Yoshiko Tsumaru

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Ibaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive polymer composition, method of producing pattern and...
- Patent number 8,852,726
- Issue date Oct 7, 2014
- Hitachi Chemical DuPont Microsystems Ltd.
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive polymer composition, method of forming relief patter...
- Patent number 8,304,149
- Issue date Nov 6, 2012
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive polymer composition, method of producing pattern and...
- Patent number 8,231,959
- Issue date Jul 31, 2012
- Hitachi Chemical DuPont Microsystems Ltd.
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive polymer composition, method of forming relief patter...
- Patent number 7,851,128
- Issue date Dec 14, 2010
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive polymer composition, method of forming relief patter...
- Patent number 7,150,947
- Issue date Dec 19, 2006
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Photosensitive Polymer Composition, Method of Producing Pattern and...
- Publication number 20120263920
- Publication date Oct 18, 2012
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING RELIEF PATTER...
- Publication number 20110076458
- Publication date Mar 31, 2011
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Photosensitive Polymer Composition, Method of Producing Pattern and...
- Publication number 20080220222
- Publication date Sep 11, 2008
- Ooe Masayuki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive polymer composition, method of forming relief patter...
- Publication number 20070072122
- Publication date Mar 29, 2007
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Photosensitive polymer composition, method of forming relief patter...
- Publication number 20040029045
- Publication date Feb 12, 2004
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR