Yoshinori Hirano

Person

Annaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, photosensitive dry film, and patt...
- Patent number 11,460,774
- Issue date Oct 4, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming process
- Patent number 11,256,174
- Issue date Feb 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and pattern formin...
- Patent number 10,815,572
- Issue date Oct 27, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist film laminate and pattern forming process
- Patent number 10,719,015
- Issue date Jul 21, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemically amplified positive resist composition and patterning pro...
- Patent number 10,534,262
- Issue date Jan 14, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Chemically amplified positive resist film laminate and pattern form...
- Patent number 10,514,601
- Issue date Dec 24, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist dry film, dry film laminate an...
- Patent number 10,007,181
- Issue date Jun 26, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modified novolak phenolic resin, making method, and resist composition
- Patent number 9,777,102
- Issue date Oct 3, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing micro-structure
- Patent number 9,650,538
- Issue date May 16, 2017
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for manufacturing micro-structure and optically patternable...
- Patent number 9,606,435
- Issue date Mar 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Chemically amplified positive resist composition and patterning pro...
- Patent number 9,519,217
- Issue date Dec 13, 2016
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 9,513,550
- Issue date Dec 6, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organosiloxane-modified novolak resin and making method
- Patent number 9,238,708
- Issue date Jan 19, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Methods for manufacturing resin structure and micro-structure
- Patent number 9,017,928
- Issue date Apr 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modified novolak phenolic resin, making method, and resist composition
- Patent number 9,012,122
- Issue date Apr 21, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Methods for manufacturing resin structure and micro-structure
- Patent number 8,951,717
- Issue date Feb 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing micro-structure and optically patternable...
- Patent number 8,835,091
- Issue date Sep 16, 2014
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for manufacturing micro-structure
- Patent number 8,785,114
- Issue date Jul 22, 2014
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive lift-off resist composition and patterning process
- Patent number 8,492,067
- Issue date Jul 23, 2013
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyorganosiloxane, resin composition, and patterning process
- Patent number 8,048,611
- Issue date Nov 1, 2011
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 6,866,982
- Issue date Mar 15, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 6,635,400
- Issue date Oct 21, 2003
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers and positive resist compositions
- Patent number 6,437,058
- Issue date Aug 20, 2002
- Shin-Etsu Chemical Co., Ltd.
- Tomoyoshi Furihata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD
- Publication number 20230176479
- Publication date Jun 8, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATT...
- Publication number 20220382157
- Publication date Dec 1, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATT...
- Publication number 20200201182
- Publication date Jun 25, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS
- Publication number 20180299774
- Publication date Oct 18, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PATTERN FORMING PROCESS
- Publication number 20180239255
- Publication date Aug 23, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST FILM LAMINATE AND PATTERN FORM...
- Publication number 20180143535
- Publication date May 24, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically Amplified Positive Resist Composition and Patterning Pro...
- Publication number 20170115567
- Publication date Apr 27, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically Amplified Positive Resist Composition and Pattern Formin...
- Publication number 20170038684
- Publication date Feb 9, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AN...
- Publication number 20160070170
- Publication date Mar 10, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20150378259
- Publication date Dec 31, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20150355543
- Publication date Dec 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODIFIED NOVOLAK PHENOLIC RESIN, MAKING METHOD, AND RESIST COMPOSITION
- Publication number 20150087792
- Publication date Mar 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANOSILOXANE-MODIFIED NOVOLAK RESIN AND MAKING METHOD
- Publication number 20150057416
- Publication date Feb 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...
- Publication number 20140356790
- Publication date Dec 4, 2014
- Yoshinori HIRANO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD FOR MANUFACTURING MICRO-STRUCTURE
- Publication number 20140296380
- Publication date Oct 2, 2014
- Hideto KATO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHODS FOR MANUFACTURING RESIN STRUCTURE AND MICRO-STRUCTURE
- Publication number 20140220497
- Publication date Aug 7, 2014
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR MANUFACTURING RESIN STRUCTURE AND MICRO-STRUCTURE
- Publication number 20140072914
- Publication date Mar 13, 2014
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODIFIED NOVOLAK PHENOLIC RESIN, MAKING METHOD, AND RESIST COMPOSITION
- Publication number 20130101937
- Publication date Apr 25, 2013
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...
- Publication number 20120292286
- Publication date Nov 22, 2012
- Yoshinori HIRANO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
POSITIVE LIFT-OFF RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120129106
- Publication date May 24, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING MICRO-STRUCTURE
- Publication number 20110305990
- Publication date Dec 15, 2011
- Hideto KATO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
POLYORGANOSILOXANE, RESIN COMPOSITION, AND PATTERNING PROCESS
- Publication number 20090269697
- Publication date Oct 29, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hideto KATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition and patterning process
- Publication number 20030175617
- Publication date Sep 18, 2003
- Hideto Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and patterning process
- Publication number 20010044066
- Publication date Nov 22, 2001
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel polymers and positive resist compositions
- Publication number 20010018497
- Publication date Aug 30, 2001
- Tomoyoshi Furihata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yoshinori Hirano

Person

Patents Grantslast 30 patents

Photosensitive resin composition, photosensitive dry film, and patt...

Pattern forming process

Chemically amplified positive resist composition and pattern formin...

Positive resist film laminate and pattern forming process

Chemically amplified positive resist composition and patterning pro...

Chemically amplified positive resist film laminate and pattern form...

Chemically amplified positive resist dry film, dry film laminate an...

Modified novolak phenolic resin, making method, and resist composition

Method for manufacturing micro-structure

Method for manufacturing micro-structure and optically patternable...

Chemically amplified positive resist composition and patterning pro...

Positive resist composition and pattern forming process

Organosiloxane-modified novolak resin and making method

Methods for manufacturing resin structure and micro-structure

Modified novolak phenolic resin, making method, and resist composition

Methods for manufacturing resin structure and micro-structure

Method for manufacturing micro-structure and optically patternable...

Method for manufacturing micro-structure

Positive lift-off resist composition and patterning process

Polyorganosiloxane, resin composition, and patterning process

Resist composition and patterning process

Resist composition and patterning process

Polymers and positive resist compositions

Patents Applicationslast 30 patents

NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATT...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATT...

POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS

PATTERN FORMING PROCESS

CHEMICALLY AMPLIFIED POSITIVE RESIST FILM LAMINATE AND PATTERN FORM...

Chemically Amplified Positive Resist Composition and Patterning Pro...

Chemically Amplified Positive Resist Composition and Pattern Formin...

CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AN...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PRO...

MODIFIED NOVOLAK PHENOLIC RESIN, MAKING METHOD, AND RESIST COMPOSITION

ORGANOSILOXANE-MODIFIED NOVOLAK RESIN AND MAKING METHOD

METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...

METHOD FOR MANUFACTURING MICRO-STRUCTURE

METHODS FOR MANUFACTURING RESIN STRUCTURE AND MICRO-STRUCTURE

METHODS FOR MANUFACTURING RESIN STRUCTURE AND MICRO-STRUCTURE

MODIFIED NOVOLAK PHENOLIC RESIN, MAKING METHOD, AND RESIST COMPOSITION

METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...

POSITIVE LIFT-OFF RESIST COMPOSITION AND PATTERNING PROCESS

METHOD FOR MANUFACTURING MICRO-STRUCTURE

POLYORGANOSILOXANE, RESIN COMPOSITION, AND PATTERNING PROCESS

Resist composition and patterning process

Resist composition and patterning process

Novel polymers and positive resist compositions