Yoshiyasu Ishihama

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Vapor phase epitaxy apparatus of group III nitride semiconductor
- Patent number 8,679,254
- Issue date Mar 25, 2014
- Japan Pionics Co., Ltd.
- Kenji Iso
- C30 - CRYSTAL GROWTH
Information Patent Grant
Chemical vapor deposition apparatus
- Patent number 8,277,893
- Issue date Oct 2, 2012
- Japan Pionics Co., Ltd.
- Tatsuya Ohori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition apparatus and chemical vapor deposition m...
- Patent number 6,666,921
- Issue date Dec 23, 2003
- Japan Pionics Co., Ltd.
- Shiro Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition apparatus and chemical vapor deposition m...
- Patent number 6,592,674
- Issue date Jul 15, 2003
- Japan Pionics Co., Ltd.
- Shiro Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for supplying liquid raw material
- Patent number 6,461,407
- Issue date Oct 8, 2002
- Japan Pionics Co., Ltd.
- Yukichi Takamatsu
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Apparatus for vaporizing and supplying a material
- Patent number 6,155,540
- Issue date Dec 5, 2000
- Japan Pionics Co., Ltd.
- Yukichi Takamatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for preparing nitride film
- Patent number 6,106,898
- Issue date Aug 22, 2000
- Japan Pionics, Co., Ltd.
- Yukichi Takamatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Purified alkoxide and process for purifying crude alkoxide
- Patent number 6,100,415
- Issue date Aug 8, 2000
- Japan Pionics Co., Ltd.
- Yukichi Takamatsu
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
VAPOR PHASE EPITAXY APPARATUS OF GROUP III NITRIDE SEMICONDUCTOR
- Publication number 20110180001
- Publication date Jul 28, 2011
- JAPAN PIONICS CO., LTD.
- Kenji ISO
- C30 - CRYSTAL GROWTH
Information Patent Application
VAPOR PHASE EPITAXY APPARATUS OF GROUP III NITRIDE SEMICONDUCTOR
- Publication number 20100307418
- Publication date Dec 9, 2010
- JAPAN PIONICS., LTD.
- Kenji ISO
- C30 - CRYSTAL GROWTH
Information Patent Application
VAPOR PHASE EPITAXY APPARATUS OF GROUP III NITRIDE SEMICONDUCTOR
- Publication number 20100229794
- Publication date Sep 16, 2010
- Kenji ISO
- C30 - CRYSTAL GROWTH
Information Patent Application
CHEMICAL VAPOR DEPOSITION APPARATUS
- Publication number 20090269938
- Publication date Oct 29, 2009
- Tatsuya Ohori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical vapor deposition apparatus
- Publication number 20070051316
- Publication date Mar 8, 2007
- Tatsuya Ohori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical vapor deposition apparatus and chemical vapor deposition m...
- Publication number 20030015137
- Publication date Jan 23, 2003
- Japan Pionics Co., Ltd.
- Shiro Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical vapor deposition apparatus and chemical vapor deposition m...
- Publication number 20020160112
- Publication date Oct 31, 2002
- Japan Pionics Co., Ltd.
- Shiro Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical vapor deposition apparatus and chemical vapor deposition m...
- Publication number 20020042191
- Publication date Apr 11, 2002
- Japan Pionics Co., Ltd.
- Shiro Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for supplying liquid raw material
- Publication number 20010002573
- Publication date Jun 7, 2001
- Yukichi Takamatsu
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Yoshiyasu Ishihama

Person

Patents Grantslast 30 patents

Vapor phase epitaxy apparatus of group III nitride semiconductor

Chemical vapor deposition apparatus

Chemical vapor deposition apparatus and chemical vapor deposition m...

Chemical vapor deposition apparatus and chemical vapor deposition m...

Method and apparatus for supplying liquid raw material

Apparatus for vaporizing and supplying a material

Process for preparing nitride film

Purified alkoxide and process for purifying crude alkoxide

Patents Applicationslast 30 patents

VAPOR PHASE EPITAXY APPARATUS OF GROUP III NITRIDE SEMICONDUCTOR

VAPOR PHASE EPITAXY APPARATUS OF GROUP III NITRIDE SEMICONDUCTOR

VAPOR PHASE EPITAXY APPARATUS OF GROUP III NITRIDE SEMICONDUCTOR

CHEMICAL VAPOR DEPOSITION APPARATUS

Chemical vapor deposition apparatus

Chemical vapor deposition apparatus and chemical vapor deposition m...

Chemical vapor deposition apparatus and chemical vapor deposition m...

Chemical vapor deposition apparatus and chemical vapor deposition m...

Method and apparatus for supplying liquid raw material