Youn Gi Hong

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
RF power compensation to reduce deposition or etch rate changes in...
- Patent number 12,057,295
- Issue date Aug 6, 2024
- Lam Research Corporation
- Wei Yi Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Back side deposition apparatus and applications
- Patent number 9,881,788
- Issue date Jan 30, 2018
- Lam Research Corporation
- Yunsang Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Line width roughness improvement with noble gas plasma
- Patent number 9,466,502
- Issue date Oct 11, 2016
- Lam Research Corporation
- Shih-Yuan Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line width roughness improvement with noble gas plasma
- Patent number 9,263,284
- Issue date Feb 16, 2016
- Lam Research Corporation
- Shih-Yuan Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line width roughness improvement with noble gas plasma
- Patent number 8,753,804
- Issue date Jun 17, 2014
- Lam Research Corporation
- Shih-Yuan Cheng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN...
- Publication number 20240363311
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Weiyi LUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN...
- Publication number 20210313152
- Publication date Oct 7, 2021
- LAM RESEARCH CORPORATION
- Wei Yi LUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL DOPING USING DOPANT GAS ON HYDROGEN PLASMA TREATED SURFACE
- Publication number 20170170018
- Publication date Jun 15, 2017
- LAM RESEARCH CORPORATION
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE WIDTH ROUGHNESS IMPROVEMENT WITH NOBLE GAS PLASMA
- Publication number 20160155643
- Publication date Jun 2, 2016
- LAM RESEARCH CORPORATION
- Shih-Yuan CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACK SIDE DEPOSITION APPARATUS AND APPLICATIONS
- Publication number 20150340225
- Publication date Nov 26, 2015
- LAM RESEARCH CORPORATION
- Yunsang Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LINE WIDTH ROUGHNESS IMPROVEMENT WITH NOBLE GAS PLASMA
- Publication number 20140248779
- Publication date Sep 4, 2014
- Shih-Yuan CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE WIDTH ROUGHNESS IMPROVEMENT WITH NOBLE GAS PLASMA
- Publication number 20110104616
- Publication date May 5, 2011
- LAM RESEARCH CORPORATION
- Shih-Yuan Cheng
- H01 - BASIC ELECTRIC ELEMENTS

Youn Gi Hong

Person

Patents Grantslast 30 patents

RF power compensation to reduce deposition or etch rate changes in...

Back side deposition apparatus and applications

Line width roughness improvement with noble gas plasma

Line width roughness improvement with noble gas plasma

Line width roughness improvement with noble gas plasma

Patents Applicationslast 30 patents

RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN...

RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN...

CONFORMAL DOPING USING DOPANT GAS ON HYDROGEN PLASMA TREATED SURFACE

LINE WIDTH ROUGHNESS IMPROVEMENT WITH NOBLE GAS PLASMA

BACK SIDE DEPOSITION APPARATUS AND APPLICATIONS

LINE WIDTH ROUGHNESS IMPROVEMENT WITH NOBLE GAS PLASMA

LINE WIDTH ROUGHNESS IMPROVEMENT WITH NOBLE GAS PLASMA