Yoshikazu Furusawa

Person

Tokyo-To, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon film forming method, thin film forming method and cross-sec...
- Patent number 9,758,865
- Issue date Sep 12, 2017
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Amorphous silicon crystallizing method, crystallized silicon film f...
- Patent number 9,540,743
- Issue date Jan 10, 2017
- Tokyo Electron Limited
- Kazuya Takahashi
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of vapor-diffusing impurities
- Patent number 9,478,423
- Issue date Oct 25, 2016
- Tokyo Electron Limited
- Kazuya Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of vapor-diffusing impurities
- Patent number 9,171,722
- Issue date Oct 27, 2015
- Tokyo Electron Limited
- Kazuya Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impurity diffusion method, substrate processing apparatus, and meth...
- Patent number 8,906,792
- Issue date Dec 9, 2014
- Tokyo Electron Limited
- Kazuya Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for using apparatus configured to form germanium-containing...
- Patent number 8,518,488
- Issue date Aug 27, 2013
- Tokyo Electron Limited
- Yoshikazu Furusawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical CVD apparatus for forming silicon-germanium film
- Patent number 7,648,895
- Issue date Jan 19, 2010
- Tokyo Electron Limited
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat dissipation deterrence link for semiconductor manufacture
- Patent number D588078
- Issue date Mar 10, 2009
- Tokyo Electron Limited
- Mitsuhiro Okada
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Heat dissipation deterrence link for semiconductor manufacture
- Patent number D588079
- Issue date Mar 10, 2009
- Tokyo Electron Limited
- Mitsuhiro Okada
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 7,273,818
- Issue date Sep 25, 2007
- Tokyo Electron Limited
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for treating article to be treated
- Patent number 7,208,428
- Issue date Apr 24, 2007
- Tokyo Electron Limited
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide film forming method
- Patent number 7,064,084
- Issue date Jun 20, 2006
- Tokyo Electron Limited
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, INJECTOR, AND SUBSTRATE PROCESSING...
- Publication number 20180142357
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Yoshikazu FURUSAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Amorphous Silicon Crystallizing Method, Crystallized Silicon Film F...
- Publication number 20150159295
- Publication date Jun 11, 2015
- TOKYO ELECTRON LIMITED
- Kazuya TAKAHASHI
- C30 - CRYSTAL GROWTH
Information Patent Application
Silicon Film Forming Method, Thin Film Forming Method and Cross-Sec...
- Publication number 20150037970
- Publication date Feb 5, 2015
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF VAPOR-DIFFUSING IMPURITIES
- Publication number 20140030879
- Publication date Jan 30, 2014
- TOKYO ELECTRON LIMITED
- Kazuya TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPURITY DIFFUSION METHOD, SUBSTRATE PROCESSING APPARATUS, AND METH...
- Publication number 20130288470
- Publication date Oct 31, 2013
- TOKYO ELECTRON LIMITED
- Kazuya TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR USING APPARATUS CONFIGURED TO FORM GERMANIUM-CONTAINING...
- Publication number 20100210094
- Publication date Aug 19, 2010
- TOKYO ELECTRON LIMITED
- Yoshikazu FURUSAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL CVD APPPARATUS FOR FORMING SILICON-GERMANIUM FILM
- Publication number 20090104760
- Publication date Apr 23, 2009
- TOKYO ELECTON LIMITED
- Masaki KUROKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reduction in size of hemispherical grains of hemispherical grained...
- Publication number 20060021570
- Publication date Feb 2, 2006
- Kazuhide Hasebe
- C30 - CRYSTAL GROWTH
Information Patent Application
Vertical CVD apparatus for forming silicon-germanium film
- Publication number 20050181586
- Publication date Aug 18, 2005
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20050170617
- Publication date Aug 4, 2005
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for treating article to be treated
- Publication number 20040219793
- Publication date Nov 4, 2004
- Shingo Hishiya
- C30 - CRYSTAL GROWTH
Information Patent Application
Oxide film forming method
- Publication number 20040087180
- Publication date May 6, 2004
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS

Yoshikazu Furusawa

Person

Patents Grantslast 30 patents

Silicon film forming method, thin film forming method and cross-sec...

Amorphous silicon crystallizing method, crystallized silicon film f...

Method of vapor-diffusing impurities

Method of vapor-diffusing impurities

Impurity diffusion method, substrate processing apparatus, and meth...

Method for using apparatus configured to form germanium-containing...

Vertical CVD apparatus for forming silicon-germanium film

Heat dissipation deterrence link for semiconductor manufacture

Heat dissipation deterrence link for semiconductor manufacture

Film formation method and apparatus for semiconductor process

Method and apparatus for treating article to be treated

Oxide film forming method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, INJECTOR, AND SUBSTRATE PROCESSING...

Amorphous Silicon Crystallizing Method, Crystallized Silicon Film F...

Silicon Film Forming Method, Thin Film Forming Method and Cross-Sec...

METHOD OF VAPOR-DIFFUSING IMPURITIES

IMPURITY DIFFUSION METHOD, SUBSTRATE PROCESSING APPARATUS, AND METH...

METHOD FOR USING APPARATUS CONFIGURED TO FORM GERMANIUM-CONTAINING...

VERTICAL CVD APPPARATUS FOR FORMING SILICON-GERMANIUM FILM

Reduction in size of hemispherical grains of hemispherical grained...

Vertical CVD apparatus for forming silicon-germanium film

Film formation method and apparatus for semiconductor process

Method and apparatus for treating article to be treated

Oxide film forming method