Yoshiji Yumoto

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,048,659
- Issue date Apr 11, 2000
- JSR Corporation
- Masaaki Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 5,958,645
- Issue date Sep 28, 1999
- Japan Synthetic Rubber Co., Ltd.
- Kouichi Hirose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 5,609,988
- Issue date Mar 11, 1997
- Japan Synthetic Rubber Co., Ltd.
- Hidetoshi Miyamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist
- Patent number 5,580,695
- Issue date Dec 3, 1996
- Japan Synthetic Rubber Co., Ltd.
- Makoto Murata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection preventing film and process for forming resist pattern u...
- Patent number 5,525,457
- Issue date Jun 11, 1996
- Japan Synthetic Rubber Co., Ltd.
- Hiroaki Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 5,494,777
- Issue date Feb 27, 1996
- Japan Synthetic Rubber Co., Ltd.
- Shinji Shiraki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 5,482,816
- Issue date Jan 9, 1996
- Japan Synthetic Rubber Co., Ltd.
- Makoto Murata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
I-ray sensitive positive resist composition
- Patent number 5,413,896
- Issue date May 9, 1995
- Japan Synthetic Rubber Co., Ltd.
- Toru Kajita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Reflection preventing film and process for forming resist pattern u...
- Patent number 5,410,005
- Issue date Apr 25, 1995
- Japan Synthetic Rubber Co., Ltd.
- Hiroaki Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 5,332,650
- Issue date Jul 26, 1994
- Japan Synthetic Rubber Co., Ltd.
- Makoto Murata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 5,238,775
- Issue date Aug 24, 1993
- Japan Synthetic Rubber Co., Ltd.
- Toru Kajita
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
I-line radiation-sensitive alkali-soluble resin composition utilizi...
- Patent number 5,110,706
- Issue date May 5, 1992
- Japan Synthetic Rubber Co., Ltd.
- Yoshiji Yumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solvent-soluble organopolysilsesquioxane, process for producing the...
- Patent number 4,626,556
- Issue date Dec 2, 1986
- Japan Synthetic Rubber Co., Ltd.
- Ikuo Nozue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yoshiji Yumoto

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Radiation sensitive resin composition

Chemically amplified resist

Reflection preventing film and process for forming resist pattern u...

Radiation sensitive resin composition

Radiation-sensitive composition

I-ray sensitive positive resist composition

Reflection preventing film and process for forming resist pattern u...

Radiation-sensitive composition

Radiation-sensitive resin composition

I-line radiation-sensitive alkali-soluble resin composition utilizi...

Solvent-soluble organopolysilsesquioxane, process for producing the...