Yoshikazu Nagamura

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing photomask
- Patent number 8,156,451
- Issue date Apr 10, 2012
- Renesas Electronics Corporation
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining defects in photomask
- Patent number 7,926,010
- Issue date Apr 12, 2011
- Dai Nippon Printing Co., Ltd.
- Shogo Narukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, and method and apparatus for producing the same
- Patent number 7,771,904
- Issue date Aug 10, 2010
- Renesas Technology Corp.
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, and method and apparatus for producing the same
- Patent number 7,585,599
- Issue date Sep 8, 2009
- Renesas Technology Corp.
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, and method and apparatus for producing the same
- Patent number 7,582,397
- Issue date Sep 1, 2009
- Renesas Technology Corp.
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, and method and apparatus for producing the same
- Patent number 7,264,905
- Issue date Sep 4, 2007
- Renesas Technology Corp.
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of and apparatus for washing photomask and washing solution...
- Patent number 7,077,915
- Issue date Jul 18, 2006
- Renesas Technology Corp.
- Yoshikazu Nagamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Cleaning process for photomasks
- Patent number 7,001,470
- Issue date Feb 21, 2006
- Renesas Technology Corp.
- Koji Tange
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask visual inspection system
- Patent number 6,877,151
- Issue date Apr 5, 2005
- Renesas Technology Corp.
- Yoshikazu Nagamura
- G01 - MEASURING TESTING
Information Patent Grant
Sensitivity adjusting method for pattern inspection apparatus
- Patent number 6,740,896
- Issue date May 25, 2004
- Renesas Technology Corp.
- Yoshikazu Nagamura
- G01 - MEASURING TESTING
Information Patent Grant
Photomask, manufacturing method thereof, and semiconductor device
- Patent number 6,340,543
- Issue date Jan 22, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for cleaning photomask
- Patent number 6,277,205
- Issue date Aug 21, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of and apparatus for washing photomask and washing solution...
- Patent number 6,209,553
- Issue date Apr 3, 2001
- MitsubishiDenki Kabushiki Kaisha
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for cleaning photomask
- Patent number 6,071,376
- Issue date Jun 6, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK, AND METHOD AND APPARATUS FOR PRODUCING THE SAME
- Publication number 20090297959
- Publication date Dec 3, 2009
- Renesas Technology Corporation
- Yoshikazu NAGAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTOMASK
- Publication number 20090077524
- Publication date Mar 19, 2009
- RENESAS TECHNOLOGY CORP.
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, and method and apparatus for producing the same
- Publication number 20090042106
- Publication date Feb 12, 2009
- Renesas Technology Corp.
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING DEFECTS IN PHOTOMASK
- Publication number 20080301622
- Publication date Dec 4, 2008
- DAI NIPPON PRINTING CO., LTD.
- Shogo NARUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, and method and apparatus for producing the same
- Publication number 20080020298
- Publication date Jan 24, 2008
- Renesas Technology Corp.
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning process for photomasks
- Publication number 20050274392
- Publication date Dec 15, 2005
- Renesas Technology Corp.
- Koji Tange
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, and method and apparatus for producing the same
- Publication number 20040151992
- Publication date Aug 5, 2004
- RENESAS TECHNOLOGY CORP.
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of and apparatus for washing photomask and washing solution...
- Publication number 20040079386
- Publication date Apr 29, 2004
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sensitivity adjusting method for pattern inspection apparatus
- Publication number 20030201410
- Publication date Oct 30, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- G01 - MEASURING TESTING
Information Patent Application
Photomask visual inspection system
- Publication number 20030066035
- Publication date Apr 3, 2003
- Yoshikazu Nagamura
- G01 - MEASURING TESTING
Information Patent Application
Cleaning process for photomasks
- Publication number 20020155360
- Publication date Oct 24, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Koji Tange
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Quality assurance automatic display system
- Publication number 20020138219
- Publication date Sep 26, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- G05 - CONTROLLING REGULATING
Information Patent Application
Method of and apparatus for washing photomask and washing solution...
- Publication number 20010008137
- Publication date Jul 19, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Yoshikazu Nagamura

Person

Patents Grantslast 30 patents

Method of manufacturing photomask

Method of determining defects in photomask

Photomask, and method and apparatus for producing the same

Photomask, and method and apparatus for producing the same

Photomask, and method and apparatus for producing the same

Photomask, and method and apparatus for producing the same

Method of and apparatus for washing photomask and washing solution...

Cleaning process for photomasks

Photomask visual inspection system

Sensitivity adjusting method for pattern inspection apparatus

Photomask, manufacturing method thereof, and semiconductor device

Method and apparatus for cleaning photomask

Method of and apparatus for washing photomask and washing solution...

Method and apparatus for cleaning photomask

Patents Applicationslast 30 patents

PHOTOMASK, AND METHOD AND APPARATUS FOR PRODUCING THE SAME

METHOD OF MANUFACTURING PHOTOMASK

Photomask, and method and apparatus for producing the same

METHOD OF DETERMINING DEFECTS IN PHOTOMASK

Photomask, and method and apparatus for producing the same

Cleaning process for photomasks

Photomask, and method and apparatus for producing the same

Method of and apparatus for washing photomask and washing solution...

Sensitivity adjusting method for pattern inspection apparatus

Photomask visual inspection system

Cleaning process for photomasks

Quality assurance automatic display system

Method of and apparatus for washing photomask and washing solution...