Yoshinari Hatazaki

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Kurokawa-gun, Miyagi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,557,485
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing microlens and plasma processing apparatus
- Patent number 11,454,744
- Issue date Sep 27, 2022
- Tokyo Electron Limited
- Yoshinari Hatazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,094,551
- Issue date Aug 17, 2021
- Tokyo Electron Limited
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 10,658,189
- Issue date May 19, 2020
- Tokyo Electron Limited
- Yoshinari Hatazaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210320011
- Publication date Oct 14, 2021
- TOKYO ELECTRON LIMITED
- Yoshihide KIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Producing Microlens and Plasma Processing Apparatus
- Publication number 20200192004
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Yoshinari HATAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200194274
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Yoshihide KIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20190080917
- Publication date Mar 14, 2019
- TOKYO ELECTRON LIMITED
- Yoshinari Hatazaki
- H01 - BASIC ELECTRIC ELEMENTS