YoungJong Lee

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Fishkill, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming a gate stack containing a gate dielectric layer h...
- Patent number 7,470,591
- Issue date Dec 30, 2008
- Tokyo Electron Limited
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of forming a gate stack containing a gate dielectric layer h...
- Publication number 20070077701
- Publication date Apr 5, 2007
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS