Yosuke TANIMOTO

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Adhesion removal method and film-forming method
- Patent number 12,116,675
- Issue date Oct 15, 2024
- Resonac Corporation
- Yosuke Tanimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing passivation film
- Patent number 12,074,038
- Issue date Aug 27, 2024
- Resonac Corporation
- Yosuke Tanimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrogen sulfide mixture, method for producing same, and filling co...
- Patent number 11,312,625
- Issue date Apr 26, 2022
- Showa Denko K.K.
- Yosuke Tanimoto
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Etching method and semiconductor manufacturing method
- Patent number 11,114,305
- Issue date Sep 7, 2021
- Showa Denko K.K.
- Yosuke Tanimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning SiC monocrystal growth furnace
- Patent number 11,028,474
- Issue date Jun 8, 2021
- Showa Denko K.K.
- Yosuke Tanimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing hydrogen chloride
- Patent number 10,611,636
- Issue date Apr 7, 2020
- Showa Denko K.K.
- Yosuke Tanimoto
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING (E)-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE
- Publication number 20250002432
- Publication date Jan 2, 2025
- Resonac Corporation
- Kazuaki OHTSUKI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ETCHING GAS AND ETCHING METHOD
- Publication number 20240153778
- Publication date May 9, 2024
- Resonac Corporation
- Jumpei IWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20230395389
- Publication date Dec 7, 2023
- Resonac Corporation
- Jumpei IWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SULFUR DIOXIDE MIXTURE, AND METHOD OF PRODUCING THE SAME, AND FILLI...
- Publication number 20220250908
- Publication date Aug 11, 2022
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
METHOD OF MANUFACTURING PASSIVATION FILM
- Publication number 20220246447
- Publication date Aug 4, 2022
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REMOVING ADHERING MATERIAL AND FILM FORMING METHOD
- Publication number 20220220612
- Publication date Jul 14, 2022
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADHERED SUBSTANCE REMOVING METHOD AND FILM-FORMING METHOD
- Publication number 20220157599
- Publication date May 19, 2022
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADHESION REMOVAL METHOD AND FILM-FORMING METHOD
- Publication number 20220064788
- Publication date Mar 3, 2022
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADHESION REMOVAL METHOD AND FILM-FORMING METHOD
- Publication number 20220064777
- Publication date Mar 3, 2022
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADHESION REMOVAL METHOD AND FILM-FORMING METHOD
- Publication number 20220059327
- Publication date Feb 24, 2022
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND SEMICONDUCTOR MANUFACTURING METHOD
- Publication number 20210217627
- Publication date Jul 15, 2021
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN CHLORIDE MIXTURE, METHOD FOR PRODUCING THE SAME, AND FILLI...
- Publication number 20200354217
- Publication date Nov 12, 2020
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- C01 - INORGANIC CHEMISTRY
Information Patent Application
HYDROGEN SULFIDE MIXTURE, METHOD FOR PRODUCING SAME, AND FILLING CO...
- Publication number 20190185323
- Publication date Jun 20, 2019
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHOD FOR CLEANING SiC MONOCRYSTAL GROWTH FURNACE
- Publication number 20190003046
- Publication date Jan 3, 2019
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR PRODUCING HYDROGEN CHLORIDE
- Publication number 20180354789
- Publication date Dec 13, 2018
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- C01 - INORGANIC CHEMISTRY
Information Patent Application
HYDROGEN CHLORIDE MIXTURE, METHOD FOR PRODUCING THE SAME, AND FILLI...
- Publication number 20180354790
- Publication date Dec 13, 2018
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING HYDROGEN CHLORIDE
- Publication number 20180208465
- Publication date Jul 26, 2018
- SHOWA DENKO K.K.
- Yosuke TANIMOTO
- C01 - INORGANIC CHEMISTRY

Yosuke TANIMOTO

Person

Patents Grantslast 30 patents

Adhesion removal method and film-forming method

Method of manufacturing passivation film

Hydrogen sulfide mixture, method for producing same, and filling co...

Etching method and semiconductor manufacturing method

Method for cleaning SiC monocrystal growth furnace

Method for producing hydrogen chloride

Patents Applicationslast 30 patents

METHOD FOR PRODUCING (E)-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE

ETCHING GAS AND ETCHING METHOD

ETCHING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

SULFUR DIOXIDE MIXTURE, AND METHOD OF PRODUCING THE SAME, AND FILLI...

METHOD OF MANUFACTURING PASSIVATION FILM

METHOD FOR REMOVING ADHERING MATERIAL AND FILM FORMING METHOD

ADHERED SUBSTANCE REMOVING METHOD AND FILM-FORMING METHOD

ADHESION REMOVAL METHOD AND FILM-FORMING METHOD

ADHESION REMOVAL METHOD AND FILM-FORMING METHOD

ADHESION REMOVAL METHOD AND FILM-FORMING METHOD

ETCHING METHOD AND SEMICONDUCTOR MANUFACTURING METHOD

HYDROGEN CHLORIDE MIXTURE, METHOD FOR PRODUCING THE SAME, AND FILLI...

HYDROGEN SULFIDE MIXTURE, METHOD FOR PRODUCING SAME, AND FILLING CO...

METHOD FOR CLEANING SiC MONOCRYSTAL GROWTH FURNACE

METHOD FOR PRODUCING HYDROGEN CHLORIDE

HYDROGEN CHLORIDE MIXTURE, METHOD FOR PRODUCING THE SAME, AND FILLI...

METHOD FOR PRODUCING HYDROGEN CHLORIDE