Yoshinori Kinase

Person

Tokyo-To, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask for charged particle beam exposure, and method of forming the...
- Patent number 7,232,631
- Issue date Jun 19, 2007
- Dai Nippon Prinitng Co., Ltd.
- Kenichi Morimoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Halftone phase shift photomask and blank for halftone phase shift p...
- Patent number 6,869,736
- Issue date Mar 22, 2005
- Dai Nippon Printing Co., Ltd.
- Hiro-o Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask and blanks for halftone phase shift...
- Patent number 6,764,792
- Issue date Jul 20, 2004
- Dai Nippon Printing Co., Ltd.
- Junji Fujikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask
- Patent number 6,740,455
- Issue date May 25, 2004
- Dainippon Printing Co., Ltd.
- Kenji Noguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask and blank for halftone phase shift p...
- Patent number 6,599,667
- Issue date Jul 29, 2003
- Dai Nippon Printing Co., Ltd.
- Satoshi Yusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blank for halftone phase shift photomask and halftone phase shift p...
- Patent number 6,458,496
- Issue date Oct 1, 2002
- Dai Nippon Printing Co., Ltd.
- Toshiaki Motonaga
- B32 - LAYERED PRODUCTS
Information Patent Grant
Record display medium and use thereof
- Patent number 6,059,993
- Issue date May 9, 2000
- Dai Nippon Printing Co., Ltd.
- Atsushi Baba
- G02 - OPTICS
Information Patent Grant
Polymeric material for liquid crystal/polymer composite film, recor...
- Patent number 5,851,422
- Issue date Dec 22, 1998
- Dai Nippon Printing Co., Ltd.
- Wataru Saito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
Mask for charged particle beam exposure, and method of forming the...
- Publication number 20050008946
- Publication date Jan 13, 2005
- Kenichi Morimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Halftone phase shift photomask and blank for halftone phase shift p...
- Publication number 20030186135
- Publication date Oct 2, 2003
- Hiro-o Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask
- Publication number 20020119379
- Publication date Aug 29, 2002
- Kenji Noguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Halftone phase shift photomask and blank for halftone phase shift p...
- Publication number 20020039689
- Publication date Apr 4, 2002
- Satoshi Yusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Blank for halftone phase shift photomask and halftone phase shift p...
- Publication number 20010005564
- Publication date Jun 28, 2001
- Toshiaki Motonaga
- B32 - LAYERED PRODUCTS

Yoshinori Kinase

Person

Patents Grantslast 30 patents

Mask for charged particle beam exposure, and method of forming the...

Halftone phase shift photomask and blank for halftone phase shift p...

Halftone phase shift photomask and blanks for halftone phase shift...

Photomask

Halftone phase shift photomask and blank for halftone phase shift p...

Blank for halftone phase shift photomask and halftone phase shift p...

Record display medium and use thereof

Polymeric material for liquid crystal/polymer composite film, recor...

Patents Applicationslast 30 patents

Mask for charged particle beam exposure, and method of forming the...

Halftone phase shift photomask and blank for halftone phase shift p...

Photomask

Halftone phase shift photomask and blank for halftone phase shift p...

Blank for halftone phase shift photomask and halftone phase shift p...