YOSHIKIYO YUI

Person

UTSUNOMIYA-SHI, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam drawing apparatus and method of manufacturing...
- Patent number 8,754,382
- Issue date Jun 17, 2014
- Canon Kabushiki Kaisha
- Takehiko Suzuki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle optical system, drawing apparatus, and method of m...
- Patent number 8,716,672
- Issue date May 6, 2014
- Canon Kabushiki Kaisha
- Kentaro Sano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam drawing apparatus
- Patent number 7,608,844
- Issue date Oct 27, 2009
- Hitachi High-Technologies Corporation
- Yuji Inoue
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi-electron beam exposure method and apparatus
- Patent number 7,126,140
- Issue date Oct 24, 2006
- Hitachi, Ltd.
- Haruo Yoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electron beam exposure method and apparatus
- Patent number 7,067,830
- Issue date Jun 27, 2006
- Hitachi, Ltd.
- Haruo Yoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam source and electron beam exposure apparatus employing...
- Patent number 6,992,307
- Issue date Jan 31, 2006
- Canon Kabushiki Kaisha
- Yoshikiyo Yui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam exposure apparatus, charged-particle beam exp...
- Patent number 6,903,352
- Issue date Jun 7, 2005
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correcting method for correcting exposure data used for a charged p...
- Patent number 6,835,937
- Issue date Dec 28, 2004
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam exposure apparatus and device manufacturing m...
- Patent number 6,777,697
- Issue date Aug 17, 2004
- Canon Kabushiki Kaisha
- Yoshikiyo Yui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure method and device manufacturing method using this exposure...
- Patent number 6,741,732
- Issue date May 25, 2004
- Canon Kabushiki Kaisha
- Yoshikiyo Yui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure method, electron beam exposure apparatus and...
- Patent number 6,667,486
- Issue date Dec 23, 2003
- Hitachi, Ltd.
- Hiroya Ohta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun and electron beam drawing apparatus using the same
- Patent number 6,593,686
- Issue date Jul 15, 2003
- Canon Kabushiki Kaisha
- Yoshikiyo Yui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask pattern transfer method, mask pattern transfer apparatus using...
- Patent number 6,559,463
- Issue date May 6, 2003
- Canon Kabushiki Kaisha
- Haruhito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam exposure apparatus, exposure system, control...
- Patent number 6,515,409
- Issue date Feb 4, 2003
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control system for a charged particle exposure apparatus
- Patent number 6,483,120
- Issue date Nov 19, 2002
- Canon Kabushiki Kaisha
- Yoshikiyo Yui
- G01 - MEASURING TESTING
Information Patent Grant
Transfer apparatus and transfer method
- Patent number 6,466,301
- Issue date Oct 15, 2002
- Canon Kabushiki Kaisha
- Yoshikiyo Yui
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern transfer method and apparatus, and device manufacturing method
- Patent number 6,455,211
- Issue date Sep 24, 2002
- Canon Kabushiki Kaisha
- Yoshikiyo Yui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure control system
- Patent number 5,107,275
- Issue date Apr 21, 1992
- Canon Kabushiki Kaisha
- Yuji Tsuruoka
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Exposure control method and apparatus compensating for detection of...
- Patent number 5,053,614
- Issue date Oct 1, 1991
- Canon Kabushiki Kaisha
- Yoshikiyo Yui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for automatic focusing
- Patent number 4,714,331
- Issue date Dec 22, 1987
- Canon Kabushiki Kaisha
- Kazuyuki Oda
- G02 - OPTICS
Information Patent Grant
Exposure apparatus
- Patent number 4,713,675
- Issue date Dec 15, 1987
- Canon Kabushiki Kaisha
- Yoshikiyo Yui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE OPTICAL SYSTEM, DRAWING APPARATUS, AND METHOD OF M...
- Publication number 20130273478
- Publication date Oct 17, 2013
- Canon Kabushiki Kaisha
- Kentaro Sano
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND METHOD OF MANUFACTURING...
- Publication number 20130068959
- Publication date Mar 21, 2013
- Canon Kabushiki Kaisha
- Takehiko SUZUKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-electron beam exposure method and apparatus
- Publication number 20060017021
- Publication date Jan 26, 2006
- Haruo Yoda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam drawing apparatus
- Publication number 20050285054
- Publication date Dec 29, 2005
- Yuji Inoue
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam source and electron beam exposure apparatus employing...
- Publication number 20040262539
- Publication date Dec 30, 2004
- Canon Kabushiki Kaisha
- Yoshikiyo Yui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-electron beam exposure method and apparatus
- Publication number 20040143356
- Publication date Jul 22, 2004
- Haruo Yoda
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD USING THIS EXPOSURE...
- Publication number 20040071336
- Publication date Apr 15, 2004
- YOSHIKIYO YUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRON BEAM EXPOSURE METHOD, ELECTRON BEAM EXPOSURE APPARATUS AND...
- Publication number 20030189181
- Publication date Oct 9, 2003
- Hiroya Ohta
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED-PARTICLE BEAM EXPOSURE APPARATUS AND DEVICE MANUFACTURING M...
- Publication number 20030094584
- Publication date May 22, 2003
- Yoshikiyo Yui
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK PATTERN TRANSFER METHOD, MASK PATTERN TRANSFER APPARATUS USING...
- Publication number 20030034460
- Publication date Feb 20, 2003
- Haruhito Ono
- B82 - NANO-TECHNOLOGY
Information Patent Application
TRANSFER APPARATUS AND TRANSFER METHOD
- Publication number 20020163628
- Publication date Nov 7, 2002
- Yoshikiyo Yui
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle beam exposure apparatus, charged-particle beam exp...
- Publication number 20020008207
- Publication date Jan 24, 2002
- Masato Muraki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle beam exposure apparatus, exposure system, control...
- Publication number 20010004185
- Publication date Jun 21, 2001
- Masato Muraki
- B82 - NANO-TECHNOLOGY

YOSHIKIYO YUI

Person

Patents Grantslast 30 patents

Charged particle beam drawing apparatus and method of manufacturing...

Charged particle optical system, drawing apparatus, and method of m...

Charged particle beam drawing apparatus

Multi-electron beam exposure method and apparatus

Multi-electron beam exposure method and apparatus

Electron beam source and electron beam exposure apparatus employing...

Charged-particle beam exposure apparatus, charged-particle beam exp...

Correcting method for correcting exposure data used for a charged p...

Charged-particle beam exposure apparatus and device manufacturing m...

Exposure method and device manufacturing method using this exposure...

Electron beam exposure method, electron beam exposure apparatus and...

Electron gun and electron beam drawing apparatus using the same

Mask pattern transfer method, mask pattern transfer apparatus using...

Charged-particle beam exposure apparatus, exposure system, control...

Control system for a charged particle exposure apparatus

Transfer apparatus and transfer method

Pattern transfer method and apparatus, and device manufacturing method

Exposure control system

Exposure control method and apparatus compensating for detection of...

Method and apparatus for automatic focusing

Exposure apparatus

Patents Applicationslast 30 patents

CHARGED PARTICLE OPTICAL SYSTEM, DRAWING APPARATUS, AND METHOD OF M...

CHARGED PARTICLE BEAM DRAWING APPARATUS AND METHOD OF MANUFACTURING...

Multi-electron beam exposure method and apparatus

Charged particle beam drawing apparatus

Electron beam source and electron beam exposure apparatus employing...

Multi-electron beam exposure method and apparatus

EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD USING THIS EXPOSURE...

ELECTRON BEAM EXPOSURE METHOD, ELECTRON BEAM EXPOSURE APPARATUS AND...

CHARGED-PARTICLE BEAM EXPOSURE APPARATUS AND DEVICE MANUFACTURING M...

MASK PATTERN TRANSFER METHOD, MASK PATTERN TRANSFER APPARATUS USING...

TRANSFER APPARATUS AND TRANSFER METHOD

Charged-particle beam exposure apparatus, charged-particle beam exp...

Charged-particle beam exposure apparatus, exposure system, control...