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Yosuke Takei
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Shimane, JP
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Patents Grants
last 30 patents
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Patent Grant
Method of forming leveraged poromeric polishing pad
Patent number
11,667,061
Issue date
Jun 6, 2023
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Wei-Wen Tsai
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information
Patent Grant
Thermoplastic poromeric polishing pad
Patent number
10,106,662
Issue date
Oct 23, 2018
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Shuiyuan Luo
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
OFFSET PORE POROMERIC POLISHING PAD
Publication number
20210323116
Publication date
Oct 21, 2021
Rohm and Haas Electronic Materials CMP Holdings, INC.
Wei-Wen TSAI
B24 - GRINDING POLISHING
Information
Patent Application
LEVERAGED POROMERIC POLISHING PAD
Publication number
20210323115
Publication date
Oct 21, 2021
Rohm and Haas Electronic Materials CMP Holdings, INC.
Wei-Wen TSAI
B24 - GRINDING POLISHING
Information
Patent Application
METHOD OF FORMING LEVERAGED POROMERIC POLISHING PAD
Publication number
20210323202
Publication date
Oct 21, 2021
Rohm and Haas Electronic Materials CMP Holdings, INC.
Wei-Wen TSAI
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information
Patent Application
THERMOPLASTIC POROMERIC POLISHING PAD
Publication number
20180037706
Publication date
Feb 8, 2018
Rohm and Haas Electronic Materials CMP Holdings, INC.
Shuiyuan Luo
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...