Yoshikatu Tomimatu

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method, equipment, and recording medium for controlling exposure ac...
- Patent number 6,662,145
- Issue date Dec 9, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
METHOD OF INCREASING OVERLAY ACCURACY IN AN EXPOSURE STEP AND OVERL...
- Patent number 6,553,137
- Issue date Apr 22, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of correcting alignment
- Patent number 6,338,971
- Issue date Jan 15, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Tsuneo Yasuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography processing based on fresh calibration parameter va...
- Patent number 6,338,925
- Issue date Jan 15, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, exposure apparatus and semiconductor device manufa...
- Patent number 6,239,858
- Issue date May 29, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of improving registration accuracy and method of forming pat...
- Patent number 6,229,618
- Issue date May 8, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay error determination mark considering influence of aberration
- Patent number 6,165,656
- Issue date Dec 26, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aberration estimation reticle for determining overlay error
- Patent number 5,939,226
- Issue date Aug 17, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of alignment in exposure step through array error and shot e...
- Patent number 5,856,054
- Issue date Jan 5, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of aligning reticle pattern
- Patent number 5,792,580
- Issue date Aug 11, 1998
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring method of a relative positional deviation of reticle pattern
- Patent number 5,773,180
- Issue date Jun 30, 1998
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining position offset of a pattern
- Patent number 5,671,165
- Issue date Sep 23, 1997
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor device and fabrication method therefor
- Publication number 20030104292
- Publication date Jun 5, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikatu Tomimatu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yoshikatu Tomimatu

Person

Patents Grantslast 30 patents

Method, equipment, and recording medium for controlling exposure ac...

METHOD OF INCREASING OVERLAY ACCURACY IN AN EXPOSURE STEP AND OVERL...

Method of correcting alignment

Photolithography processing based on fresh calibration parameter va...

Exposure method, exposure apparatus and semiconductor device manufa...

Method of improving registration accuracy and method of forming pat...

Overlay error determination mark considering influence of aberration

Aberration estimation reticle for determining overlay error

Method of alignment in exposure step through array error and shot e...

Method of aligning reticle pattern

Measuring method of a relative positional deviation of reticle pattern

Method of determining position offset of a pattern

Patents Applicationslast 30 patents

Semiconductor device and fabrication method therefor