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Yosuke SUZUKI
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Kawasaki-shi, JP
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Patents Grants
last 30 patents
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Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,934,099
Issue date
Mar 19, 2024
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,835,857
Issue date
Dec 5, 2023
Tokyo Ohka Kogyo Co., Ltd.
Yuta Iwasawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,822,240
Issue date
Nov 21, 2023
Tokyo Ohka Kogyo Co., Ltd.
Yasuhiro Yoshii
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220121116
Publication date
Apr 21, 2022
Tokyo Ohka Kogyo Co., Ltd.
Koshi ONISHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220121118
Publication date
Apr 21, 2022
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210405527
Publication date
Dec 30, 2021
Tokyo Ohka Kogyo Co., Ltd.
Yuta IWASAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210405531
Publication date
Dec 30, 2021
Tokyo Ohka Kogyo Co., Ltd.
Yoichi HORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Publication number
20210397086
Publication date
Dec 23, 2021
Tokyo Ohka Kogyo Co., Ltd.
Tsuyoshi NAKAMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210200086
Publication date
Jul 1, 2021
Tokyo Ohka Kogyo Co., Ltd.
Mari MURATA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210200087
Publication date
Jul 1, 2021
Tokyo Ohka Kogyo Co., Ltd.
Yoichi HORI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210191262
Publication date
Jun 24, 2021
Tokyo Ohka Kogyo Co., Ltd.
Yasuhiro YOSHII
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210165324
Publication date
Jun 3, 2021
Tokyo Ohka Kogyo Co., Ltd.
Yosuke SUZUKI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...