- Advantest Corporation
- Yoshihisa Ooae
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electrostatic deflector for electron beam exposure apparatus
- Publication number 20020020354
- Publication date Feb 21, 2002
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic deflector for electron beam exposure apparatus
- Publication number 20010045528
- Publication date Nov 29, 2001
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS

Yoshihisa Ooae

Person

Patents Grantslast 30 patents

Stage device

Multi-column electron beam exposure apparatus and magnetic field ge...

Electron gun, electron beam exposure apparatus, and exposure method

Electron beam exposure apparatus involving the position and velocit...

Electron beam exposure apparatus and method for cleaning the same

Electron beam, generating device, and testing device

Electron beam generating apparatus and electron beam exposure appar...

Electrostatic deflector for electron beam exposure apparatus

Charge-particle beam lithography system of blanking aperture array...

Electron beam exposure apparatus and exposure method

Electrostatic deflector, for electron beam exposure apparatus, with...

Electron gun used in an electron beam exposure apparatus

Method and system for charged particle beam exposure

Electron beam exposure device

Method for charged particle beam exposure with fixed barycenter thr...

Electron beam exposure device

Charged particle beam exposure method and apparatus

Electron-beam exposure device and a method of detecting a mark posi...

Patents Applicationslast 30 patents

Stage device

Multi-column electron beam exposure apparatus and magnetic field ge...

Electron gun, electron beam exposure apparatus, and exposure method

Electron beam exposure apparatus

Electron beam exposure apparatus and method for cleaning the same

Electron-beam exposure system

Electron beam, generating device, and testing device

Electron beam generating apparatus and electron beam exposure appar...

Electrostatic deflector for electron beam exposure apparatus

Electrostatic deflector for electron beam exposure apparatus