Yoshimasa Aotani

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive-working light-sensitive composition
- Patent number 5,939,235
- Issue date Aug 17, 1999
- Fuji Photo Film Co., Ltd.
- Syunichi Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable composition including a photopolymerization init...
- Patent number 5,721,288
- Issue date Feb 24, 1998
- Fuji Photo Film Co., Ltd.
- Yoshimasa Aotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working light-sensitive composition containing diazonium s...
- Patent number 5,370,965
- Issue date Dec 6, 1994
- Fuji Photo Film Co., Ltd.
- Shunichi Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive composition
- Patent number 5,364,738
- Issue date Nov 15, 1994
- Fuji Photo Film Co., Ltd.
- Shunichi Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition utilizing 1,2-naphthoquinone diazi...
- Patent number 5,358,824
- Issue date Oct 25, 1994
- Fuji Photo Film Co., Ltd.
- Shiro Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable composition
- Patent number 5,250,385
- Issue date Oct 5, 1993
- Fuji Photo Film Co., Ltd.
- Syunichi Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photosensitive composition
- Patent number 5,202,216
- Issue date Apr 13, 1993
- Fuji Photo Film Co., Ltd.
- Yoshimasa Aotani
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Microcapsules and light-sensitive recording material using the same
- Patent number 4,904,563
- Issue date Feb 27, 1990
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive composition and presensitized plate with light-sens...
- Patent number 4,902,602
- Issue date Feb 20, 1990
- Fuji Photo Film Co., Ltd.
- Hiroshi Misu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable composition on polyethylene terephthalate film s...
- Patent number 4,876,173
- Issue date Oct 24, 1989
- Fuji Photo Film Co., Ltd.
- Kazuo Maemoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positively working resist material
- Patent number 4,842,986
- Issue date Jun 27, 1989
- Fuji Photo Film Co., Ltd.
- Nobuaki Matsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive composition
- Patent number 4,837,128
- Issue date Jun 6, 1989
- Fuji Photo Film Co., Ltd.
- Kouichi Kawamma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light sensitive composition containing a light sensitive s-triazine...
- Patent number 4,772,534
- Issue date Sep 20, 1988
- Fuji Photo Film Co., Ltd.
- Kouichi Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plate making processing for using negative working light-sensitive...
- Patent number 4,642,283
- Issue date Feb 10, 1987
- Fuji Photo Film Co., Ltd.
- Hiroshi Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable compositions
- Patent number 4,636,459
- Issue date Jan 13, 1987
- Fuji Photo Film Co., Ltd.
- Kouichi Kawamura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photopolymerizable composition
- Patent number 4,555,474
- Issue date Nov 26, 1985
- Fuji Photo Film Co., Ltd.
- Kouichi Kawamura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative working diazo light-sensitive composition with oxonol dye...
- Patent number 4,542,085
- Issue date Sep 17, 1985
- Fuji Photo Film Co., Ltd.
- Hiroshi Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable compositions
- Patent number 4,505,793
- Issue date Mar 19, 1985
- Fuji Photo Film Co., Ltd.
- Koji Tamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Light-sensitive o-quinonediazide printing plate with oxonol dye
- Patent number 4,497,888
- Issue date Feb 5, 1985
- Fuji Photo Film Co., Ltd.
- Akira Nishioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Color photographic light-sensitive material
- Patent number 4,483,918
- Issue date Nov 20, 1984
- Fuji Photo Film Co., Ltd.
- Nobuo Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat developable photosensitive material
- Patent number 4,359,524
- Issue date Nov 16, 1982
- Fuji Photo Film Co., Ltd.
- Takao Masuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive compositions
- Patent number 4,356,247
- Issue date Oct 26, 1982
- Fuji Photo Film Co., Ltd.
- Yoshimasa Aotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compositions
- Patent number 4,271,251
- Issue date Jun 2, 1981
- Fuji Photo Film Co., Ltd.
- Yoshimasa Aotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive resin composition and metal image-forming material...
- Patent number 4,139,391
- Issue date Feb 13, 1979
- Fuji Photo Film Co., Ltd.
- Tomoaki Ikeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yoshimasa Aotani

Person

Patents Grantslast 30 patents

Positive-working light-sensitive composition

Photopolymerizable composition including a photopolymerization init...

Positive-working light-sensitive composition containing diazonium s...

Light-sensitive composition

Photosensitive resin composition utilizing 1,2-naphthoquinone diazi...

Photopolymerizable composition

Positive working photosensitive composition

Microcapsules and light-sensitive recording material using the same

Light-sensitive composition and presensitized plate with light-sens...

Photopolymerizable composition on polyethylene terephthalate film s...

Positively working resist material

Light-sensitive composition

Light sensitive composition containing a light sensitive s-triazine...

Plate making processing for using negative working light-sensitive...

Photopolymerizable compositions

Photopolymerizable composition

Negative working diazo light-sensitive composition with oxonol dye...

Photopolymerizable compositions

Light-sensitive o-quinonediazide printing plate with oxonol dye

Color photographic light-sensitive material

Heat developable photosensitive material

Light-sensitive compositions

Photosensitive compositions

Light-sensitive resin composition and metal image-forming material...