Young Jai Lee

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective reflectivity process chamber with customized wavelength r...
- Patent number 9,633,876
- Issue date Apr 25, 2017
- Mattson Technology, Inc.
- Paul J. Timans
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Electrostatic chuck system and process for radially tuning the temp...
- Patent number 8,405,005
- Issue date Mar 26, 2013
- Mattson Technology, Inc.
- Martin L. Zucker
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Selective reflectivity process chamber with customized wavelength r...
- Patent number 7,737,385
- Issue date Jun 15, 2010
- Mattson Technology, Inc.
- Paul J. Timans
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Selective reflectivity process chamber with customized wavelength r...
- Patent number 7,115,837
- Issue date Oct 3, 2006
- Mattson Technology, Inc.
- Paul J. Timans
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Shadow-free shutter arrangement and method
- Patent number 7,045,746
- Issue date May 16, 2006
- Mattson Technology, Inc.
- Daniel J. Devine
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Self aligning electron beam gun having enhanced thermal and mechani...
- Patent number 5,416,381
- Issue date May 16, 1995
- The United States of America as represented by the United States Department o...
- Raymond D. Scarpetti
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Selective Reflectivity Process Chamber with Customized Wavelength R...
- Publication number 20100219174
- Publication date Sep 2, 2010
- Paul J. Timans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK SYSTEM AND PROCESS FOR RADIALLY TUNING THE TEMP...
- Publication number 20100193501
- Publication date Aug 5, 2010
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective reflectivity process chamber with customized wavelength r...
- Publication number 20070131671
- Publication date Jun 14, 2007
- Paul J. Timans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process and system for heating semiconductor substrates in a proces...
- Publication number 20060032848
- Publication date Feb 16, 2006
- Young Jai Lee
- C30 - CRYSTAL GROWTH
Information Patent Application
Wedge-shaped window for providing a pressure differential
- Publication number 20050268567
- Publication date Dec 8, 2005
- Mattson Technology, Inc.
- Daniel J. Devine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shadow-free shutter arrangement and method
- Publication number 20050098553
- Publication date May 12, 2005
- Daniel J. Devine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective reflectivity process chamber with customized wavelength r...
- Publication number 20050023267
- Publication date Feb 3, 2005
- Paul J. Timans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process and system for heating semiconductor substrates in a proces...
- Publication number 20030209326
- Publication date Nov 13, 2003
- Mattson Technology, Inc.
- Young Jai Lee
- C30 - CRYSTAL GROWTH

Young Jai Lee

Person

Patents Grantslast 30 patents

Selective reflectivity process chamber with customized wavelength r...

Electrostatic chuck system and process for radially tuning the temp...

Selective reflectivity process chamber with customized wavelength r...

Selective reflectivity process chamber with customized wavelength r...

Shadow-free shutter arrangement and method

Self aligning electron beam gun having enhanced thermal and mechani...

Patents Applicationslast 30 patents

Selective Reflectivity Process Chamber with Customized Wavelength R...

ELECTROSTATIC CHUCK SYSTEM AND PROCESS FOR RADIALLY TUNING THE TEMP...

Selective reflectivity process chamber with customized wavelength r...

Process and system for heating semiconductor substrates in a proces...

Wedge-shaped window for providing a pressure differential

Shadow-free shutter arrangement and method

Selective reflectivity process chamber with customized wavelength r...

Process and system for heating semiconductor substrates in a proces...