Yoshitaka Komuro

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Alternating copolymer, method of producing alternating copolymer, m...
- Patent number 11,780,946
- Issue date Oct 10, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Akiyoshi Yamazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organically modified metal oxide nanoparticles, organically modifie...
- Patent number 11,747,724
- Issue date Sep 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Kiwamu Sue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,709,425
- Issue date Jul 25, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Takaya Maehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,703,756
- Issue date Jul 18, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, aci...
- Patent number 11,667,605
- Issue date Jun 6, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yamazaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of producing block copolymer capable of creating specific st...
- Patent number 11,560,444
- Issue date Jan 24, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki Hayakawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition, method of forming resist pattern, compound, aci...
- Patent number 11,281,099
- Issue date Mar 22, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yamazaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, and method of forming resist pattern
- Patent number 11,256,169
- Issue date Feb 22, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 11,221,557
- Issue date Jan 11, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,181,822
- Issue date Nov 23, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of preparing polymer compound
- Patent number 10,414,918
- Issue date Sep 17, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method for forming resist pattern, compound, an...
- Patent number 10,394,122
- Issue date Aug 27, 2019
- TOYKO OHKA KOGYO CO., LTD.
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method
- Patent number 10,366,888
- Issue date Jul 30, 2019
- Tokyo Electron Limited
- Kazuki Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,324,377
- Issue date Jun 18, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method for forming a pattern
- Patent number 10,317,797
- Issue date Jun 11, 2019
- Tokyo Electron Limited
- Hidetami Yaegashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Resist composition, method for forming resist pattern, and polymer...
- Patent number 10,295,905
- Issue date May 21, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacturing polymer compound
- Patent number 10,100,134
- Issue date Oct 16, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Monomer having N-acyl carbamoyl group and lactone skeleton, and pol...
- Patent number 9,862,695
- Issue date Jan 9, 2018
- Daicel Corporation
- Hiroshi Koyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-type resist composition, method for forming resist pattern...
- Patent number 9,766,541
- Issue date Sep 19, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,639,002
- Issue date May 2, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,606,433
- Issue date Mar 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,557,647
- Issue date Jan 31, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition, method of forming resist pattern and c...
- Patent number 9,499,646
- Issue date Nov 22, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 9,411,227
- Issue date Aug 9, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist composition, method of forming resist pattern, and...
- Patent number 9,366,960
- Issue date Jun 14, 2016
- TOKYO OHA KOGYO CO., LTD.
- Naoki Yamashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, acid generator, polymeric compound and method o...
- Patent number 9,354,515
- Issue date May 31, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,341,947
- Issue date May 17, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, compound, polymeric compound and method of form...
- Patent number 9,244,347
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 9,235,123
- Issue date Jan 12, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method for forming resist pattern, and compound
- Patent number 9,164,379
- Issue date Oct 20, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20230408917
- Publication date Dec 21, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Takatoshi Inari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220171286
- Publication date Jun 2, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takatoshi INARI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACI...
- Publication number 20210389668
- Publication date Dec 16, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto YAMAZAKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, M...
- Publication number 20210230332
- Publication date Jul 29, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Akiyoshi YAMAZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANICALLY MODIFIED METAL OXIDE NANOPARTICLES, ORGANICALLY MODIFIE...
- Publication number 20210191261
- Publication date Jun 24, 2021
- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Kiwamu SUE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210141307
- Publication date May 13, 2021
- TOKYO OHKA KYGYO CO., LTD.
- Mari Murata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20210055656
- Publication date Feb 25, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi ONISHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF PRODUCING BLOCK COPOLYMER CAPABLE OF CREATING SPECIFIC ST...
- Publication number 20200262960
- Publication date Aug 20, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki HAYAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20190361345
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190361343
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi ONISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190361346
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190361342
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takaya MAEHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACI...
- Publication number 20190361344
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto YAMAZAKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20180374695
- Publication date Dec 27, 2018
- TOKYO ELECTRON LIMITED
- Kazuki YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD FOR FORMING A PATTERN
- Publication number 20180143536
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER...
- Publication number 20180024433
- Publication date Jan 25, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka KOMURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PREPARING POLYMER COMPOUND
- Publication number 20180022916
- Publication date Jan 25, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka KOMURO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20170369698
- Publication date Dec 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Issei SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MANUFACTURING POLYMER COMPOUND
- Publication number 20170166664
- Publication date Jun 15, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20160376233
- Publication date Dec 29, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto YAMAZAKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20160363860
- Publication date Dec 15, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Taku HIRAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND C...
- Publication number 20160259244
- Publication date Sep 8, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki YAMASHITA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20160116843
- Publication date Apr 28, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POL...
- Publication number 20160060374
- Publication date Mar 3, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroshi KOYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20160062236
- Publication date Mar 3, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20150198881
- Publication date Jul 16, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20150192851
- Publication date Jul 9, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, ACID GENERATOR, POLYMERIC COMPOUND AND METHOD O...
- Publication number 20150037734
- Publication date Feb 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT AND PHOTO-ACID GENERATOR
- Publication number 20140357896
- Publication date Dec 4, 2014
- SAN-APRO LTD.
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...
- Publication number 20140356787
- Publication date Dec 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY

Yoshitaka Komuro

Person

Patents Grantslast 30 patents

Alternating copolymer, method of producing alternating copolymer, m...

Organically modified metal oxide nanoparticles, organically modifie...

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, aci...

Method of producing block copolymer capable of creating specific st...

Resist composition, method of forming resist pattern, compound, aci...

Resist composition, and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, and...

Resist composition and method of forming resist pattern

Method of preparing polymer compound

Resist composition, method for forming resist pattern, compound, an...

Pattern forming method

Resist composition and method of forming resist pattern

Pattern forming method for forming a pattern

Resist composition, method for forming resist pattern, and polymer...

Method for manufacturing polymer compound

Monomer having N-acyl carbamoyl group and lactone skeleton, and pol...

Positive-type resist composition, method for forming resist pattern...

Method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Resist composition and method of forming resist pattern

Negative resist composition, method of forming resist pattern and c...

Resist composition, method of forming resist pattern, compound, and...

Negative resist composition, method of forming resist pattern, and...

Resist composition, acid generator, polymeric compound and method o...

Resist composition and method of forming resist pattern

Resist composition, compound, polymeric compound and method of form...

Resist composition and resist pattern forming method

Resist composition, method for forming resist pattern, and compound

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACI...

ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, M...

ORGANICALLY MODIFIED METAL OXIDE NANOPARTICLES, ORGANICALLY MODIFIE...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

METHOD OF PRODUCING BLOCK COPOLYMER CAPABLE OF CREATING SPECIFIC ST...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACI...

PATTERN FORMING METHOD

PATTERN FORMING METHOD FOR FORMING A PATTERN

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER...

METHOD OF PREPARING POLYMER COMPOUND

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

METHOD FOR MANUFACTURING POLYMER COMPOUND

POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND C...

METHOD OF FORMING RESIST PATTERN

MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POL...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

RESIST COMPOSITION, ACID GENERATOR, POLYMERIC COMPOUND AND METHOD O...

SULFONIUM SALT AND PHOTO-ACID GENERATOR

RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...