Yoshiyuki Nozawa

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma etching method
- Patent number 8,628,676
- Issue date Jan 14, 2014
- SPP Technologies Co., Ltd.
- Naoya Ikemoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, apparatus and program for manufacturing silicon structure
- Patent number 8,546,265
- Issue date Oct 1, 2013
- SPP Technologies Co., Ltd.
- Yoshiyuki Nozawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Plasma etching method capable of detecting end point and plasma etc...
- Patent number 8,518,283
- Issue date Aug 27, 2013
- SPP Technologies Co., Ltd.
- Takashi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching of a silicon substrate and etching apparatus
- Patent number 7,220,678
- Issue date May 22, 2007
- Sumitomo Precision Products Co., Ltd.
- Yoshiyuki Nozawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Etching Method
- Publication number 20130034961
- Publication date Feb 7, 2013
- SPP TECHNOLOGIES CO., LTD.
- Naoya Ikemoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching Apparatus
- Publication number 20120006490
- Publication date Jan 12, 2012
- SUMITOMO PRECISION PRODUCTS CO., LTD.
- Takashi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, APPARATUS AND PROGRAM FOR MANUFACTURING SILICON STRUCTURE
- Publication number 20110097903
- Publication date Apr 28, 2011
- Sumitomo Precision Products Co., Ltd.
- Yoshiyuki Nozawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PLASMA ETCHING METHOD CAPABLE OF DETECTING END POINT AND PLASMA ETC...
- Publication number 20090277872
- Publication date Nov 12, 2009
- Sumitomo Precision Products Co., Ltd.
- Takashi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Substrate Etching Method
- Publication number 20070212888
- Publication date Sep 13, 2007
- Sumitomo Precision Products Co., Ltd.
- Kazuo Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for etching of a silicon substrate and etching apparatus
- Publication number 20050130436
- Publication date Jun 16, 2005
- Sumitomo Precision Products Co., Ltd.
- Yoshiyuki Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon substrate etching method and etching apparatus
- Publication number 20040180544
- Publication date Sep 16, 2004
- Sumitomo Precision Products Co., Ltd.
- Kazuo Kasai
- H01 - BASIC ELECTRIC ELEMENTS

Yoshiyuki Nozawa

Person

Patents Grantslast 30 patents

Plasma etching method

Method, apparatus and program for manufacturing silicon structure

Plasma etching method capable of detecting end point and plasma etc...

Method for etching of a silicon substrate and etching apparatus

Patents Applicationslast 30 patents

Plasma Etching Method

Plasma Etching Apparatus

METHOD, APPARATUS AND PROGRAM FOR MANUFACTURING SILICON STRUCTURE

PLASMA ETCHING METHOD CAPABLE OF DETECTING END POINT AND PLASMA ETC...

Silicon Substrate Etching Method

Method for etching of a silicon substrate and etching apparatus

Silicon substrate etching method and etching apparatus