Yoshio Watanabe

Person

Hitachi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer processing method
- Patent number 12,094,776
- Issue date Sep 17, 2024
- Disco Corporation
- Susumu Yokoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method of workpiece
- Patent number 11,538,704
- Issue date Dec 27, 2022
- Disco Corporation
- Yoshio Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method of wafer
- Patent number 11,171,009
- Issue date Nov 9, 2021
- Disco Corporation
- Hiroyuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear encoder
- Patent number 10,209,103
- Issue date Feb 19, 2019
- Dr. Johannes Heidenhain GmbH
- Daisuke Shimoda
- G01 - MEASURING TESTING
Information Patent Grant
Method of processing wafer
- Patent number 10,177,004
- Issue date Jan 8, 2019
- Disco Corporation
- Yoshio Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus comprising a nozzle oscillating unit
- Patent number 10,176,972
- Issue date Jan 8, 2019
- Disco Corporation
- Yoshio Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analyzer having sensor with memory device
- Patent number 5,690,893
- Issue date Nov 25, 1997
- Hitachi, Ltd.
- Satoshi Ozawa
- G01 - MEASURING TESTING
Information Patent Grant
Solid-state ion sensor
- Patent number 5,505,836
- Issue date Apr 9, 1996
- Hitachi, Ltd.
- Yuji Miyahara
- G01 - MEASURING TESTING
Information Patent Grant
Ion sensor
- Patent number 5,472,590
- Issue date Dec 5, 1995
- Hitachi, Ltd.
- Koutarou Yamashita
- G01 - MEASURING TESTING
Information Patent Grant
Infrared spectrum measuring apparatus adapted for measuring the abs...
- Patent number 5,434,411
- Issue date Jul 18, 1995
- Hitachi, Ltd.
- Yuji Miyahara
- G01 - MEASURING TESTING
Information Patent Grant
Ion-selective electrode
- Patent number 5,413,685
- Issue date May 9, 1995
- Hitachi, Ltd.
- Satoshi Ozawa
- G01 - MEASURING TESTING
Information Patent Grant
Biochemical analyzer and attenuated total reflection prism cell use...
- Patent number 5,362,445
- Issue date Nov 8, 1994
- Hitachi, Ltd.
- Yuji Miyahara
- G01 - MEASURING TESTING
Information Patent Grant
Carbonic acid gas sensor
- Patent number 5,352,352
- Issue date Oct 4, 1994
- Hitachi, Ltd.
- Keiji Tsukada
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Electrolytic sensor for measuring the content of gas in a fluid
- Patent number 5,344,545
- Issue date Sep 6, 1994
- Hitachi, Ltd.
- Keiji Tsukada
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Apparatus for liquid chromatography for separating AIC components f...
- Patent number 5,294,336
- Issue date Mar 15, 1994
- Hitachi, Ltd.
- Masako Mizuno
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Integrated ion sensor
- Patent number 5,250,168
- Issue date Oct 5, 1993
- Hitachi, Ltd.
- Keiji Tsukada
- G01 - MEASURING TESTING
Information Patent Grant
Method for analysis of catecholamine
- Patent number 5,212,097
- Issue date May 18, 1993
- Hitachi, Ltd.
- Masao Kamahori
- G01 - MEASURING TESTING
Information Patent Grant
Liquid chromatograph
- Patent number 5,132,012
- Issue date Jul 21, 1992
- Hitachi, Ltd.
- Junkichi Miura
- G01 - MEASURING TESTING
Information Patent Grant
Method for biochemical assay and an analyzer for the method
- Patent number 5,093,267
- Issue date Mar 3, 1992
- Hitachi, Ltd.
- Junkichi Miura
- G01 - MEASURING TESTING
Information Patent Grant
Autosampler with a means for detecting air bubble in specimen
- Patent number 5,005,434
- Issue date Apr 9, 1991
- Hitachi, Ltd.
- Yoshio Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle source of large current with high energy
- Patent number 4,987,345
- Issue date Jan 22, 1991
- U.S. Philips Corporation
- Hans-Peter Stormberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray lithography system
- Patent number 4,899,355
- Issue date Feb 6, 1990
- U.S. Philips Corporation
- Hans-Peter Stormberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low-pressure discharge lamp
- Patent number 4,879,493
- Issue date Nov 7, 1989
- Hitachi, Ltd.
- Hiromistu Mastuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma X-ray source
- Patent number 4,841,556
- Issue date Jun 20, 1989
- Hitachi, Ltd.
- Yasuo Kato
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Pressure equilibrator for gases
- Patent number 4,827,966
- Issue date May 9, 1989
- Hitachi, Ltd.
- Nobuyoshi Takano
- G05 - CONTROLLING REGULATING
Information Patent Grant
Flow-through cell for a photometer formed using a pair of cell body...
- Patent number 4,823,168
- Issue date Apr 18, 1989
- Hitachi, Ltd.
- Masao Kamahori
- G01 - MEASURING TESTING
Information Patent Grant
Laminated printed coil structure
- Patent number 4,804,574
- Issue date Feb 14, 1989
- Sony Corporation
- Kenji Osawa
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Plasma x-ray source
- Patent number 4,715,054
- Issue date Dec 22, 1987
- Hitachi, Ltd.
- Yasuo Kato
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Low-pressure mercury vapor discharge lamp
- Patent number 4,697,121
- Issue date Sep 29, 1987
- Hitachi, Ltd.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Discharge lamp operating device
- Patent number 4,682,080
- Issue date Jul 21, 1987
- Hitachi, Ltd.
- Soichiro Ogawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
WAFER PROCESSING METHOD
- Publication number 20220102215
- Publication date Mar 31, 2022
- Disco Corporation
- Susumu YOKOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD OF WORKPIECE
- Publication number 20210090926
- Publication date Mar 25, 2021
- Disco Corporation
- Yoshio WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD OF WAFER
- Publication number 20210028022
- Publication date Jan 28, 2021
- Disco Corporation
- Hiroyuki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING WAFER
- Publication number 20180269068
- Publication date Sep 20, 2018
- Disco Corporation
- Yoshio Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINEAR ENCODER
- Publication number 20170199060
- Publication date Jul 13, 2017
- Dr. Johannes Heidenhain Gmbh
- Daisuke Shimoda
- G01 - MEASURING TESTING
Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20160343544
- Publication date Nov 24, 2016
- Disco Corporation
- Yoshio Watanabe
- H01 - BASIC ELECTRIC ELEMENTS

Yoshio Watanabe

Person

Patents Grantslast 30 patents

Wafer processing method

Processing method of workpiece

Processing method of wafer

Linear encoder

Method of processing wafer

Plasma etching apparatus comprising a nozzle oscillating unit

Analyzer having sensor with memory device

Solid-state ion sensor

Ion sensor

Infrared spectrum measuring apparatus adapted for measuring the abs...

Ion-selective electrode

Biochemical analyzer and attenuated total reflection prism cell use...

Carbonic acid gas sensor

Electrolytic sensor for measuring the content of gas in a fluid

Apparatus for liquid chromatography for separating AIC components f...

Integrated ion sensor

Method for analysis of catecholamine

Liquid chromatograph

Method for biochemical assay and an analyzer for the method

Autosampler with a means for detecting air bubble in specimen

Charged particle source of large current with high energy

X-ray lithography system

Low-pressure discharge lamp

Plasma X-ray source

Pressure equilibrator for gases

Flow-through cell for a photometer formed using a pair of cell body...

Laminated printed coil structure

Plasma x-ray source

Low-pressure mercury vapor discharge lamp

Discharge lamp operating device

Patents Applicationslast 30 patents

WAFER PROCESSING METHOD

PROCESSING METHOD OF WORKPIECE

PROCESSING METHOD OF WAFER

METHOD OF PROCESSING WAFER

LINEAR ENCODER

PLASMA ETCHING APPARATUS