Yoshiro Kabe

Person

Amagasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for forming silicon oxide film
- Patent number 8,389,420
- Issue date Mar 5, 2013
- Tokyo Electron Limited
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma oxidation processing method, plasma processing apparatus and...
- Patent number 8,372,761
- Issue date Feb 12, 2013
- Tokyo Electron Limited
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming silicon oxide film
- Patent number 8,318,267
- Issue date Nov 27, 2012
- Tokyo Electron Limited
- Yoshiro Kabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pattern forming method and semiconductor device manufacturing method
- Patent number 8,119,530
- Issue date Feb 21, 2012
- National University Corporation Nagoya University
- Masaru Hori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and plasma oxidation trea...
- Patent number 8,105,958
- Issue date Jan 31, 2012
- Tokyo Electron Limited
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma oxidizing method, storage medium, and plasma processing appa...
- Patent number 8,043,979
- Issue date Oct 25, 2011
- Tokyo Electron Limited
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for insulating film formation, storage medium from which inf...
- Patent number 8,034,179
- Issue date Oct 11, 2011
- Tokyo Electron Limited
- Yoshiro Kabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming silicon oxide film and method of production of se...
- Patent number 8,026,187
- Issue date Sep 27, 2011
- Tokyo Electron Limited
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming silicon oxide film, plasma processing apparatus...
- Patent number 8,003,484
- Issue date Aug 23, 2011
- Tokyo Electron Limited
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma oxidation processing method
- Patent number 7,989,364
- Issue date Aug 2, 2011
- National University Corporation Nagoya University
- Masaru Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device and plasma oxidation...
- Patent number 7,981,785
- Issue date Jul 19, 2011
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma oxidizing method, plasma processing apparatus, and storage m...
- Patent number 7,910,495
- Issue date Mar 22, 2011
- Tokyo Electron Limited
- Toshihiko Shiozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning treatment chamber in substrate treating apparat...
- Patent number 7,887,637
- Issue date Feb 15, 2011
- Tokyo Electron Limited
- Shigenori Ozaki
- B08 - CLEANING
Information Patent Grant
Manufacturing method of semiconductor device, semiconductor manufac...
- Patent number 7,524,774
- Issue date Apr 28, 2009
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MICROWAVE HEATING APPARATUS AND PROCESSING METHOD
- Publication number 20150090708
- Publication date Apr 2, 2015
- TOKYO ELECTRON LIMITED
- Sumi Tanaka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MICROWAVE HEAT TREATMENT METHOD
- Publication number 20140283734
- Publication date Sep 25, 2014
- TOKYO ELECTRON LIMITED
- Taichi MONDEN
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR CLEANING MICROWAVE PROCESSING APPARATUS
- Publication number 20140041682
- Publication date Feb 13, 2014
- TOKYO ELECTRON LIMITED
- Taichi MONDEN
- B08 - CLEANING
Information Patent Application
MICROWAVE PROCESSING METHOD AND MICROWAVE PROCESSING APPARATUS
- Publication number 20140042153
- Publication date Feb 13, 2014
- TOKYO ELECTRON LIMITED
- Kouji Shimomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING OBJECT
- Publication number 20140038430
- Publication date Feb 6, 2014
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON OXIDE FILM FORMING METHOD AND PLASMA OXIDATION APPARATUS
- Publication number 20130012033
- Publication date Jan 10, 2013
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20120252226
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Yoshiro KABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA NITRIDING METHOD, PLASMA NITRIDING APPARATUS AND METHOD OF M...
- Publication number 20120252209
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING GERMANIUM OXIDE FILM AND MATERIAL FOR ELECTRONIC...
- Publication number 20120248583
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Yoshiro KABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVE OXIDATION, DEVICE FOR SELECTIVE OXIDATION, AND...
- Publication number 20120094505
- Publication date Apr 19, 2012
- TOKYO ELECTRON LIMITED
- Hideo Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND END POINT...
- Publication number 20110174776
- Publication date Jul 21, 2011
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FORMING SILICON OXIDE FILM
- Publication number 20110171835
- Publication date Jul 14, 2011
- TOKYO ELECTRON LIMITED
- Yoshiro KABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR INSULATING FILM FORMATION, STORAGE MEDIUM FROM WHICH INF...
- Publication number 20110039418
- Publication date Feb 17, 2011
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110024048
- Publication date Feb 3, 2011
- TOKYO ELECTRON LIMITED
- Hideo Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming silicon oxide film, storage medium, and plasma p...
- Publication number 20110017586
- Publication date Jan 27, 2011
- TOKYO ELECTRON LIMITED
- Hideo Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20100291319
- Publication date Nov 18, 2010
- TOKYO ELECTRON LIMITED
- Jun Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FORMING SILICON OXIDE FILM
- Publication number 20100247805
- Publication date Sep 30, 2010
- Tokyo Electron Limited
- Yoshiro Kabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING SILICON OXIDE FILM AND METHOD OF PRODUCTION OF SE...
- Publication number 20100184267
- Publication date Jul 22, 2010
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA OXIDATION PROCESSING METHOD, PLASMA PROCESSING APPARATUS AND...
- Publication number 20100136797
- Publication date Jun 3, 2010
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA OXIDIZING METHOD, STORAGE MEDIUM, AND PLASMA PROCESSING APPA...
- Publication number 20100105216
- Publication date Apr 29, 2010
- TOKYO ELECTRON LIMITED
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SILICON OXIDE FILM, PLASMA PROCESSING APPARATUS...
- Publication number 20100093185
- Publication date Apr 15, 2010
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20100093179
- Publication date Apr 15, 2010
- National University Corporation Nagoya University
- Masaru Hori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA OXIDIZING METHOD, PLASMA PROCESSING APPARATUS, AND STORAGE M...
- Publication number 20100029093
- Publication date Feb 4, 2010
- TOKYO ELECTRON LIMITED
- Toshihiko Shiozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA OXIDIZING METHOD, PLASMA PROCESSING APPARATUS, AND STORAGE M...
- Publication number 20100015815
- Publication date Jan 21, 2010
- Tokyo Electron Limited
- Toshihiko Shiozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA OXIDATION PROCESSING METHOD
- Publication number 20090263919
- Publication date Oct 22, 2009
- NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
- Masaru Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device Manufacturing Method and Plasma Oxidation Trea...
- Publication number 20080032511
- Publication date Feb 7, 2008
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing Semiconductor Device and Plasma Oxidation...
- Publication number 20070224836
- Publication date Sep 27, 2007
- TOKYO ELECTRON LIMITED
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for cleaning treatment chamber iIn substrate treating appara...
- Publication number 20070163617
- Publication date Jul 19, 2007
- Tokyo Electron Limited
- Shigenori Ozaki
- B08 - CLEANING
Information Patent Application
Manufacturing method of semiconductor device, semiconductor manufac...
- Publication number 20060166446
- Publication date Jul 27, 2006
- TOKYO ELECTRON LIMITED
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Yoshiro Kabe

Person

Patents Grantslast 30 patents

Method and apparatus for forming silicon oxide film

Plasma oxidation processing method, plasma processing apparatus and...

Method and apparatus for forming silicon oxide film

Pattern forming method and semiconductor device manufacturing method

Semiconductor device manufacturing method and plasma oxidation trea...

Plasma oxidizing method, storage medium, and plasma processing appa...

Method for insulating film formation, storage medium from which inf...

Method of forming silicon oxide film and method of production of se...

Method for forming silicon oxide film, plasma processing apparatus...

Plasma oxidation processing method

Method for manufacturing semiconductor device and plasma oxidation...

Plasma oxidizing method, plasma processing apparatus, and storage m...

Method for cleaning treatment chamber in substrate treating apparat...

Manufacturing method of semiconductor device, semiconductor manufac...

Patents Applicationslast 30 patents

MICROWAVE HEATING APPARATUS AND PROCESSING METHOD

MICROWAVE HEAT TREATMENT METHOD

METHOD FOR CLEANING MICROWAVE PROCESSING APPARATUS

MICROWAVE PROCESSING METHOD AND MICROWAVE PROCESSING APPARATUS

METHOD FOR PROCESSING OBJECT

SILICON OXIDE FILM FORMING METHOD AND PLASMA OXIDATION APPARATUS

PLASMA PROCESSING METHOD

PLASMA NITRIDING METHOD, PLASMA NITRIDING APPARATUS AND METHOD OF M...

METHOD FOR FORMING GERMANIUM OXIDE FILM AND MATERIAL FOR ELECTRONIC...

METHOD FOR SELECTIVE OXIDATION, DEVICE FOR SELECTIVE OXIDATION, AND...

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND END POINT...

METHOD AND APPARATUS FOR FORMING SILICON OXIDE FILM

METHOD FOR INSULATING FILM FORMATION, STORAGE MEDIUM FROM WHICH INF...

PLASMA PROCESSING APPARATUS

Method for forming silicon oxide film, storage medium, and plasma p...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD AND APPARATUS FOR FORMING SILICON OXIDE FILM

METHOD OF FORMING SILICON OXIDE FILM AND METHOD OF PRODUCTION OF SE...

PLASMA OXIDATION PROCESSING METHOD, PLASMA PROCESSING APPARATUS AND...

PLASMA OXIDIZING METHOD, STORAGE MEDIUM, AND PLASMA PROCESSING APPA...

METHOD FOR FORMING SILICON OXIDE FILM, PLASMA PROCESSING APPARATUS...

PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

PLASMA OXIDIZING METHOD, PLASMA PROCESSING APPARATUS, AND STORAGE M...

PLASMA OXIDIZING METHOD, PLASMA PROCESSING APPARATUS, AND STORAGE M...

PLASMA OXIDATION PROCESSING METHOD

Semiconductor Device Manufacturing Method and Plasma Oxidation Trea...

Method for Manufacturing Semiconductor Device and Plasma Oxidation...

Method for cleaning treatment chamber iIn substrate treating appara...

Manufacturing method of semiconductor device, semiconductor manufac...