Yosuke KOJIMA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask blank, photomask, and photomask manufacturing method
- Patent number 11,187,974
- Issue date Nov 30, 2021
- Toppan Printing Co., Ltd.
- Yoshifumi Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for manufacturing photomask
- Patent number 9,091,931
- Issue date Jul 28, 2015
- Toppan Printing Co., Ltd.
- Yosuke Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus, a method and a program thereof
- Patent number 8,913,079
- Issue date Dec 16, 2014
- NEC Corporation
- Yosuke Kojima
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Light pattern exposure method, photomask, and photomask blank
- Patent number 8,753,787
- Issue date Jun 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light pattern exposure method, halftone phase shift mask, and halft...
- Patent number 8,753,786
- Issue date Jun 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and making method, photomask, light pattern exposur...
- Patent number 8,475,978
- Issue date Jul 2, 2013
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and photomask
- Patent number 8,012,654
- Issue date Sep 6, 2011
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank and photomask
- Patent number 8,003,284
- Issue date Aug 23, 2011
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank and photomask making method
- Patent number 7,989,124
- Issue date Aug 2, 2011
- Toppan Printing Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank and photomask making method
- Patent number 7,767,367
- Issue date Aug 3, 2010
- Toppan Printing Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank and photomask
- Patent number 7,767,366
- Issue date Aug 3, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Phase-shift mask, manufacturing method thereof and manufacturing me...
- Patent number 7,754,397
- Issue date Jul 13, 2010
- Toppan Printing Co., Ltd.
- Toshio Konishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Levenson type phase shift mask and manufacturing method thereof
- Patent number 7,632,613
- Issue date Dec 15, 2009
- Toppan Printing Co., Ltd.
- Yosuke Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTUR...
- Publication number 20240302732
- Publication date Sep 12, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Kyoko KUROKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING...
- Publication number 20240152045
- Publication date May 9, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Kazuaki MATSUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTUR...
- Publication number 20230333461
- Publication date Oct 19, 2023
- TOPPAN PHOTOMASK CO., LTD.
- Kyoko KUROKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...
- Publication number 20230070724
- Publication date Mar 9, 2023
- TOPPAN PHOTOMASK CO., LTD.
- Kazuaki MATSUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, AND N...
- Publication number 20210295964
- Publication date Sep 23, 2021
- NEC Corporation
- Yosuke KOJIMA
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND PHOTOMASK MANUFACTURING METHOD
- Publication number 20200012185
- Publication date Jan 9, 2020
- Toppan Printing Co., Ltd.
- Yoshifumi SAKAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT PATTERN EXPOSURE METHOD, HALFTONE PHASE SHIFT MASK, AND HALFT...
- Publication number 20130130159
- Publication date May 23, 2013
- Toppan Printing Co., Ltd.
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT PATTERN EXPOSURE METHOD, PHOTOMASK, AND PHOTOMASK BLANK
- Publication number 20130130160
- Publication date May 23, 2013
- Toppan Printing Co., Ltd.
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK
- Publication number 20120251930
- Publication date Oct 4, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yosuke Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS, A METHOD AND A PROGRAM THEREOF
- Publication number 20120212514
- Publication date Aug 23, 2012
- NEC Corporation
- Yosuke KOJIMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK BLANK AND MAKING METHOD, PHOTOMASK, LIGHT PATTERN EXPOSUR...
- Publication number 20120064438
- Publication date Mar 15, 2012
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK MAKING METHOD
- Publication number 20100261099
- Publication date Oct 14, 2010
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK
- Publication number 20100261100
- Publication date Oct 14, 2010
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK
- Publication number 20100261101
- Publication date Oct 14, 2010
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shift mask, manufacturing method thereof and manufacturing me...
- Publication number 20070269726
- Publication date Nov 22, 2007
- Toppan Printing Co., Ltd.
- Toshio Konishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank and photomask
- Publication number 20070212618
- Publication date Sep 13, 2007
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank and photomask making method
- Publication number 20070212619
- Publication date Sep 13, 2007
- Shin-Etsu Chemical Co., Ltd.
- Hiroki YOSHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Levenson type phase shift mask and manufacturing method thereof
- Publication number 20070037072
- Publication date Feb 15, 2007
- Toppan Printing Co., Ltd.
- Yosuke Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yosuke KOJIMA

Person

Patents Grantslast 30 patents

Photomask blank, photomask, and photomask manufacturing method

Photomask blank and method for manufacturing photomask

Apparatus, a method and a program thereof

Light pattern exposure method, photomask, and photomask blank

Light pattern exposure method, halftone phase shift mask, and halft...

Photomask blank and making method, photomask, light pattern exposur...

Photomask blank and photomask

Photomask blank and photomask

Photomask blank and photomask making method

Photomask blank and photomask making method

Photomask blank and photomask

Phase-shift mask, manufacturing method thereof and manufacturing me...

Levenson type phase shift mask and manufacturing method thereof

Patents Applicationslast 30 patents

PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTUR...

PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING...

PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTUR...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...

INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, AND N...

PHOTOMASK BLANK, PHOTOMASK, AND PHOTOMASK MANUFACTURING METHOD

LIGHT PATTERN EXPOSURE METHOD, HALFTONE PHASE SHIFT MASK, AND HALFT...

LIGHT PATTERN EXPOSURE METHOD, PHOTOMASK, AND PHOTOMASK BLANK

PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK

APPARATUS, A METHOD AND A PROGRAM THEREOF

PHOTOMASK BLANK AND MAKING METHOD, PHOTOMASK, LIGHT PATTERN EXPOSUR...

PHOTOMASK BLANK AND PHOTOMASK MAKING METHOD

PHOTOMASK BLANK AND PHOTOMASK

PHOTOMASK BLANK AND PHOTOMASK

Phase-shift mask, manufacturing method thereof and manufacturing me...

Photomask blank and photomask

Photomask blank and photomask making method

Levenson type phase shift mask and manufacturing method thereof