Yoshika Satou

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Ibaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Positive-type photosensitive resin composition, method for producin...
- Patent number 8,097,386
- Issue date Jan 17, 2012
- Hitachi Chemical DuPont Microsystems, Ltd.
- Hajime Nakano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCIN...
- Publication number 20100227126
- Publication date Sep 9, 2010
- Hajime Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY