Youichi Ohsawa

Person

Joetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sulfonium salt-containing polymer, resist composition, patterning p...
- Patent number 9,233,919
- Issue date Jan 12, 2016
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, chemically amplified resist composition, and patterning pr...
- Patent number 8,900,793
- Issue date Dec 2, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified negative resist composition and patterning pro...
- Patent number 8,859,181
- Issue date Oct 14, 2014
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Patterning process and resist composition
- Patent number 8,822,136
- Issue date Sep 2, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition for ArF immersion...
- Patent number 8,815,492
- Issue date Aug 26, 2014
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,795,942
- Issue date Aug 5, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt-containing polymer, resist composition, patterning p...
- Patent number 8,785,105
- Issue date Jul 22, 2014
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process and resist composition
- Patent number 8,741,546
- Issue date Jun 3, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process and resist composition
- Patent number 8,741,554
- Issue date Jun 3, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,703,384
- Issue date Apr 22, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, polymer, method for producing the polymer, resist c...
- Patent number 8,691,490
- Issue date Apr 8, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of pho...
- Patent number 8,686,166
- Issue date Apr 1, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, chemically amplified positive resist composition and patte...
- Patent number 8,632,939
- Issue date Jan 21, 2014
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist composition and patterning process
- Patent number 8,628,908
- Issue date Jan 14, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator, resist composition, and patterning process
- Patent number 8,609,889
- Issue date Dec 17, 2013
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt, resist composition, and patterning process
- Patent number 8,597,869
- Issue date Dec 3, 2013
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt, resist composition, and patterning process
- Patent number 8,535,869
- Issue date Sep 17, 2013
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process and resist composition
- Patent number 8,507,175
- Issue date Aug 13, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process and resist composition
- Patent number 8,426,115
- Issue date Apr 23, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, acid generator, resist composition, photomask blank...
- Patent number 8,394,570
- Issue date Mar 12, 2013
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive photoresist composition and pattern f...
- Patent number 8,361,693
- Issue date Jan 29, 2013
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist lower-layer composition containing thermal acid generator, r...
- Patent number 8,349,533
- Issue date Jan 8, 2013
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist undercoat-forming material and patterning process
- Patent number 8,338,078
- Issue date Dec 25, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Sulfonate and its derivative, photosensitive acid generator, and re...
- Patent number 8,283,104
- Issue date Oct 9, 2012
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically-amplified positive resist composition and patterning pro...
- Patent number 8,202,677
- Issue date Jun 19, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonium salt, resist composition, and patterning process
- Patent number 8,173,354
- Issue date May 8, 2012
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generator, resist composition, and patterning process
- Patent number 8,114,571
- Issue date Feb 14, 2012
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generator, resist composition, and patterning process
- Patent number 8,114,570
- Issue date Feb 14, 2012
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymerizable anion-containing sulfonium salt and polymer, resist c...
- Patent number 8,105,748
- Issue date Jan 31, 2012
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,062,828
- Issue date Nov 22, 2011
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...
- Publication number 20140296561
- Publication date Oct 2, 2014
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20130209936
- Publication date Aug 15, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20130108960
- Publication date May 2, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...
- Publication number 20130108964
- Publication date May 2, 2013
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...
- Publication number 20130034813
- Publication date Feb 7, 2013
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREPARATION OF 2,2-BIS (FLUOROALKYL) OXIRANE AND PREPARATION OF PHO...
- Publication number 20130005997
- Publication date Jan 3, 2013
- Masayoshi SAGEHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20120308932
- Publication date Dec 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi SAGEHASHI
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120288796
- Publication date Nov 15, 2012
- Kazuhiro KATAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120225386
- Publication date Sep 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME
- Publication number 20120214100
- Publication date Aug 23, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120135350
- Publication date May 31, 2012
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20120135357
- Publication date May 31, 2012
- Tomohiro KOBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...
- Publication number 20120129103
- Publication date May 24, 2012
- Youichi Ohsawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20120100486
- Publication date Apr 26, 2012
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20120045724
- Publication date Feb 23, 2012
- Youichi OHSAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20110212390
- Publication date Sep 1, 2011
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTE...
- Publication number 20110212391
- Publication date Sep 1, 2011
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RE...
- Publication number 20110189607
- Publication date Aug 4, 2011
- Shin-Etsu Chemical Co., Ltd.
- Masaki OHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST...
- Publication number 20110160481
- Publication date Jun 30, 2011
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20110091812
- Publication date Apr 21, 2011
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20110033803
- Publication date Feb 10, 2011
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20110008735
- Publication date Jan 13, 2011
- Youichi OHSAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20110003247
- Publication date Jan 6, 2011
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN F...
- Publication number 20100316955
- Publication date Dec 16, 2010
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20100304297
- Publication date Dec 2, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR,...
- Publication number 20100209827
- Publication date Aug 19, 2010
- Shin-Etsu Chemical Co., Ltd.
- Masaki OHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK...
- Publication number 20100143830
- Publication date Jun 10, 2010
- Masaki OHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resist lower-layer composition containing thermal acid generator, r...
- Publication number 20100119970
- Publication date May 13, 2010
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS
- Publication number 20100104977
- Publication date Apr 29, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST C...
- Publication number 20100099042
- Publication date Apr 22, 2010
- Masaki OHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Youichi Ohsawa

Person

Patents Grantslast 30 patents

Sulfonium salt-containing polymer, resist composition, patterning p...

Polymer, chemically amplified resist composition, and patterning pr...

Chemically amplified negative resist composition and patterning pro...

Patterning process and resist composition

Chemically amplified positive resist composition for ArF immersion...

Positive resist composition and patterning process

Sulfonium salt-containing polymer, resist composition, patterning p...

Patterning process and resist composition

Patterning process and resist composition

Positive resist composition and patterning process

Sulfonium salt, polymer, method for producing the polymer, resist c...

Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of pho...

Polymer, chemically amplified positive resist composition and patte...

Chemically amplified resist composition and patterning process

Photoacid generator, resist composition, and patterning process

Sulfonium salt, resist composition, and patterning process

Sulfonium salt, resist composition, and patterning process

Patterning process and resist composition

Patterning process and resist composition

Sulfonium salt, acid generator, resist composition, photomask blank...

Chemically amplified positive photoresist composition and pattern f...

Resist lower-layer composition containing thermal acid generator, r...

Photoresist undercoat-forming material and patterning process

Sulfonate and its derivative, photosensitive acid generator, and re...

Chemically-amplified positive resist composition and patterning pro...

Sulfonium salt, resist composition, and patterning process

Photoacid generator, resist composition, and patterning process

Photoacid generator, resist composition, and patterning process

Polymerizable anion-containing sulfonium salt and polymer, resist c...

Positive resist composition and patterning process

Patents Applicationslast 30 patents

SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...

PATTERNING PROCESS AND RESIST COMPOSITION

PATTERNING PROCESS AND RESIST COMPOSITION

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...

PREPARATION OF 2,2-BIS (FLUOROALKYL) OXIRANE AND PREPARATION OF PHO...

POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PR...

RESIST COMPOSITION AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS

SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...

SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS

SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTE...

NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RE...

NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST...

PATTERNING PROCESS AND RESIST COMPOSITION

PATTERNING PROCESS AND RESIST COMPOSITION

SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS

PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN F...

PATTERNING PROCESS AND RESIST COMPOSITION

NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR,...

SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK...

Resist lower-layer composition containing thermal acid generator, r...

PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS

POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST C...