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Patents Grantslast 30 patents

Information Patent Grant
CMP abrasive, method for polishing substrate and method for manufac...
- Patent number 8,002,860
- Issue date Aug 23, 2011
- Hitachi Chemical Co., Ltd.
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive compound for CMP, method for polishing substrate and metho...
- Patent number 7,410,409
- Issue date Aug 12, 2008
- Hitachi Chemical Co., Ltd.
- Naoyuki Koyama
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CMP ABRASIVE, METHOD FOR POLISHING SUBSTRATE AND METHOD FOR MANUFAC...
- Publication number 20090253355
- Publication date Oct 8, 2009
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP abrasive, method for polishing substrate and method for manufac...
- Publication number 20070169421
- Publication date Jul 26, 2007
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...