Yoshinobu HAYAKAWA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 10,460,950
- Issue date Oct 29, 2019
- Tokyo Electron Limited
- Akinobu Kakimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,115,567
- Issue date Oct 30, 2018
- Tokyo Electron Limited
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 9,793,136
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Kosei Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching silicon oxide film
- Patent number 9,257,301
- Issue date Feb 9, 2016
- Tokyo Electron Limited
- Masahiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of supplying etching gas and etching apparatus
- Patent number 8,815,106
- Issue date Aug 26, 2014
- Tokyo Electron Limited
- Masahiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 8,569,176
- Issue date Oct 29, 2013
- Tokyo Electron Limited
- Akira Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,513,563
- Issue date Aug 20, 2013
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method, plasma etching apparatus, control program an...
- Patent number 8,216,485
- Issue date Jul 10, 2012
- Tokyo Electron Limited
- Yoshimitsu Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,138,445
- Issue date Mar 20, 2012
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,034,213
- Issue date Oct 11, 2011
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220415661
- Publication date Dec 29, 2022
- TOKYO ELECTRON LIMITED
- Akinobu KAKIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS
- Publication number 20220415660
- Publication date Dec 29, 2022
- TOKYO ELECTRON LIMITED
- Akinobu KAKIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200035496
- Publication date Jan 30, 2020
- TOKYO ELECTRON LIMITED
- Akinobu KAKIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS
- Publication number 20200035497
- Publication date Jan 30, 2020
- TOKYO ELECTRON LIMITED
- Akinobu KAKIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20170125255
- Publication date May 4, 2017
- TOKYO ELECTRON LIMITED
- Akinobu KAKIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20160172205
- Publication date Jun 16, 2016
- TOKYO ELECTRON LIMITED
- Kosei Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160079037
- Publication date Mar 17, 2016
- TOKYO ELECTRON LIMITED
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING SILICON OXIDE FILM
- Publication number 20150056808
- Publication date Feb 26, 2015
- TOKYO ELECTRON LIMITED
- Masahiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20120145679
- Publication date Jun 14, 2012
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SUPPLYING ETCHING GAS AND ETCHING APPARATUS
- Publication number 20120037316
- Publication date Feb 16, 2012
- TOKYO ELECTRON LIMITED
- Masahiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20110237083
- Publication date Sep 29, 2011
- TOKYO ELECTRON LIMITED
- Akira NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, CONTROL PROGRAM AN...
- Publication number 20080185364
- Publication date Aug 7, 2008
- TOKYO ELECTRON LIMITED
- Yoshimitsu Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20070235426
- Publication date Oct 11, 2007
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20070227664
- Publication date Oct 4, 2007
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20070227666
- Publication date Oct 4, 2007
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yoshinobu HAYAKAWA

Person

Patents Grantslast 30 patents

Substrate processing system and substrate processing method

Plasma processing apparatus

Plasma etching method

Method of etching silicon oxide film

Method of supplying etching gas and etching apparatus

Substrate processing method

Plasma processing apparatus and plasma processing method

Plasma etching method, plasma etching apparatus, control program an...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PROCESSING APPARATUS

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

PLASMA ETCHING METHOD

PLASMA PROCESSING APPARATUS

METHOD OF ETCHING SILICON OXIDE FILM

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD OF SUPPLYING ETCHING GAS AND ETCHING APPARATUS

SUBSTRATE PROCESSING METHOD

PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS, CONTROL PROGRAM AN...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS