Yoshiyuki Harita

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,270,939
- Issue date Aug 7, 2001
- JSR Corporation
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,228,554
- Issue date May 8, 2001
- JSR Corporation
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition utilizing monooxymonocarboxyl...
- Patent number 6,020,104
- Issue date Feb 1, 2000
- JSR Corporation
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition utilizing monooxymonocarboxyl...
- Patent number 5,925,492
- Issue date Jul 20, 1999
- JSR Corporation
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of pattern formation utilizing radiation-sensitive resin com...
- Patent number 5,494,784
- Issue date Feb 27, 1996
- Japan Synthetic Rubber Co., Ltd.
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition containing 1,2 quinonediazide compo...
- Patent number 5,405,720
- Issue date Apr 11, 1995
- Japan Synthetic Rubber Co., Ltd.
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition containing 1,2-quinonediazide compo...
- Patent number 5,238,774
- Issue date Aug 24, 1993
- Japan Synthetic Rubber Co., Ltd.
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
1,2-quinonediazide containing radiation-sensitive resin composition...
- Patent number 5,215,857
- Issue date Jun 1, 1993
- Japan Synthetic Rubber Co., Ltd.
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type radiation-sensitive resin composition
- Patent number 5,087,548
- Issue date Feb 11, 1992
- Japan Synthetic Rubber Co., Inc.
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition with admixtures of O-quinone...
- Patent number 4,963,463
- Issue date Oct 16, 1990
- Japan Synthetic Rubber Co., Ltd.
- Mitsunobu Koshiba
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for high temperature reaction process
- Patent number 4,957,588
- Issue date Sep 18, 1990
- Japan Synthetic Rubber Co., Ltd.
- Mitsunobu Koshiba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reactive ion etching apparatus
- Patent number 4,886,565
- Issue date Dec 12, 1989
- Japan Synthetic Rubber Co., Ltd.
- Mitsunobu Koshiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming patterns using ionizing radiation sensitive resist
- Patent number 4,623,609
- Issue date Nov 18, 1986
- Japan Synthetic Rubber Co., Ltd.
- Yoshiyuki Harita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive type photosensitive resin composition with at least two o-...
- Patent number 4,499,171
- Issue date Feb 12, 1985
- Japan Synthetic Rubber Co., Ltd.
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 4,407,927
- Issue date Oct 4, 1983
- Japan Synthetic Rubber Co., Ltd.
- Yoichi Kamoshida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive type photosensitive resin composition
- Patent number 4,384,037
- Issue date May 17, 1983
- Japan Synthetic Rubber Co., Ltd.
- Yoshihiro Hosaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition
- Patent number 4,349,619
- Issue date Sep 14, 1982
- Japan Synthetic Rubber Co., Ltd.
- Yoichi Kamoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laminate of monolayer film of cyclized butadiene polymer and other...
- Patent number 4,330,612
- Issue date May 18, 1982
- Japan Synthetic Rubber Co., Ltd.
- Mituru Tashiro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition containing modified cyclized diene polymers
- Patent number 4,294,908
- Issue date Oct 13, 1981
- Japan Synthetic Rubber Co., Ltd.
- Yoshiyuki Harita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compositions and printing plates containing same
- Patent number 4,275,142
- Issue date Jun 23, 1981
- Japan Synthetic Rubber Co., Ltd.
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stripping liquor composition for removing photoresists comprising h...
- Patent number 4,169,068
- Issue date Sep 25, 1979
- Japan Synthetic Rubber Company Limited
- Yoshiyuki Harita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photosensitive cross-linkable azide containing polymeric composition
- Patent number 4,106,943
- Issue date Aug 15, 1978
- Japan Synthetic Rubber Co., Ltd.
- Hiroharu Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yoshiyuki Harita

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Radiation-sensitive resin composition utilizing monooxymonocarboxyl...

Radiation-sensitive resin composition utilizing monooxymonocarboxyl...

Method of pattern formation utilizing radiation-sensitive resin com...

Radiation-sensitive composition containing 1,2 quinonediazide compo...

Radiation-sensitive composition containing 1,2-quinonediazide compo...

1,2-quinonediazide containing radiation-sensitive resin composition...

Positive type radiation-sensitive resin composition

Radiation-sensitive resin composition with admixtures of O-quinone...

Method for high temperature reaction process

Reactive ion etching apparatus

Process for forming patterns using ionizing radiation sensitive resist

Positive type photosensitive resin composition with at least two o-...

Photoresist composition

Positive type photosensitive resin composition

Photoresist composition

Laminate of monolayer film of cyclized butadiene polymer and other...

Photoresist composition containing modified cyclized diene polymers

Photosensitive compositions and printing plates containing same

Stripping liquor composition for removing photoresists comprising h...

Photosensitive cross-linkable azide containing polymeric composition