Yoshiyuki MATSUMURA

Person

Tsu-shi, Mie-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical-mechanical polishing composition, rinse composition, chemi...
- Patent number 11,384,257
- Issue date Jul 12, 2022
- CMC Materials KK
- Tsuyoshi Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry composition and method for polishing substrate
- Patent number 9,914,853
- Issue date Mar 13, 2018
- Nihon Cabot Microelectronics K.K.
- Tsuyoshi Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry composition and method of substrate polishing
- Patent number 9,528,031
- Issue date Dec 27, 2016
- Cabot Microelectronics Corporation
- Hiroshi Kitamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION AND CHEMICAL-MECHANICAL P...
- Publication number 20240263039
- Publication date Aug 8, 2024
- CMC Materials KK
- Hiroshi KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVELY CHARGED ABRASIVE WITH NEGATIVELY CHARGED IONIC OXIDIZER...
- Publication number 20240150614
- Publication date May 9, 2024
- Entegris, Inc.
- Tsuyoshi MASUDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMI...
- Publication number 20220372329
- Publication date Nov 24, 2022
- CMC Materials KK
- Hiroshi KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON WAFER POLISHING COMPOSITION AND METHOD
- Publication number 20220017781
- Publication date Jan 20, 2022
- CMC Materials, Inc.
- Hiroshi KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMI...
- Publication number 20210284868
- Publication date Sep 16, 2021
- CMC Materials KK
- Tsuyoshi MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRY COMPOSITION AND METHOD FOR POLISHING SUBSTRATE
- Publication number 20170037278
- Publication date Feb 9, 2017
- NIHON CABOT MICROELECTRONICS K.K.
- Tsuyoshi MASUDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY COMPOSITION AND METHOD OF SUBSTRATE POLISHING
- Publication number 20160068713
- Publication date Mar 10, 2016
- NIHON CABOT MICROELECTRONICS K.K.
- Hiroshi KITAMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Yoshiyuki MATSUMURA

Person

Patents Grantslast 30 patents

Chemical-mechanical polishing composition, rinse composition, chemi...

Slurry composition and method for polishing substrate

Slurry composition and method of substrate polishing

Patents Applicationslast 30 patents

CHEMICAL-MECHANICAL POLISHING COMPOSITION AND CHEMICAL-MECHANICAL P...

POSITIVELY CHARGED ABRASIVE WITH NEGATIVELY CHARGED IONIC OXIDIZER...

CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMI...

SILICON WAFER POLISHING COMPOSITION AND METHOD

CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMI...

SLURRY COMPOSITION AND METHOD FOR POLISHING SUBSTRATE

SLURRY COMPOSITION AND METHOD OF SUBSTRATE POLISHING