Yoshikazu Kato

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Mizusawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,809,360
- Issue date Oct 26, 2004
- Fujitsu Limited
- Yoshikazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device having ferro-dielectri...
- Patent number 6,533,948
- Issue date Mar 18, 2003
- Fujitsu Limited
- Yoshikazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing photoresist on a semiconductor wafer
- Patent number 4,938,839
- Issue date Jul 3, 1990
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing resist from semiconductor device
- Patent number 4,789,427
- Issue date Dec 6, 1988
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing semiconductor device using reactive ion etching
- Patent number 4,744,861
- Issue date May 17, 1988
- Fujitsu Limited
- Daisuke Matsunaga
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20030178659
- Publication date Sep 25, 2003
- FUJITSU LIMITED
- Yoshikazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device having ferro-dielectri...
- Publication number 20010017285
- Publication date Aug 30, 2001
- FUJITSU LIMITED
- Yoshikazu Kato
- H01 - BASIC ELECTRIC ELEMENTS