YOSHIO KAWAI

Person

ISEHARA-SHI, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,592,287
- Issue date Feb 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, polyimide resin and method of producing the same, photose...
- Patent number 11,572,442
- Issue date Feb 7, 2023
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,555,697
- Issue date Jan 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Multifunctional polymers
- Patent number 11,500,285
- Issue date Nov 15, 2022
- International Business Machines Corporation
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, photosensitive resin composition, patterning method, metho...
- Patent number 11,333,975
- Issue date May 17, 2022
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-tone resist compositions and multifunctional polymers therein
- Patent number 10,345,700
- Issue date Jul 9, 2019
- International Business Machines Corporation
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photomask blank and method for manufacturing photomask blank
- Patent number 9,709,885
- Issue date Jul 18, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process using a boron phosphorus silicon glass film
- Patent number 9,580,623
- Issue date Feb 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask blank and method for manufacturing photomask blank
- Patent number 9,488,906
- Issue date Nov 8, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing photomask blank
- Patent number 9,400,422
- Issue date Jul 26, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takashi Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition and pattern formin...
- Patent number 9,244,348
- Issue date Jan 26, 2016
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, processing method, and etching method
- Patent number 8,858,814
- Issue date Oct 14, 2014
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,741,548
- Issue date Jun 3, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,703,384
- Issue date Apr 22, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,617,800
- Issue date Dec 31, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming process and resist-modifying composition
- Patent number 8,367,310
- Issue date Feb 5, 2013
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process and resist composition
- Patent number 7,741,015
- Issue date Jun 22, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Ester compound, polymer, resist composition, and patterning process
- Patent number 7,666,967
- Issue date Feb 23, 2010
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist protective coating material and patterning process
- Patent number 7,569,323
- Issue date Aug 4, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 7,488,567
- Issue date Feb 10, 2009
- Panasonic Corporation
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 7,378,218
- Issue date May 27, 2008
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, resist protective coating material, and patterning process
- Patent number 7,354,693
- Issue date Apr 8, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerizable compound, polymer, positive-resist composition, and p...
- Patent number 7,332,616
- Issue date Feb 19, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerizable ester compounds
- Patent number 7,276,623
- Issue date Oct 2, 2007
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, resist composition, and patterning process
- Patent number 7,241,553
- Issue date Jul 10, 2007
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymerizable compound, polymer, positive-resist composition, and p...
- Patent number 7,232,641
- Issue date Jun 19, 2007
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, positive resist composition, and patterning process using...
- Patent number 7,189,493
- Issue date Mar 13, 2007
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,169,869
- Issue date Jan 30, 2007
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,125,643
- Issue date Oct 24, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonates, polymers, resist compositions and patterning process
- Patent number 7,125,642
- Issue date Oct 24, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHO...
- Publication number 20210317268
- Publication date Oct 14, 2021
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, P...
- Publication number 20210317270
- Publication date Oct 14, 2021
- International Business Machines Corporation
- Dmitry Zubarev
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST
- Publication number 20200340806
- Publication date Oct 29, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIFUNCTIONAL POLYMERS
- Publication number 20200278607
- Publication date Sep 3, 2020
- International Business Machines Corporation
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK BLANK
- Publication number 20170023855
- Publication date Jan 26, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS
- Publication number 20160276152
- Publication date Sep 22, 2016
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN
- Publication number 20160070169
- Publication date Mar 10, 2016
- SHIN-ETSU CHEMICAL CO., LTD.
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK BLANK
- Publication number 20150086908
- Publication date Mar 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING PHOTOMASK BLANK
- Publication number 20150086909
- Publication date Mar 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takashi YOSHII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERN FORMIN...
- Publication number 20130209922
- Publication date Aug 15, 2013
- Keiichi MASUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120135350
- Publication date May 31, 2012
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PROCESSING METHOD, AND ETCHING METHOD
- Publication number 20100248493
- Publication date Sep 30, 2010
- Satoshi WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING PROCESS AND RESIST-MODIFYING COMPOSITION
- Publication number 20100209849
- Publication date Aug 19, 2010
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning process
- Publication number 20100055621
- Publication date Mar 4, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING PROCESS
- Publication number 20090053651
- Publication date Feb 26, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20080199806
- Publication date Aug 21, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL POLYMERIZABLE COMPOUND, POLYMER, POSITIVE-RESIST COMPOSITION,...
- Publication number 20070185226
- Publication date Aug 9, 2007
- SHIN-ETSU CHEMICAL CO., LTD.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel ester compound, polymer, resist composition, and patterning p...
- Publication number 20070128555
- Publication date Jun 7, 2007
- Central Glass Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resist protective coating material and patterning process
- Publication number 20070026341
- Publication date Feb 1, 2007
- SHIN-ETSU CHEMICAL CO., LTD.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel polymerizable ester compounds
- Publication number 20060269870
- Publication date Nov 30, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer, resist composition and patterning process
- Publication number 20060269871
- Publication date Nov 30, 2006
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer, resist composition and patterning process
- Publication number 20060177765
- Publication date Aug 10, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer, resist protective coating material, and patterning process
- Publication number 20060029884
- Publication date Feb 9, 2006
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Rinse and resist patterning process using the same
- Publication number 20050284502
- Publication date Dec 29, 2005
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20050267275
- Publication date Dec 1, 2005
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer, resist composition, and patterning process
- Publication number 20050221221
- Publication date Oct 6, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer, resist composition, and patterning process
- Publication number 20050175935
- Publication date Aug 11, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20050106499
- Publication date May 19, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20050089797
- Publication date Apr 28, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist compositions and patterning process
- Publication number 20050084796
- Publication date Apr 21, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

YOSHIO KAWAI

Person

Patents Grantslast 30 patents

Method for measuring distance of diffusion of curing catalyst

Compound, polyimide resin and method of producing the same, photose...

Method for measuring distance of diffusion of curing catalyst

Multifunctional polymers

Polymer, photosensitive resin composition, patterning method, metho...

Negative-tone resist compositions and multifunctional polymers therein

Photomask blank and method for manufacturing photomask blank

Patterning process using a boron phosphorus silicon glass film

Photomask blank and method for manufacturing photomask blank

Method for manufacturing photomask blank

Chemically amplified negative resist composition and pattern formin...

Photomask blank, processing method, and etching method

Patterning process

Positive resist composition and patterning process

Patterning process

Pattern forming process and resist-modifying composition

Patterning process and resist composition

Ester compound, polymer, resist composition, and patterning process

Resist protective coating material and patterning process

Polymer, resist composition and patterning process

Polymer, resist composition and patterning process

Polymer, resist protective coating material, and patterning process

Polymerizable compound, polymer, positive-resist composition, and p...

Polymerizable ester compounds

Polymer, resist composition, and patterning process

Polymerizable compound, polymer, positive-resist composition, and p...

Polymer, positive resist composition, and patterning process using...

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Sulfonates, polymers, resist compositions and patterning process

Patents Applicationslast 30 patents

POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHO...

NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, P...

METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST

MULTIFUNCTIONAL POLYMERS

PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK BLANK

PATTERNING PROCESS

NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN

PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK BLANK

METHOD FOR MANUFACTURING PHOTOMASK BLANK

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERN FORMIN...

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

PHOTOMASK BLANK, PROCESSING METHOD, AND ETCHING METHOD

PATTERN FORMING PROCESS AND RESIST-MODIFYING COMPOSITION

Patterning process

PATTERNING PROCESS

PATTERNING PROCESS AND RESIST COMPOSITION

NOVEL POLYMERIZABLE COMPOUND, POLYMER, POSITIVE-RESIST COMPOSITION,...

Novel ester compound, polymer, resist composition, and patterning p...

Resist protective coating material and patterning process

Novel polymerizable ester compounds

Polymer, resist composition and patterning process

Polymer, resist composition and patterning process

Polymer, resist protective coating material, and patterning process

Rinse and resist patterning process using the same

Polymers, resist compositions and patterning process

Polymer, resist composition, and patterning process

Polymer, resist composition, and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Resist compositions and patterning process