Yoshiyuki Utsumi

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Monomer having N-acyl carbamoyl group and lactone skeleton, and pol...
- Patent number 9,862,695
- Issue date Jan 9, 2018
- Daicel Corporation
- Hiroshi Koyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,778,567
- Issue date Oct 3, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing structure containing phase-separated structure...
- Patent number 9,644,110
- Issue date May 9, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,618,842
- Issue date Apr 11, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,606,433
- Issue date Mar 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoat agent and method of producing structure containing phase-...
- Patent number 9,567,477
- Issue date Feb 14, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative resist composition, method of forming resist pattern and c...
- Patent number 9,499,646
- Issue date Nov 22, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing polymeric compound, resist composition and meth...
- Patent number 9,469,712
- Issue date Oct 18, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 9,442,371
- Issue date Sep 13, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Polymerization method of high-molecular weight compound, resist com...
- Patent number 9,383,642
- Issue date Jul 5, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist composition, method of forming resist pattern, and...
- Patent number 9,366,960
- Issue date Jun 14, 2016
- TOKYO OHA KOGYO CO., LTD.
- Naoki Yamashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, acid generator, polymeric compound and method o...
- Patent number 9,354,515
- Issue date May 31, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, compound, polymeric compound and method of form...
- Patent number 9,244,347
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 9,206,307
- Issue date Dec 8, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,188,863
- Issue date Nov 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing structure containing phase-separation structure...
- Patent number 9,188,869
- Issue date Nov 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method for forming resist pattern, and compound
- Patent number 9,164,379
- Issue date Oct 20, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,164,380
- Issue date Oct 20, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 9,133,102
- Issue date Sep 15, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 9,122,157
- Issue date Sep 1, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, radical polymerization initiator, method for producing co...
- Patent number 9,097,971
- Issue date Aug 4, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resist composition and method of forming resist pattern
- Patent number 9,097,969
- Issue date Aug 4, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-type photoresist composition, photoresist laminate, method...
- Patent number 9,091,916
- Issue date Jul 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,091,915
- Issue date Jul 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of producing ammonium salt compound, method of producing com...
- Patent number 9,075,304
- Issue date Jul 7, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern and compound
- Patent number 9,063,416
- Issue date Jun 23, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt and photo-acid generator
- Patent number 9,045,398
- Issue date Jun 2, 2015
- San-Apro Limited
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,040,220
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,034,556
- Issue date May 19, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,023,581
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND C...
- Publication number 20160259244
- Publication date Sep 8, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki YAMASHITA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POL...
- Publication number 20160060374
- Publication date Mar 3, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroshi KOYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE...
- Publication number 20150291832
- Publication date Oct 15, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20150205207
- Publication date Jul 23, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20150192851
- Publication date Jul 9, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20150140497
- Publication date May 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20150111155
- Publication date Apr 23, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20150034593
- Publication date Feb 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RESIST COMPOSITION, ACID GENERATOR, POLYMERIC COMPOUND AND METHOD O...
- Publication number 20150037734
- Publication date Feb 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATION STRUCTURE...
- Publication number 20150034595
- Publication date Feb 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERCOAT AGENT AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-...
- Publication number 20150030773
- Publication date Jan 29, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SULFONIUM SALT AND PHOTO-ACID GENERATOR
- Publication number 20140357896
- Publication date Dec 4, 2014
- SAN-APRO LTD.
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...
- Publication number 20140356787
- Publication date Dec 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METH...
- Publication number 20140272727
- Publication date Sep 18, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20140255853
- Publication date Sep 11, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20140221673
- Publication date Aug 7, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND HIGH-MOL...
- Publication number 20140186769
- Publication date Jul 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takaaki Kaiho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20140147787
- Publication date May 29, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMERIZATION METHOD OF HIGH-MOLECULAR WEIGHT COMPOUND, RESIST COM...
- Publication number 20140147792
- Publication date May 29, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20140147788
- Publication date May 29, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING CO...
- Publication number 20140141373
- Publication date May 22, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20140120472
- Publication date May 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF PRODUCING AMMONIUM SALT COMPOUND, METHOD OF PRODUCING COM...
- Publication number 20140017617
- Publication date Jan 16, 2014
- Masatoshi Arai
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130344435
- Publication date Dec 26, 2013
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130337382
- Publication date Dec 19, 2013
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20130316285
- Publication date Nov 28, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20130309614
- Publication date Nov 21, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND
- Publication number 20130302736
- Publication date Nov 14, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METH...
- Publication number 20130260319
- Publication date Oct 3, 2013
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20130260314
- Publication date Oct 3, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yoshiyuki Utsumi

Person

Patents Grantslast 30 patents

Monomer having N-acyl carbamoyl group and lactone skeleton, and pol...

Resist composition, method of forming resist pattern, polymeric com...

Method of producing structure containing phase-separated structure...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Undercoat agent and method of producing structure containing phase-...

Negative resist composition, method of forming resist pattern and c...

Method of producing polymeric compound, resist composition and meth...

Method of producing structure containing phase-separated structure,...

Polymerization method of high-molecular weight compound, resist com...

Negative resist composition, method of forming resist pattern, and...

Resist composition, acid generator, polymeric compound and method o...

Resist composition, compound, polymeric compound and method of form...

Method of producing structure containing phase-separated structure,...

Resist composition and method of forming resist pattern

Method of producing structure containing phase-separation structure...

Resist composition, method for forming resist pattern, and compound

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern and polymeric...

Resist composition and method for forming resist pattern

Compound, radical polymerization initiator, method for producing co...

Compound, resist composition and method of forming resist pattern

Positive-type photoresist composition, photoresist laminate, method...

Resist composition, method of forming resist pattern, polymeric com...

Method of producing ammonium salt compound, method of producing com...

Resist composition, method of forming resist pattern and compound

Sulfonium salt and photo-acid generator

Compound and method of producing the same, acid generator, resist c...

Compound and method of producing the same, acid generator, resist c...

Resist composition, method of forming resist pattern, polymeric com...

Patents Applicationslast 30 patents

NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND C...

MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POL...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

RESIST COMPOSITION, ACID GENERATOR, POLYMERIC COMPOUND AND METHOD O...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATION STRUCTURE...

UNDERCOAT AGENT AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-...

SULFONIUM SALT AND PHOTO-ACID GENERATOR

RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...

METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METH...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND HIGH-MOL...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

POLYMERIZATION METHOD OF HIGH-MOLECULAR WEIGHT COMPOUND, RESIST COM...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING CO...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

METHOD OF PRODUCING AMMONIUM SALT COMPOUND, METHOD OF PRODUCING COM...

RESIST COMPPOSITION AND METHOD OF FORMING RESIST PATTERN

COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND

METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METH...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...