Yoshimitsu Kon

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method and substrate processing apparatus
- Patent number 11,264,248
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Yoshimitsu Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching, device manufacturing method, and plasma processi...
- Patent number 11,121,001
- Issue date Sep 14, 2021
- Tokyo Electron Limited
- Satoshi Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method, plasma etching apparatus, control program an...
- Patent number 8,216,485
- Issue date Jul 10, 2012
- Tokyo Electron Limited
- Yoshimitsu Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and computer-readable storage medium
- Patent number 8,128,831
- Issue date Mar 6, 2012
- Tokyo Electron Limited
- Manabu Sato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240429027
- Publication date Dec 26, 2024
- TOKYO ELECTRON LIMITED
- Noriyuki SAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240213031
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Atsuki HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230326718
- Publication date Oct 12, 2023
- TOKYO ELECTRON LIMITED
- Hikoichiro SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20230268190
- Publication date Aug 24, 2023
- TOKYO ELECTRON LIMITED
- Atsuki HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING SILICON OXIDE FILM AND PLASMA PROCESSING APPARATUS
- Publication number 20210082712
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Koki CHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING, DEVICE MANUFACTURING METHOD, AND PLASMA PROCESSI...
- Publication number 20210057228
- Publication date Feb 25, 2021
- TOKYO ELECTRON LIMITED
- Satoshi YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200273712
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Atsushi UTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200185229
- Publication date Jun 11, 2020
- TOKYO ELECTRON LIMITED
- Yoshimitsu KON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20190198336
- Publication date Jun 27, 2019
- TOKYO ELECTRON LIMITED
- Yoshimitsu Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, CONTROL PROGRAM AN...
- Publication number 20080185364
- Publication date Aug 7, 2008
- TOKYO ELECTRON LIMITED
- Yoshimitsu Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CLEANING METHOD THEREOF
- Publication number 20070284043
- Publication date Dec 13, 2007
- TOKYO ELECTRON LIMITED
- Hideaki Tanaka
- B08 - CLEANING
Information Patent Application
PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM
- Publication number 20070165355
- Publication date Jul 19, 2007
- TOKYO ELECTON LIMITED
- Manabu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and cleaning method thereof
- Publication number 20060000552
- Publication date Jan 5, 2006
- TOKYO ELECTRON LIMITED
- Hideaki Tanaka
- B08 - CLEANING

Yoshimitsu Kon

Person

Patents Grantslast 30 patents

Etching method and substrate processing apparatus

Method of etching, device manufacturing method, and plasma processi...

Plasma etching method, plasma etching apparatus, control program an...

Plasma etching method and computer-readable storage medium

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

METHOD OF ETCHING SILICON OXIDE FILM AND PLASMA PROCESSING APPARATUS

METHOD OF ETCHING, DEVICE MANUFACTURING METHOD, AND PLASMA PROCESSI...

DEPOSITION PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS

ETCHING METHOD

PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, CONTROL PROGRAM AN...

PLASMA PROCESSING APPARATUS AND CLEANING METHOD THEREOF

PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM

Plasma processing apparatus and cleaning method thereof