Yoshimi Watabe

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment system and cleaning method of the same
- Patent number 8,002,947
- Issue date Aug 23, 2011
- Sanyo Electric Co., LTD
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cooling device for vacuum treatment device
- Patent number 7,913,752
- Issue date Mar 29, 2011
- Ishikawajima-Harima Heavy Industries Co., Ltd.
- Masashi Ueda
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Plasma treatment system and cleaning method of the same
- Patent number 7,530,359
- Issue date May 12, 2009
- Canon Anelva Corporation
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor thin film forming system
- Patent number 7,312,418
- Issue date Dec 25, 2007
- NEC Corporation
- Hiroshi Tanabe
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
S system for the formation of a silicon thin film and a semiconduct...
- Patent number 6,861,614
- Issue date Mar 1, 2005
- NEC Corporation
- Hiroshi Tanabe
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing system
- Patent number 6,664,496
- Issue date Dec 16, 2003
- Anelva Corporation
- Yoshimi Watabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film formation by inductively-coupled plasma CVD process
- Patent number 6,503,816
- Issue date Jan 7, 2003
- National Institute of Advanced Industrial Science and Technology
- Norikazu Ito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD apparatus suitable for manufacturing solar cell and the...
- Patent number 6,189,485
- Issue date Feb 20, 2001
- Anelva Corporation
- Akihisa Matsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD process for forming amorphous silicon thin film
- Patent number 5,437,895
- Issue date Aug 1, 1995
- Anelva Corporation
- Akira Kodama
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma treatment system and cleaning method of the same
- Publication number 20090095217
- Publication date Apr 16, 2009
- Canon ANELVA Corporation
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR THIN FILM FORMING SYSTEM
- Publication number 20070166945
- Publication date Jul 19, 2007
- Hiroshi Tanabe
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Semiconductor thin film forming system
- Publication number 20050109743
- Publication date May 26, 2005
- Hiroshi Tanabe
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Discharge apparatus, plasma processing method and solar cell
- Publication number 20050067934
- Publication date Mar 31, 2005
- Ishikawajima-Harima Heavy Industries Co., Ltd.
- Masashi Ueda
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Plasma processing device and method of cleaning the same
- Publication number 20040149386
- Publication date Aug 5, 2004
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing system
- Publication number 20020144980
- Publication date Oct 10, 2002
- ANELVA CORPORATION
- Yoshimi Watabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thin film forming method, thin film forming apparatus and solar cell
- Publication number 20010031542
- Publication date Oct 18, 2001
- Norikazu Ito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yoshimi Watabe

Person

Patents Grantslast 30 patents

Plasma treatment system and cleaning method of the same

Cooling device for vacuum treatment device

Plasma treatment system and cleaning method of the same

Semiconductor thin film forming system

S system for the formation of a silicon thin film and a semiconduct...

Plasma processing system

Thin film formation by inductively-coupled plasma CVD process

Plasma CVD apparatus suitable for manufacturing solar cell and the...

Plasma CVD process for forming amorphous silicon thin film

Patents Applicationslast 30 patents

Plasma treatment system and cleaning method of the same

SEMICONDUCTOR THIN FILM FORMING SYSTEM

Semiconductor thin film forming system

Discharge apparatus, plasma processing method and solar cell

Plasma processing device and method of cleaning the same

Plasma processing system

Thin film forming method, thin film forming apparatus and solar cell