Yoshitaka Yokota

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor devices suitable for narrow pitch applications and me...
- Patent number 9,530,898
- Issue date Dec 27, 2016
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post treatment methods for oxide layers on semiconductor devices
- Patent number 9,431,237
- Issue date Aug 30, 2016
- Applied Materials, Inc.
- Kai Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving oxide growth rate of selective oxidation processes
- Patent number 9,117,661
- Issue date Aug 25, 2015
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for single step selective nitridation
- Patent number 9,023,700
- Issue date May 5, 2015
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma radical treatment of silicon oxide
- Patent number 8,916,484
- Issue date Dec 23, 2014
- Applied Materials, Inc.
- Christopher S. Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal reactor with improved gas flow distribution
- Patent number 8,888,916
- Issue date Nov 18, 2014
- Applied Materials, Inc.
- Ming-Kuei (Michael) Tseng
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Method and apparatus for single step selective nitridation
- Patent number 8,748,259
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma radical treatment of silicon oxide
- Patent number 8,741,785
- Issue date Jun 3, 2014
- Applied Materials, Inc.
- Christopher S. Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal reactor with improved gas flow distribution
- Patent number 8,608,853
- Issue date Dec 17, 2013
- Applied Materials, Inc.
- Ming-Kuei (Michael) Tseng
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Method of improving oxide growth rate of selective oxidation processes
- Patent number 8,546,271
- Issue date Oct 1, 2013
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of thermally treating silicon with oxygen
- Patent number 8,497,193
- Issue date Jul 30, 2013
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming oxide layers on substrates
- Patent number 8,492,292
- Issue date Jul 23, 2013
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming conformal oxide layers on semiconductor devices
- Patent number 8,435,906
- Issue date May 7, 2013
- Applied Materials, Inc.
- Agus S. Tjandra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water cooled gas injector
- Patent number 8,409,353
- Issue date Apr 2, 2013
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for oxidation of a semiconductor device
- Patent number 8,207,044
- Issue date Jun 26, 2012
- Applied Materials, Inc.
- Rajesh Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal reactor with improved gas flow distribution
- Patent number 8,056,500
- Issue date Nov 15, 2011
- Applied Materials, Inc.
- Ming-Kuei (Michael) Tseng
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Dual frequency low temperature oxidation of a semiconductor device
- Patent number 8,043,981
- Issue date Oct 25, 2011
- Applied Materials, Inc.
- Kai Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal oxidation of silicon using ozone
- Patent number 7,972,441
- Issue date Jul 5, 2011
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving oxide growth rate of selective oxidation processes
- Patent number 7,951,728
- Issue date May 31, 2011
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for oxidation of a semiconductor device
- Patent number 7,947,561
- Issue date May 24, 2011
- Applied Materials, Inc.
- Rajesh Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
UV assisted thermal processing
- Patent number 7,547,633
- Issue date Jun 16, 2009
- Applied Materials, Inc.
- Joseph Michael Ranish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for silicon oxide and oxynitride deposition using single wa...
- Patent number 6,713,127
- Issue date Mar 30, 2004
- Applied Materials, Inc.
- Janardhanan Anand Subramony
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICES SUITABLE FOR NARROW PITCH APPLICATIONS AND ME...
- Publication number 20150102396
- Publication date Apr 16, 2015
- Applied Materials, Inc.
- UDAYAN GANGULY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SINGLE STEP SELECTIVE NITRIDATION
- Publication number 20140342543
- Publication date Nov 20, 2014
- Udayan GANGULY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA RADICAL TREATMENT OF SILICON OXIDE
- Publication number 20140227888
- Publication date Aug 14, 2014
- CHRISTOPHER S. OLSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION
- Publication number 20140079376
- Publication date Mar 20, 2014
- Applied Materials, Inc.
- Ming-Kuei (Michael) TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IMPROVING OXIDE GROWTH RATE OF SELECTIVE OXIDATION PROCESSES
- Publication number 20140057455
- Publication date Feb 27, 2014
- Applied Materials, Inc.
- Yoshitaka YOKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA RADICAL TREATMENT OF SILICON OXIDE
- Publication number 20130109164
- Publication date May 2, 2013
- Applied Materials, Inc.
- Christopher S. Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION
- Publication number 20120058648
- Publication date Mar 8, 2012
- Ming-Kuei (Michael) Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Water cooled gas injector
- Publication number 20120031332
- Publication date Feb 9, 2012
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of thermally treating silicon with oxygen
- Publication number 20110250764
- Publication date Oct 13, 2011
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IMPROVING OXIDE GROWTH RATE OF SELECTIVE OXIDATION PROCESSES
- Publication number 20110230060
- Publication date Sep 22, 2011
- YOSHITAKA YOKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SINGLE STEP SELECTIVE NITRIDATION
- Publication number 20110217834
- Publication date Sep 8, 2011
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR OXIDATION OF A SEMICONDUCTOR DEVICE
- Publication number 20110217850
- Publication date Sep 8, 2011
- Applied Materials, Inc.
- RAJESH MANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Methods for Cyclical Oxidation and Etching
- Publication number 20110061812
- Publication date Mar 17, 2011
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING OXIDE LAYERS ON SUBSTRATES
- Publication number 20100330814
- Publication date Dec 30, 2010
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post Treatment Methods for Oxide Layers on Semiconductor Devices
- Publication number 20100267248
- Publication date Oct 21, 2010
- Applied Materials, Inc.
- Kai Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Frequency Low Temperature Oxidation of a Semiconductor Device
- Publication number 20100267247
- Publication date Oct 21, 2010
- Applied Materials, Inc.
- Kai Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Conformal Oxide Layers on Semiconductor Devices
- Publication number 20100216317
- Publication date Aug 26, 2010
- Applied Materials, Inc.
- Agus S. Tjandra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA AND THERMAL ANNEAL TREATMENT TO IMPROVE OXIDATION RESISTANCE...
- Publication number 20100120245
- Publication date May 13, 2010
- Agus Sofian Tjandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POST OXIDATION ANNEALING OF LOW TEMPERATURE THERMAL OR PLASMA BASED...
- Publication number 20090311877
- Publication date Dec 17, 2009
- Applied Materials, Inc.
- CHRISTOPHER S. OLSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR OXIDATION OF A SEMICONDUCTOR DEVICE
- Publication number 20090233453
- Publication date Sep 17, 2009
- Applied Materials, Inc.
- RAJESH MANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION
- Publication number 20090163042
- Publication date Jun 25, 2009
- Applied Materials, Inc.
- Ming-Kuei (Michael) Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IMPROVING OXIDE GROWTH RATE OF SELECTIVE OXIDATION PROCESSES
- Publication number 20090081884
- Publication date Mar 26, 2009
- YOSHITAKA YOKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV assisted thermal processing
- Publication number 20080067416
- Publication date Mar 20, 2008
- APPLIED MATERIALS, INC.
- Joseph Michael Ranish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Thermally Oxidizing Silicon Using Ozone
- Publication number 20070026693
- Publication date Feb 1, 2007
- Applied Materials, Inc.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing platform allowing processing in different ambi...
- Publication number 20060240680
- Publication date Oct 26, 2006
- APPLIED MATERIALS, INC.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermal oxidation of silicon using ozone
- Publication number 20060223315
- Publication date Oct 5, 2006
- APPLIED MATERIALS, INC.
- Yoshitaka Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for silicon oxide and oxynitride deposition using single wa...
- Publication number 20030138562
- Publication date Jul 24, 2003
- Janardhanan Anand Subramony
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yoshitaka Yokota

Person

Patents Grantslast 30 patents

Semiconductor devices suitable for narrow pitch applications and me...

Post treatment methods for oxide layers on semiconductor devices

Method of improving oxide growth rate of selective oxidation processes

Method and apparatus for single step selective nitridation

Remote plasma radical treatment of silicon oxide

Thermal reactor with improved gas flow distribution

Method and apparatus for single step selective nitridation

Remote plasma radical treatment of silicon oxide

Thermal reactor with improved gas flow distribution

Method of improving oxide growth rate of selective oxidation processes

Method of thermally treating silicon with oxygen

Methods of forming oxide layers on substrates

Methods for forming conformal oxide layers on semiconductor devices

Water cooled gas injector

Methods for oxidation of a semiconductor device

Thermal reactor with improved gas flow distribution

Dual frequency low temperature oxidation of a semiconductor device

Thermal oxidation of silicon using ozone

Method of improving oxide growth rate of selective oxidation processes

Methods for oxidation of a semiconductor device

UV assisted thermal processing

Methods for silicon oxide and oxynitride deposition using single wa...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICES SUITABLE FOR NARROW PITCH APPLICATIONS AND ME...

METHOD AND APPARATUS FOR SINGLE STEP SELECTIVE NITRIDATION

REMOTE PLASMA RADICAL TREATMENT OF SILICON OXIDE

THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION

METHOD OF IMPROVING OXIDE GROWTH RATE OF SELECTIVE OXIDATION PROCESSES

REMOTE PLASMA RADICAL TREATMENT OF SILICON OXIDE

THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION

Water cooled gas injector

Method of thermally treating silicon with oxygen

METHOD OF IMPROVING OXIDE GROWTH RATE OF SELECTIVE OXIDATION PROCESSES

METHOD AND APPARATUS FOR SINGLE STEP SELECTIVE NITRIDATION

METHODS FOR OXIDATION OF A SEMICONDUCTOR DEVICE

Apparatus and Methods for Cyclical Oxidation and Etching

METHODS OF FORMING OXIDE LAYERS ON SUBSTRATES

Post Treatment Methods for Oxide Layers on Semiconductor Devices

Dual Frequency Low Temperature Oxidation of a Semiconductor Device

Methods for Forming Conformal Oxide Layers on Semiconductor Devices

PLASMA AND THERMAL ANNEAL TREATMENT TO IMPROVE OXIDATION RESISTANCE...

POST OXIDATION ANNEALING OF LOW TEMPERATURE THERMAL OR PLASMA BASED...

METHODS FOR OXIDATION OF A SEMICONDUCTOR DEVICE

THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION

METHOD OF IMPROVING OXIDE GROWTH RATE OF SELECTIVE OXIDATION PROCESSES

UV assisted thermal processing

Method of Thermally Oxidizing Silicon Using Ozone

Substrate processing platform allowing processing in different ambi...

Thermal oxidation of silicon using ozone

Methods for silicon oxide and oxynitride deposition using single wa...