Youn-Kyung Wang

Person

Seongnam-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Siloxane polymer composition
- Patent number 8,450,444
- Issue date May 28, 2013
- Samsung Electronics Co., Ltd.
- Kyoung-Mi Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming fine pattern employing self-aligned double patter...
- Patent number 8,071,484
- Issue date Dec 6, 2011
- Samsung Electronics Co., Ltd.
- Kyoung-Mi Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Siloxane polymer composition, method of forming a pattern using the...
- Patent number 7,776,730
- Issue date Aug 17, 2010
- Samsung Electronics Co., Ltd.
- Kyoung-Mi Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method and apparatus for analyzing a photoresist film
- Patent number 7,629,583
- Issue date Dec 8, 2009
- Samsung Electronics Co., Ltd.
- Young-Hoon Kim
- G01 - MEASURING TESTING
Information Patent Grant
Photoresist composition and method of forming a pattern using the same
- Patent number 7,419,759
- Issue date Sep 2, 2008
- Samsung Electronics Co., Ltd.
- Kyoung-Mi Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition and method of forming a pattern using same
- Patent number 7,282,319
- Issue date Oct 16, 2007
- Samsung Electronics Co., Ltd.
- Kyoung-Mi Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resin, photoresist composition having the photosensi...
- Patent number 7,258,963
- Issue date Aug 21, 2007
- Samsung Electronics Co., Ltd.
- Youn-Kyung Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
SILOXANE POLYMER COMPOSITION
- Publication number 20100305266
- Publication date Dec 2, 2010
- Samsung Electronics Co., Ltd.
- Kyoung-Mi KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Siloxane polymer composition, method of forming a pattern using the...
- Publication number 20090017592
- Publication date Jan 15, 2009
- Kyoung-Mi Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING FINE PATTERN EMPLOYING SELF-ALIGNED DOUBLE PATTER...
- Publication number 20080305636
- Publication date Dec 11, 2008
- Samsung Electronics Co., Ltd.
- Kyoung-Mi KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR ANALYZING A PHOTORESIST FILM
- Publication number 20080117408
- Publication date May 22, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Young-Hoon Kim
- G01 - MEASURING TESTING
Information Patent Application
Photoresist composition and method of forming a pattern using the same
- Publication number 20060166134
- Publication date Jul 27, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Kyoung-Mi Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive resin, photoresist composition having the photosensi...
- Publication number 20060160019
- Publication date Jul 20, 2006
- Youn-Kyung Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition and method of forming a pattern using the same
- Publication number 20050277056
- Publication date Dec 15, 2005
- Kyoung-Mi Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition and method of forming a pattern using same
- Publication number 20050266342
- Publication date Dec 1, 2005
- Kyoung-Mi Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition and method of forming same
- Publication number 20050266343
- Publication date Dec 1, 2005
- Kyoung-Mi Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Youn-Kyung Wang

Person

Patents Grantslast 30 patents

Siloxane polymer composition

Method of forming fine pattern employing self-aligned double patter...

Siloxane polymer composition, method of forming a pattern using the...

Method and apparatus for analyzing a photoresist film

Photoresist composition and method of forming a pattern using the same

Photoresist composition and method of forming a pattern using same

Photosensitive resin, photoresist composition having the photosensi...

Patents Applicationslast 30 patents

SILOXANE POLYMER COMPOSITION

Siloxane polymer composition, method of forming a pattern using the...

METHOD OF FORMING FINE PATTERN EMPLOYING SELF-ALIGNED DOUBLE PATTER...

METHOD AND APPARATUS FOR ANALYZING A PHOTORESIST FILM

Photoresist composition and method of forming a pattern using the same

Photosensitive resin, photoresist composition having the photosensi...

Photoresist composition and method of forming a pattern using the same

Photoresist composition and method of forming a pattern using same

Photoresist composition and method of forming same