Yoshimasa KOIDO

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sb—Te-based alloy sintered compact sputtering target
- Patent number 11,846,015
- Issue date Dec 19, 2023
- JX Metals Corporation
- Hideyuki Takahashi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputtering target and production method therefor
- Patent number 11,236,416
- Issue date Feb 1, 2022
- JX Nippon Mining & Metals Corporation
- Yasushi Morii
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target of sintered Sb—Te-based alloy
- Patent number 10,854,435
- Issue date Dec 1, 2020
- JX Nippon Mining & Metals Corporation
- Yoshimasa Koido
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Sputtering target comprising Al—Te—Cu—Zr-based alloy and method of...
- Patent number 10,612,128
- Issue date Apr 7, 2020
- JX Nippon Mining & Metals Corporation
- Yoshimasa Koido
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Sputtering target comprising Al—Te—Cu—Zr alloy, and method for prod...
- Patent number 10,519,538
- Issue date Dec 31, 2019
- JX Nippon Mining & Metals Corporation
- Yoshimasa Koido
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Sputtering target-backing plate assembly, and its production method
- Patent number 9,062,371
- Issue date Jun 23, 2015
- JX Nippon Mining & Metals Corporation
- Yoshimasa Koido
- C21 - METALLURGY OF IRON
Information Patent Grant
Method of storing lanthanum oxide target, and vacuum-sealed lanthan...
- Patent number 8,911,600
- Issue date Dec 16, 2014
- JX Nippon Mining & Metals Corporation
- Kazuyuki Satoh
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Hybrid silicon wafer and method for manufacturing same
- Patent number 8,236,428
- Issue date Aug 7, 2012
- JX Nippon Mining & Metals Corporation
- Kazuyuki Satoh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Al2O3 Sputtering Target and Production Method Thereof
- Publication number 20210292887
- Publication date Sep 23, 2021
- JX NIPPON MINING & METALS CORPORATION
- Yoshimasa Koido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target Member And Method For Producing Same
- Publication number 20210098240
- Publication date Apr 1, 2021
- JX Nippon Mining & Metals Corporation
- Yoshimasa Koido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Co Anode, And Co Electroplating Method Using Co Anode
- Publication number 20210010149
- Publication date Jan 14, 2021
- JX Nippon Mining & Metals Corporation
- Shuhei Murata
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Sb-Te-Based Alloy Sintered Compact Sputtering Target
- Publication number 20200017955
- Publication date Jan 16, 2020
- JX NIPPON MINING & METALS CORPORATION
- Hideyuki Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target and Production Method Therefor
- Publication number 20190161851
- Publication date May 30, 2019
- JX NIPPON MINING & METALS CORPORATION
- Yasushi Morii
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target Comprising Al-Te-Cu-Zr-Based Alloy and Method of...
- Publication number 20170306473
- Publication date Oct 26, 2017
- JX NIPPON MINING & METALS CORPORATION
- Yoshimasa KOIDO
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sputtering Target Comprising Al-Te-Cu-Zr Alloy, and Method for Prod...
- Publication number 20170175252
- Publication date Jun 22, 2017
- JX NIPPON MINING & METALS CORPORATION
- Yoshimasa KOIDO
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SPUTTERING TARGET OF SINTERED Sb-Te-BASED ALLOY
- Publication number 20160314945
- Publication date Oct 27, 2016
- JX NIPPON MINING & METALS CORPORATION
- Yoshimasa Koido
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Method of Storing Metal Lanthanum Target, Vacuum-sealed Metal Lanth...
- Publication number 20130277214
- Publication date Oct 24, 2013
- JX NIPPON MINING & METALS CORPORATION
- Satoyasu Narita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sb-Te-Based Alloy Sintered Compact Sputtering Target
- Publication number 20120279857
- Publication date Nov 8, 2012
- JX NIPPON MINING & METALS CORPORATION
- Hideyuki Takahashi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SPUTTERING TARGET-BACKING PLATE ASSEMBLY, AND ITS PRODUCTION METHOD
- Publication number 20120228132
- Publication date Sep 13, 2012
- JX NIPPON MINING & METALS CORPORATION
- Yoshimasa Koido
- C21 - METALLURGY OF IRON
Information Patent Application
Method of Storing Lanthanum Oxide Target, and Vacuum-Sealed Lanthan...
- Publication number 20120045380
- Publication date Feb 23, 2012
- JX NIPPON MINING & METALS CORPORATION
- Kazuyuki Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Storing Target Comprising Rare Earth Metal or Oxide Thereof
- Publication number 20110162322
- Publication date Jul 7, 2011
- JX NIPPON MINING & METALS CORPORATION
- Kazuyuki Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Hybrid Silicon Wafer and Method for Manufacturing Same
- Publication number 20110123795
- Publication date May 26, 2011
- JX NIPPON MINING & METALS CORPORATION
- Kazuyuki Satoh
- C30 - CRYSTAL GROWTH
Information Patent Application
Lanthanum Oxide-based Sintered Compact, Sputtering Target Composed...
- Publication number 20110114481
- Publication date May 19, 2011
- JX NIPPON MINING & METALS CORPORATION
- Kazuyuki Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Oxide Sintered Compact, Sputtering Target Composed of the Sintered...
- Publication number 20110114482
- Publication date May 19, 2011
- JX NIPPON MINING & METALS CORPORATION
- Kazuyuki Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yoshimasa KOIDO

Person

Patents Grantslast 30 patents

Sb—Te-based alloy sintered compact sputtering target

Sputtering target and production method therefor

Sputtering target of sintered Sb—Te-based alloy

Sputtering target comprising Al—Te—Cu—Zr-based alloy and method of...

Sputtering target comprising Al—Te—Cu—Zr alloy, and method for prod...

Sputtering target-backing plate assembly, and its production method

Method of storing lanthanum oxide target, and vacuum-sealed lanthan...

Hybrid silicon wafer and method for manufacturing same

Patents Applicationslast 30 patents

Al2O3 Sputtering Target and Production Method Thereof

Sputtering Target Member And Method For Producing Same

Co Anode, And Co Electroplating Method Using Co Anode

Sb-Te-Based Alloy Sintered Compact Sputtering Target

Sputtering Target and Production Method Therefor

Sputtering Target Comprising Al-Te-Cu-Zr-Based Alloy and Method of...

Sputtering Target Comprising Al-Te-Cu-Zr Alloy, and Method for Prod...

SPUTTERING TARGET OF SINTERED Sb-Te-BASED ALLOY

Method of Storing Metal Lanthanum Target, Vacuum-sealed Metal Lanth...

Sb-Te-Based Alloy Sintered Compact Sputtering Target

SPUTTERING TARGET-BACKING PLATE ASSEMBLY, AND ITS PRODUCTION METHOD

Method of Storing Lanthanum Oxide Target, and Vacuum-Sealed Lanthan...

Method for Storing Target Comprising Rare Earth Metal or Oxide Thereof

Hybrid Silicon Wafer and Method for Manufacturing Same

Lanthanum Oxide-based Sintered Compact, Sputtering Target Composed...

Oxide Sintered Compact, Sputtering Target Composed of the Sintered...