Youping ZHANG

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 12,055,904
- Issue date Aug 6, 2024
- ASML Netherlands B.V.
- Youping Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing devices
- Patent number 12,044,980
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Abraham Slachter
- G05 - CONTROLLING REGULATING
Information Patent Grant
Determining pattern ranking based on measurement feedback from prin...
- Patent number 12,038,694
- Issue date Jul 16, 2024
- ASML Netherlands B.V.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,966,166
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for controlling a manufacturing process and associated appar...
- Patent number 11,947,266
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Nicolaas Petrus Marcus Brantjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining root cause affecting yield in a semiconducto...
- Patent number 11,803,127
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Chenxi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determining pattern ranking based on measurement feedback from prin...
- Patent number 11,635,699
- Issue date Apr 25, 2023
- ASML Netherlands B.V.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining an etch profile of a layer of a wafer for a...
- Patent number 11,568,123
- Issue date Jan 31, 2023
- ASML Netherlands B.V.
- Chi-Hsiang Fan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for illumination adjustment
- Patent number 11,429,029
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a position of a feature
- Patent number 11,392,044
- Issue date Jul 19, 2022
- ASML Netherlands B.V.
- Ralph Timotheus Huijgen
- G01 - MEASURING TESTING
Information Patent Grant
Measuring a process parameter for a manufacturing process involving...
- Patent number 11,320,745
- Issue date May 3, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining stack configuration of substrate
- Patent number 11,281,113
- Issue date Mar 22, 2022
- ASML Netherlands B.V.
- Danying Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology using a plurality of metrology target measurement recipes
- Patent number 11,187,995
- Issue date Nov 30, 2021
- ASML Netherlands B.V.
- Victor Emanuel Calado
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 11,092,900
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,079,684
- Issue date Aug 3, 2021
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and apparatus, substrate, lithographic method and...
- Patent number 10,802,409
- Issue date Oct 13, 2020
- ASML Netherlands B.V.
- Chi-Hsiang Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternative target design for metrology using modulation techniques
- Patent number 10,585,357
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a position of a feature
- Patent number 10,578,980
- Issue date Mar 3, 2020
- ASML Netherlands B.V.
- Ralph Timotheus Huijgen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 10,481,503
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for pattern design with tailored response to wa...
- Patent number 10,423,075
- Issue date Sep 24, 2019
- ASML Netherlands B.V.
- Hanying Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process based metrology target design
- Patent number 10,296,681
- Issue date May 21, 2019
- ASML Netherlands B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measuring a process parameter for a manufacturing process involving...
- Patent number 10,073,357
- Issue date Sep 11, 2018
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Metrology target, method and apparatus, target design method, compu...
- Patent number 10,061,212
- Issue date Aug 28, 2018
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process based metrology target design
- Patent number 10,007,744
- Issue date Jun 26, 2018
- ASML Netherlands B.V.
- Guangqing Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for pattern design with tailored response to wa...
- Patent number 8,918,742
- Issue date Dec 23, 2014
- ASML Netherlands B.V.
- Hanying Feng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for simplifying layout processing
- Patent number 8,782,574
- Issue date Jul 15, 2014
- Youping Zhang
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method of pattern selection for source and mask optimization
- Patent number 8,739,082
- Issue date May 27, 2014
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model-based pattern characterization to generate rules for rule-mod...
- Patent number 8,281,264
- Issue date Oct 2, 2012
- Takumi Technology Corporation
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuit design using modified cells
- Patent number 7,934,184
- Issue date Apr 26, 2011
- Takumi Technology Corporation
- Youping Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Displacing edge segments on a fabrication layout based on proximity...
- Patent number 7,926,004
- Issue date Apr 12, 2011
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ADJUSTING A PATTERNING PROCESS
- Publication number 20230273529
- Publication date Aug 31, 2023
- ASML NETHERLANDS B.V.
- Satej Subhash KHEDEKAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING PATTERN RANKING BASED ON MEASUREMENT FEEDBACK FROM PRIN...
- Publication number 20230236512
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Youping ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING AN ETCH PROFILE OF A LAYER OF A WAFER FOR A...
- Publication number 20230144584
- Publication date May 11, 2023
- ASML NETHERLANDS B.V.
- Chi-Hsiang Fan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING PATTERN RANKING BASED ON MEASUREMENT FEEDBACK FROM PRIN...
- Publication number 20220043356
- Publication date Feb 10, 2022
- ASML NETHERLANDS B.V.
- Youping ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING HOT SPOT RANKING BASED ON WAFER MEASUREMENT
- Publication number 20220035256
- Publication date Feb 3, 2022
- ASML NETHERLANDS B.V.
- Youping ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR GROUPING IMAGE PATTERNS TO DETERMINE WAFER...
- Publication number 20220028052
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Zhiqin LI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...
- Publication number 20220026810
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Nicolaas Petrus Marcus BRANTJES
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20220011728
- Publication date Jan 13, 2022
- ASML NETHERLANDS B.V.
- Youping ZHANG
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD OF MANUFACTURING DEVICES
- Publication number 20210397172
- Publication date Dec 23, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD FOR DETERMINING ROOT CAUSE AFFECTING YIELD IN A SEMICONDUCTO...
- Publication number 20210389677
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Chenxi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID
- Publication number 20210341846
- Publication date Nov 4, 2021
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING STACK CONFIGURATION OF SUBSTRATE
- Publication number 20210247701
- Publication date Aug 12, 2021
- ASMI NETHERLANDS B.V.
- Danying LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY USING A PLURALITY OF METROLOGY TARGET MEASUREMENT RECIPES
- Publication number 20210208512
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Victor Emanuel CALADO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING AN ETCH PROFILE OF A LAYER OF A WAFER FOR A...
- Publication number 20210150116
- Publication date May 20, 2021
- ASML NETHERLANDS B.V.
- Chi-Hsiang Fan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT
- Publication number 20210055663
- Publication date Feb 25, 2021
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measuring a Process Parameter for a Manufacturing Process Involving...
- Publication number 20200401054
- Publication date Dec 24, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING A POSITION OF A FEATURE
- Publication number 20200150547
- Publication date May 14, 2020
- ASML NETHERLANDS B.V.
- Ralph Timotheus HUIJGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Measuring a Parameter of a Lithographic Pr...
- Publication number 20200073254
- Publication date Mar 5, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING A POSITION OF A FEATURE
- Publication number 20190339211
- Publication date Nov 7, 2019
- Ralph Timotheus HUIJGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID
- Publication number 20190235391
- Publication date Aug 1, 2019
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Measuring a Process Parameter for a Manufacturing Process Involving...
- Publication number 20190018326
- Publication date Jan 17, 2019
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALTERNATIVE TARGET DESIGN FOR METROLOGY USING MODULATION TECHNIQUES
- Publication number 20180373168
- Publication date Dec 27, 2018
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLARIZATION TUNING IN SCATTEROMETRY
- Publication number 20180364590
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
PROCESS BASED METROLOGY TARGET DESIGN
- Publication number 20180268093
- Publication date Sep 20, 2018
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC METHOD AND...
- Publication number 20180238737
- Publication date Aug 23, 2018
- ASML NETHERLANDS B.V.
- Chi-Hsiang FAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Target, Method and Apparatus, Target Design Method, Compu...
- Publication number 20170293233
- Publication date Oct 12, 2017
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN PLACEMENT ERROR AWARE OPTIMIZATION
- Publication number 20170082927
- Publication date Mar 23, 2017
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method And Apparatus for Measuring a Parameter of a Lithographic Pr...
- Publication number 20170059999
- Publication date Mar 2, 2017
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
Measuring a Process Parameter for a Manufacturing Process Involving...
- Publication number 20160349627
- Publication date Dec 1, 2016
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
PROCESS BASED METROLOGY TARGET DESIGN
- Publication number 20160140267
- Publication date May 19, 2016
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G06 - COMPUTING CALCULATING COUNTING

Youping ZHANG

Person

Patents Grantslast 30 patents

Method to predict yield of a device manufacturing process

Method of manufacturing devices

Determining pattern ranking based on measurement feedback from prin...

Measurement apparatus and a method for determining a substrate grid

Method for controlling a manufacturing process and associated appar...

Method for determining root cause affecting yield in a semiconducto...

Determining pattern ranking based on measurement feedback from prin...

Method for determining an etch profile of a layer of a wafer for a...

Method and apparatus for illumination adjustment

Method of determining a position of a feature

Measuring a process parameter for a manufacturing process involving...

Method for determining stack configuration of substrate

Metrology using a plurality of metrology target measurement recipes

Method and apparatus for measuring a parameter of a lithographic pr...

Measurement apparatus and a method for determining a substrate grid

Metrology method and apparatus, substrate, lithographic method and...

Alternative target design for metrology using modulation techniques

Method of determining a position of a feature

Method and apparatus for measuring a parameter of a lithographic pr...

Methods and systems for pattern design with tailored response to wa...

Process based metrology target design

Measuring a process parameter for a manufacturing process involving...

Metrology target, method and apparatus, target design method, compu...

Process based metrology target design

Methods and systems for pattern design with tailored response to wa...

System for simplifying layout processing

Method of pattern selection for source and mask optimization

Model-based pattern characterization to generate rules for rule-mod...

Integrated circuit design using modified cells

Displacing edge segments on a fabrication layout based on proximity...

Patents Applicationslast 30 patents

METHOD FOR ADJUSTING A PATTERNING PROCESS

DETERMINING PATTERN RANKING BASED ON MEASUREMENT FEEDBACK FROM PRIN...

METHOD FOR DETERMINING AN ETCH PROFILE OF A LAYER OF A WAFER FOR A...

DETERMINING PATTERN RANKING BASED ON MEASUREMENT FEEDBACK FROM PRIN...

DETERMINING HOT SPOT RANKING BASED ON WAFER MEASUREMENT

APPARATUS AND METHOD FOR GROUPING IMAGE PATTERNS TO DETERMINE WAFER...

METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

METHOD OF MANUFACTURING DEVICES

METHOD FOR DETERMINING ROOT CAUSE AFFECTING YIELD IN A SEMICONDUCTO...

MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID

METHOD FOR DETERMINING STACK CONFIGURATION OF SUBSTRATE

METROLOGY USING A PLURALITY OF METROLOGY TARGET MEASUREMENT RECIPES

METHOD FOR DETERMINING AN ETCH PROFILE OF A LAYER OF A WAFER FOR A...

METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT

Measuring a Process Parameter for a Manufacturing Process Involving...

METHOD OF DETERMINING A POSITION OF A FEATURE

Method and Apparatus for Measuring a Parameter of a Lithographic Pr...

METHOD OF DETERMINING A POSITION OF A FEATURE

MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID

Measuring a Process Parameter for a Manufacturing Process Involving...

ALTERNATIVE TARGET DESIGN FOR METROLOGY USING MODULATION TECHNIQUES

POLARIZATION TUNING IN SCATTEROMETRY

PROCESS BASED METROLOGY TARGET DESIGN

METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC METHOD AND...

Metrology Target, Method and Apparatus, Target Design Method, Compu...

PATTERN PLACEMENT ERROR AWARE OPTIMIZATION

Method And Apparatus for Measuring a Parameter of a Lithographic Pr...

Measuring a Process Parameter for a Manufacturing Process Involving...

PROCESS BASED METROLOGY TARGET DESIGN