Yoshiyuki Harima

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Zushi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Electric field sensor, surface wave plasma source, and surface wave...
- Patent number 11,244,810
- Issue date Feb 8, 2022
- Tokyo Electron Limited
- Kiyoshi Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer plating apparatus
- Patent number 6,736,945
- Issue date May 18, 2004
- Electroplating Engineers of Japan Limited
- Hirofumi Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid treatment system and liquid treatment method
- Patent number 6,634,370
- Issue date Oct 21, 2003
- Tokyo Electron Limited
- Satoshi Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for carrying-in of cassette for substrates to be processed
- Patent number 5,971,696
- Issue date Oct 26, 1999
- Tokyo Electron Limited
- Tamio Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical heat-treatment apparatus having boat transfer mechanism
- Patent number 5,048,164
- Issue date Sep 17, 1991
- Tokyo Electron Sagami Limited
- Yoshiyuki Harima
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTRIC FIELD SENSOR, SURFACE WAVE PLASMA SOURCE, AND SURFACE WAVE...
- Publication number 20200365371
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Kiyoshi MORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid treatment system and liquid treatment method
- Publication number 20010037764
- Publication date Nov 8, 2001
- Satoshi Nakashima
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Wafer plating apparatus
- Publication number 20010017105
- Publication date Aug 30, 2001
- ELECTROPLATING ENGINEERS OF JAPAN LIMITED
- Hirofumi Ishida
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Wafer plating apparatus
- Publication number 20010017258
- Publication date Aug 30, 2001
- ELECTROPLATING ENGINEERS OF JAPAN LIMITED
- Hirofumi Ishida
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR